ATE239928T1 - Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte - Google Patents

Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte

Info

Publication number
ATE239928T1
ATE239928T1 AT96937547T AT96937547T ATE239928T1 AT E239928 T1 ATE239928 T1 AT E239928T1 AT 96937547 T AT96937547 T AT 96937547T AT 96937547 T AT96937547 T AT 96937547T AT E239928 T1 ATE239928 T1 AT E239928T1
Authority
AT
Austria
Prior art keywords
liquid
produce
dry plant
plant plate
making
Prior art date
Application number
AT96937547T
Other languages
English (en)
Inventor
Mitsuru Suezawa
Atsuko Kawabe
Toshihiko Taniguchi
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Application granted granted Critical
Publication of ATE239928T1 publication Critical patent/ATE239928T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Drying Of Solid Materials (AREA)
AT96937547T 1995-11-10 1996-11-08 Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte ATE239928T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP29284195 1995-11-10
JP10126196 1996-04-23
PCT/JP1996/003295 WO1997017634A1 (fr) 1995-11-10 1996-11-08 Fluide de traitement pour realiser un plaque lithographie sans eau

Publications (1)

Publication Number Publication Date
ATE239928T1 true ATE239928T1 (de) 2003-05-15

Family

ID=26442165

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96937547T ATE239928T1 (de) 1995-11-10 1996-11-08 Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte

Country Status (8)

Country Link
US (1) US5958652A (de)
EP (1) EP0803778B1 (de)
JP (1) JP3716429B2 (de)
AT (1) ATE239928T1 (de)
AU (1) AU7507096A (de)
CA (1) CA2209677A1 (de)
DE (1) DE69627983T2 (de)
WO (1) WO1997017634A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3767768B2 (ja) * 1997-12-12 2006-04-19 富士写真フイルム株式会社 ネガ型水なし平版印刷原版
JPH11198335A (ja) * 1998-01-16 1999-07-27 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JP3808621B2 (ja) * 1998-03-18 2006-08-16 富士写真フイルム株式会社 平版印刷版用版面保護剤
US6284433B1 (en) * 1999-03-26 2001-09-04 Toray Industries, Inc. Method of producing directly imageable waterless planographic printing plate
EP1142709B1 (de) 2000-04-06 2004-11-24 Toray Industries, Inc. Direkt beschreibbare Flachdruckplatten und Verfahren zu ihrer Herstellung
CA2668612C (en) 2006-11-06 2014-04-15 Toray Industries, Inc. Waterless planographic printing plate precursor
US8298749B2 (en) 2009-03-31 2012-10-30 Toray Industries, Inc. Directly imageable waterless planographic printing plate precursor and method for producing same
US9164378B2 (en) 2010-09-30 2015-10-20 Toray Industries, Inc. Direct drawing-type waterless lithographic printing original plate
EP2667251B1 (de) 2011-01-17 2019-02-27 Toray Industries, Inc. Originalplatte für eine direktmuster-trockenflachdruckplatte
WO2024181121A1 (ja) 2023-02-27 2024-09-06 東レ株式会社 直描型水なし平版印刷版原版およびそれを用いた水なし平版印刷版の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4381340A (en) * 1980-08-08 1983-04-26 American Hoechst Corporation Method of treating lithographic printing plates with 2-propoxyethanol
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
JPS62294246A (ja) * 1986-02-12 1987-12-21 Toray Ind Inc 水なし平版製版用処理液
IE59971B1 (en) * 1986-11-10 1994-05-04 Baker J T Inc Stripping compositions and their use for stripping resists from substrates
JPS63214757A (ja) * 1987-03-04 1988-09-07 Toray Ind Inc 水なし平版印刷版の製版方法
JPH0740134B2 (ja) * 1987-06-19 1995-05-01 東レ株式会社 水なし平版製版用処理液
JP2542898B2 (ja) * 1988-04-07 1996-10-09 富士写真フイルム株式会社 水なしｐｓ版用現像液
JP2530693B2 (ja) * 1988-09-06 1996-09-04 東レ株式会社 水なし平版印刷版の製版方法
JPH04257857A (ja) * 1991-02-12 1992-09-14 Konica Corp 湿し水不要感光性平版印刷版の着色方法
IT1245398B (it) * 1991-03-22 1994-09-20 Silvani Antincendi Spa Composizione per il lavaggio e la pulizia degli stampi di vulcanizzazione
US5275915A (en) * 1991-06-05 1994-01-04 Dainippon Ink And Chemicals, Inc. Developer for light-sensitive material
US5531889A (en) * 1994-03-08 1996-07-02 Atotech Usa, Inc. Method and apparatus for removing resist particles from stripping solutions for printed wireboards
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof

Also Published As

Publication number Publication date
WO1997017634A1 (fr) 1997-05-15
DE69627983T2 (de) 2004-05-13
DE69627983D1 (de) 2003-06-12
CA2209677A1 (en) 1997-05-15
AU7507096A (en) 1997-05-29
EP0803778A4 (de) 1999-07-21
EP0803778A1 (de) 1997-10-29
US5958652A (en) 1999-09-28
EP0803778B1 (de) 2003-05-07
JP3716429B2 (ja) 2005-11-16

Similar Documents

Publication Publication Date Title
ATE239928T1 (de) Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
DE69001411D1 (de) Verfahren zur herstellung eines substrats fuer halbleiteranordnungen.
DE59902107D1 (de) Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen
DE69203144D1 (de) Verfahren zur Lokalpassivierung eines Substrates mit einer amorphen wasserstoffhaltigen Kohlenstoffschicht und Verfahren zur Herstellung von Dünnschicht-Transistoren auf diesem passivierten Substrat.
DE69517400D1 (de) Verfahren zur Herstellung einer Kunststoffmaske für den Pastendruck, Kunststoffmaske für den Pastendruck, und Pastendruckverfahren
DE3578264D1 (de) Verfahren zur herstellung eines hochwaermeleitenden substrates und kupferleiterblech verwendbar in diesem verfahren.
ATE194719T1 (de) Lichtmodulierender film mit erhöhter uv beständigkeit für ein lichtventil
DE69516177D1 (de) Halbton-druckverfahren für gestreckte substrate
ATE105638T1 (de) Herstellung einer reliefdruckplatte.
DE3783180D1 (de) Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck.
ATE13994T1 (de) Rakel fuer den tiefdruck mit kunststoffdruckschichten.
ATE94662T1 (de) Verfahren zur herstellung von flachdruckplatten.
ATE444852T1 (de) Lichtempfindliche zusammensetzung und lichtempfindliche flachdruckplatte
DE69403760D1 (de) Substrat für eine electrolytisch aufraubare lithographische Druckplatte sowie Verfahren zur Herstellung
ATE262421T1 (de) Druckerzeugnis mit reflektierendem tiefdruckeffekt und verfahren dafür
DE60028148D1 (de) Träger einer Flachdruckplatte sowie Flachdruckplattenausgangsprodukt
DE50004915D1 (de) Gummituch mit Registerausnehmungen und Verfahren zur Gummituchausrichtung
DE69605178D1 (de) Verfahren zur Herstellung von eine hydrophilen Oberfläche einer lithographischen Druckplatte
DE69110838D1 (de) Verfahren zur Herstellung eines Substrats für eine lithographische Druckplatte.
DE60204998D1 (de) Flachdruckplattenvorläufer
DE59108688D1 (de) Verfahren zur Herstellung photopolymerer flexographischer Reliefdruckplatten
EP0152114A3 (de) Verfahren zur Herstellung von Trockenflachdruckplatten
DE69932794D1 (de) Verfahren zur Herstellung einer lichtempfindlichen Flachdruckplatte
DE59106647D1 (de) Verfahren zur Herstellung photopolymerer flexographischer Reliefdruckplatten.

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties