DE69627983D1 - Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte - Google Patents

Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte

Info

Publication number
DE69627983D1
DE69627983D1 DE69627983T DE69627983T DE69627983D1 DE 69627983 D1 DE69627983 D1 DE 69627983D1 DE 69627983 T DE69627983 T DE 69627983T DE 69627983 T DE69627983 T DE 69627983T DE 69627983 D1 DE69627983 D1 DE 69627983D1
Authority
DE
Germany
Prior art keywords
liquid
producing
print plate
flat print
dry flat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69627983T
Other languages
English (en)
Other versions
DE69627983T2 (de
Inventor
Mitsuru Suezawa
Atsuko Kawabe
Toshihiko Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE69627983D1 publication Critical patent/DE69627983D1/de
Publication of DE69627983T2 publication Critical patent/DE69627983T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Drying Of Solid Materials (AREA)
DE69627983T 1995-11-10 1996-11-08 Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte Expired - Fee Related DE69627983T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP29284195 1995-11-10
JP29284195 1995-11-10
JP10126196 1996-04-23
JP10126196 1996-04-23
PCT/JP1996/003295 WO1997017634A1 (fr) 1995-11-10 1996-11-08 Fluide de traitement pour realiser un plaque lithographie sans eau

Publications (2)

Publication Number Publication Date
DE69627983D1 true DE69627983D1 (de) 2003-06-12
DE69627983T2 DE69627983T2 (de) 2004-05-13

Family

ID=26442165

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69627983T Expired - Fee Related DE69627983T2 (de) 1995-11-10 1996-11-08 Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte

Country Status (8)

Country Link
US (1) US5958652A (de)
EP (1) EP0803778B1 (de)
JP (1) JP3716429B2 (de)
AT (1) ATE239928T1 (de)
AU (1) AU7507096A (de)
CA (1) CA2209677A1 (de)
DE (1) DE69627983T2 (de)
WO (1) WO1997017634A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3767768B2 (ja) * 1997-12-12 2006-04-19 富士写真フイルム株式会社 ネガ型水なし平版印刷原版
JPH11198335A (ja) * 1998-01-16 1999-07-27 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JP3808621B2 (ja) * 1998-03-18 2006-08-16 富士写真フイルム株式会社 平版印刷版用版面保護剤
US6284433B1 (en) * 1999-03-26 2001-09-04 Toray Industries, Inc. Method of producing directly imageable waterless planographic printing plate
EP1142709B1 (de) 2000-04-06 2004-11-24 Toray Industries, Inc. Direkt beschreibbare Flachdruckplatten und Verfahren zu ihrer Herstellung
WO2008056588A1 (en) 2006-11-06 2008-05-15 Toray Industries, Inc. Precursor for waterless lithographic printing plate
WO2010113989A1 (ja) 2009-03-31 2010-10-07 東レ株式会社 直描型水なし平版印刷版原版およびその製造方法
CN103154817B (zh) 2010-09-30 2015-11-25 东丽株式会社 直接描绘型无水平版印刷版原版
WO2012099003A1 (ja) 2011-01-17 2012-07-26 東レ株式会社 直描型水なし平版印刷版原版

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4381340A (en) * 1980-08-08 1983-04-26 American Hoechst Corporation Method of treating lithographic printing plates with 2-propoxyethanol
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
JPS62294246A (ja) * 1986-02-12 1987-12-21 Toray Ind Inc 水なし平版製版用処理液
IE59971B1 (en) * 1986-11-10 1994-05-04 Baker J T Inc Stripping compositions and their use for stripping resists from substrates
JPS63214757A (ja) * 1987-03-04 1988-09-07 Toray Ind Inc 水なし平版印刷版の製版方法
JPH0740134B2 (ja) * 1987-06-19 1995-05-01 東レ株式会社 水なし平版製版用処理液
JP2542898B2 (ja) * 1988-04-07 1996-10-09 富士写真フイルム株式会社 水なしｐｓ版用現像液
JP2530693B2 (ja) * 1988-09-06 1996-09-04 東レ株式会社 水なし平版印刷版の製版方法
JPH04257857A (ja) * 1991-02-12 1992-09-14 Konica Corp 湿し水不要感光性平版印刷版の着色方法
IT1245398B (it) * 1991-03-22 1994-09-20 Silvani Antincendi Spa Composizione per il lavaggio e la pulizia degli stampi di vulcanizzazione
US5275915A (en) * 1991-06-05 1994-01-04 Dainippon Ink And Chemicals, Inc. Developer for light-sensitive material
US5531889A (en) * 1994-03-08 1996-07-02 Atotech Usa, Inc. Method and apparatus for removing resist particles from stripping solutions for printed wireboards
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof

Also Published As

Publication number Publication date
EP0803778A1 (de) 1997-10-29
EP0803778A4 (de) 1999-07-21
US5958652A (en) 1999-09-28
JP3716429B2 (ja) 2005-11-16
ATE239928T1 (de) 2003-05-15
EP0803778B1 (de) 2003-05-07
AU7507096A (en) 1997-05-29
DE69627983T2 (de) 2004-05-13
CA2209677A1 (en) 1997-05-15
WO1997017634A1 (fr) 1997-05-15

Similar Documents

Publication Publication Date Title
MX167439B (es) Impresion
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
US4292397A (en) Method for preparing dry planographic plates with plasma
DE60033468D1 (de) Vorläufer für eine lithographische Druckplatte sowie Verfahren zu seiner Herstellung
US4114535A (en) Resilient lithographic masters for direct printing
ATE105638T1 (de) Herstellung einer reliefdruckplatte.
DE69627983D1 (de) Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte
DE3783180D1 (de) Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck.
DE3787426D1 (de) Verfahren zur Herstellung von Flachdruckplatten.
BR0214935A (pt) Composição fotossensìvel e chapa de impressão planográfica fotossensìvel
US4481282A (en) Dry planographic plates for direct printing with elastomer underlayer
DE60028148D1 (de) Träger einer Flachdruckplatte sowie Flachdruckplattenausgangsprodukt
DE60204998D1 (de) Flachdruckplattenvorläufer
DE50004915D1 (de) Gummituch mit Registerausnehmungen und Verfahren zur Gummituchausrichtung
TW369488B (en) A printed document and method of producing the same on a substrate
DE69605178D1 (de) Verfahren zur Herstellung von eine hydrophilen Oberfläche einer lithographischen Druckplatte
KR950704724A (ko) 건조 평판인쇄판 원판(Dry Planographic Printing Plate)
DE69110838T2 (de) Verfahren zur Herstellung eines Substrats für eine lithographische Druckplatte.
ATE121993T1 (de) Bildplattenkonstruktion für hochdruck.
DE69932794D1 (de) Verfahren zur Herstellung einer lichtempfindlichen Flachdruckplatte
DE3883120D1 (de) Lichtempfindliche druckplatte fuer den wasserlosen flachdruck.
DE602005009350D1 (de) Verfahren zur Herstellung einer planographischen Druckplatte und einer Blindplatte
CA2152167A1 (en) Dry lithographic forme
DE3376768D1 (en) Cover film for printing plate
ATE448508T1 (de) Vorsensibilisierte platte zur herstellung einer lithographischen druckplatte

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee