DE69624646T2 - Leistungsverstärkerschaltung - Google Patents

Leistungsverstärkerschaltung

Info

Publication number
DE69624646T2
DE69624646T2 DE69624646T DE69624646T DE69624646T2 DE 69624646 T2 DE69624646 T2 DE 69624646T2 DE 69624646 T DE69624646 T DE 69624646T DE 69624646 T DE69624646 T DE 69624646T DE 69624646 T2 DE69624646 T2 DE 69624646T2
Authority
DE
Germany
Prior art keywords
power amplifier
amplifier circuit
circuit
power
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69624646T
Other languages
English (en)
Other versions
DE69624646D1 (de
Inventor
Hidetoshi Furukawa
Daisuke Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69624646D1 publication Critical patent/DE69624646D1/de
Publication of DE69624646T2 publication Critical patent/DE69624646T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/193High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices
    • H03F3/1935High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices with junction-FET devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/30Modifications of amplifiers to reduce influence of variations of temperature or supply voltage or other physical parameters
    • H03F1/306Modifications of amplifiers to reduce influence of variations of temperature or supply voltage or other physical parameters in junction-FET amplifiers
DE69624646T 1995-08-29 1996-08-28 Leistungsverstärkerschaltung Expired - Lifetime DE69624646T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22022395 1995-08-29

Publications (2)

Publication Number Publication Date
DE69624646D1 DE69624646D1 (de) 2002-12-12
DE69624646T2 true DE69624646T2 (de) 2003-03-20

Family

ID=16747817

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69624646T Expired - Lifetime DE69624646T2 (de) 1995-08-29 1996-08-28 Leistungsverstärkerschaltung

Country Status (6)

Country Link
US (1) US5708292A (de)
EP (1) EP0762631B1 (de)
KR (1) KR100406319B1 (de)
CN (1) CN1076124C (de)
DE (1) DE69624646T2 (de)
TW (1) TW307948B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100457785B1 (ko) * 2002-06-05 2004-11-18 주식회사 웨이브아이씨스 전기적 튜닝이 가능한 전치왜곡기
JP4003735B2 (ja) 2002-11-22 2007-11-07 株式会社村田製作所 コンデンサに関する有効電力の計算方法、コンデンサが消費する有効電力の測定方法、コンデンサ選定方法、コンデンサに関する有効電力の計算装置およびその計算プログラムを記録した記録媒体
US6864751B1 (en) * 2003-09-08 2005-03-08 Texas Instruments Deutschland Gmbh Transimpedance amplifier with adjustable output amplitude and wide input dynamic-range
US20050236616A1 (en) * 2004-04-26 2005-10-27 Horng-Huei Tseng Reliable semiconductor structure and method for fabricating
JP2007104280A (ja) * 2005-10-04 2007-04-19 Nec Electronics Corp 高周波電力増幅回路

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634737A (en) * 1969-02-07 1972-01-11 Tokyo Shibaura Electric Co Semiconductor device
DE2120388A1 (de) * 1970-04-28 1971-12-16 Agency Ind Science Techn Verbindungshalbleitervorrichtung
US3897282A (en) * 1972-10-17 1975-07-29 Northern Electric Co Method of forming silicon gate device structures with two or more gate levels
JPS58139420A (ja) * 1982-02-15 1983-08-18 Nippon Telegr & Teleph Corp <Ntt> 化合物半導体集積回路基板
JPS5979577A (ja) * 1982-10-29 1984-05-08 Fujitsu Ltd 半導体集積回路装置
JPS61114582A (ja) * 1984-11-09 1986-06-02 Fujitsu Ltd 半導体装置
JPH01187981A (ja) * 1988-01-22 1989-07-27 Fujitsu Ltd 電界効果型トランジスタ
US5182233A (en) * 1989-08-02 1993-01-26 Kabushiki Kaisha Toshiba Compound semiconductor pellet, and method for dicing compound semiconductor wafer
JPH03126258A (ja) * 1989-10-12 1991-05-29 Mitsubishi Electric Corp 受信用光電子集積回路
US5098862A (en) * 1990-11-07 1992-03-24 Gte Laboratories Incorporated Method of making ohmic electrical contact to a matrix of semiconductor material
JP3038939B2 (ja) * 1991-02-08 2000-05-08 日産自動車株式会社 半導体装置
JP3278868B2 (ja) * 1991-08-20 2002-04-30 株式会社日立製作所 ヘテロ接合バイポーラトランジスタ
JP2776716B2 (ja) * 1993-01-14 1998-07-16 日本電気株式会社 電界効果型トランジスタ
CA2129327A1 (en) * 1993-08-03 1995-02-04 Nobuo Shiga Field effect transistor
JPH07106875A (ja) * 1993-09-30 1995-04-21 Nec Corp 半導体集積回路
JP3177559B2 (ja) * 1994-01-20 2001-06-18 アルプス電気株式会社 高周波増幅器

Also Published As

Publication number Publication date
EP0762631B1 (de) 2002-11-06
EP0762631A2 (de) 1997-03-12
CN1076124C (zh) 2001-12-12
TW307948B (de) 1997-06-11
DE69624646D1 (de) 2002-12-12
CN1148289A (zh) 1997-04-23
EP0762631A3 (de) 1999-06-09
KR100406319B1 (ko) 2004-04-14
US5708292A (en) 1998-01-13
KR970013652A (ko) 1997-03-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP