DE69623103D1 - Positiv arbeitende lichtempfindliche Druckplatte - Google Patents

Positiv arbeitende lichtempfindliche Druckplatte

Info

Publication number
DE69623103D1
DE69623103D1 DE69623103T DE69623103T DE69623103D1 DE 69623103 D1 DE69623103 D1 DE 69623103D1 DE 69623103 T DE69623103 T DE 69623103T DE 69623103 T DE69623103 T DE 69623103T DE 69623103 D1 DE69623103 D1 DE 69623103D1
Authority
DE
Germany
Prior art keywords
printing plate
photosensitive printing
positive working
working photosensitive
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69623103T
Other languages
English (en)
Other versions
DE69623103T2 (de
Inventor
Kazuo Maemoto
Yasumasa Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69623103D1 publication Critical patent/DE69623103D1/de
Publication of DE69623103T2 publication Critical patent/DE69623103T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE1996623103 1995-12-22 1996-12-16 Positiv arbeitende lichtempfindliche Druckplatte Expired - Lifetime DE69623103T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33514595A JP3506295B2 (ja) 1995-12-22 1995-12-22 ポジ型感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69623103D1 true DE69623103D1 (de) 2002-09-26
DE69623103T2 DE69623103T2 (de) 2002-12-19

Family

ID=18285272

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1996623103 Expired - Lifetime DE69623103T2 (de) 1995-12-22 1996-12-16 Positiv arbeitende lichtempfindliche Druckplatte

Country Status (3)

Country Link
EP (1) EP0780730B1 (de)
JP (1) JP3506295B2 (de)
DE (1) DE69623103T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69718113T2 (de) * 1996-08-28 2003-10-09 Jsr Corp Strahlungsempfindliche Harzzusammensetzung
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
US6960419B2 (en) 2003-12-12 2005-11-01 Kodak Polychrome Graphics Llc Antihalation dye for negative-working printing plates
MXPA06014131A (es) 2004-06-04 2007-03-07 Astellas Pharma Inc Derivado de propano-1,3-diona o su sal.
KR101046039B1 (ko) 2005-03-31 2011-07-01 아스텔라스세이야쿠 가부시키가이샤 프로판-1,3-디온 유도체 또는 그의 염
JP5634888B2 (ja) * 2011-01-12 2014-12-03 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
WO2019008002A1 (en) 2017-07-03 2019-01-10 Basf Se PHENOLIC METAL SALTS AND THEIR PHENOLIC ACIDS AS STABILIZERS OF POLYMERS

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (de) 1950-10-31
BE507657A (de) 1950-12-06
BE539175A (de) 1954-08-20
NL267931A (de) 1960-08-05 1900-01-01
US3280734A (en) 1963-10-29 1966-10-25 Howard A Fromson Photographic plate
US3181461A (en) 1963-05-23 1965-05-04 Howard A Fromson Photographic plate
GB1053866A (de) 1964-08-05
JPS459610B1 (de) 1965-07-19 1970-04-07
NL136645C (de) 1966-12-12
US3635709A (en) 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
DE1807644A1 (de) 1967-11-21 1969-08-28 Eastman Kodak Co Verwendung von lichtempfindlichen,filmbildenden Polymerisaten aus Aminostyrolen zur Herstellung von lichtempfindlichen Schichten lichtempfindlicher Aufzeichnungsmaterialien
GB1227602A (de) 1967-11-24 1971-04-07
US3573917A (en) 1968-07-12 1971-04-06 Takashi Okamoto Light-sensitive printing plate composition
JPS492284B1 (de) 1969-05-30 1974-01-19
US3837860A (en) 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3891516A (en) 1970-08-03 1975-06-24 Polychrome Corp Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
US3759711A (en) 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
JPS505083B1 (de) 1970-09-16 1975-02-28
JPS505084B1 (de) 1970-09-16 1975-02-28
US3785825A (en) 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
JPS5423571B2 (de) 1971-12-13 1979-08-15
JPS5429922B2 (de) 1971-12-13 1979-09-27
BE795809A (fr) 1972-02-22 1973-08-22 Eastman Kodak Co Nouveaux polymeres photosensibles a groupes o-quinone diazide
JPS51483B2 (de) 1972-08-18 1976-01-08
JPS5236043B2 (de) 1974-02-21 1977-09-13
JPS5645127B2 (de) 1974-02-25 1981-10-24
US3902734A (en) 1974-03-14 1975-09-02 Twm Mfg Co Frames for axle suspension systems
US4123279A (en) 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5280022A (en) 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2641100A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
US4153451A (en) 1978-05-01 1979-05-08 Ethyl Corporation Lead recovery and waste disposal process
US4201836A (en) 1978-08-28 1980-05-06 Polychrome Corporation Aluminum substrates grained with a saturated solution of aluminum salts of mineral acids
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
DE3144480A1 (de) 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS59142538A (ja) 1983-02-04 1984-08-15 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPS60133446A (ja) 1983-12-22 1985-07-16 Fuji Photo Film Co Ltd 感光性組成物
DE3406101A1 (de) 1984-02-21 1985-08-22 Hoechst Ag, 6230 Frankfurt Verfahren zur zweistufigen hydrophilierenden nachbehandlung von aluminiumoxidschichten mit waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern
JPS61122649A (ja) * 1984-11-19 1986-06-10 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
JPH0743533B2 (ja) 1985-05-13 1995-05-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
JP2516022B2 (ja) 1987-07-17 1996-07-10 富士写真フイルム株式会社 感光性平版印刷版自動現像装置の現像補充液補充方法
WO1990013058A1 (en) * 1989-04-27 1990-11-01 Olin Hunt Specialty Products Inc. Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures
JPH04316049A (ja) 1991-04-15 1992-11-06 Konica Corp 感光性組成物
US5275911A (en) * 1993-02-01 1994-01-04 Ocg Microelectronic Materials, Inc. Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
JP3130188B2 (ja) * 1993-08-31 2001-01-31 富士写真フイルム株式会社 ポジ型感光性平版印刷版

Also Published As

Publication number Publication date
JPH09179290A (ja) 1997-07-11
DE69623103T2 (de) 2002-12-19
EP0780730A2 (de) 1997-06-25
EP0780730A3 (de) 1998-07-15
JP3506295B2 (ja) 2004-03-15
EP0780730B1 (de) 2002-08-21

Similar Documents

Publication Publication Date Title
DE69703378D1 (de) Photoempfindliche lithographische Druckplatte
DE69804876T2 (de) Flachdruckplatte
DE69819584D1 (de) Positiv arbeitende photosensitive lithographische Druckplatte
DE69905098T2 (de) Fotoempfindliche Flachdruckplatte
DE69410212T2 (de) Lithographische Druckplatten
DE69608167D1 (de) Positiv arbeitende Photoresistzusammensetzung
DE69604258T2 (de) Flachdruckverfahren
DE59601976D1 (de) Druckmaschine
DE69614050D1 (de) Flachdruckplatte
DE69620614T2 (de) Trockenflachdruckplatten
DE69600202D1 (de) Positiv arbeitende Fotoresistzusammensetzung
DE69604623D1 (de) Positiv arbeitende Photoresistzusammensetzung
DE69623103D1 (de) Positiv arbeitende lichtempfindliche Druckplatte
DE69604034D1 (de) Positiv arbeitende Fotoresistzusammensetzung
DE69400177D1 (de) Lithographische Druckplatte
DE69812817D1 (de) Positiv arbeitende lithographische Druckplatte
DE69511601D1 (de) Lichtempfindliche lithographische Druckplatte
DE69617430D1 (de) Druckmaschine
DE69117225D1 (de) Elektrofotografische Flachdruckformenvorstufe
DE69518107T2 (de) Lichtempfindliche lithographische Druckplatte
DE69501486T2 (de) Photolithographische Druckplatte
DE69516486D1 (de) Lichtempfindliche Flachdruckplatte
DE69602211T2 (de) Lichtempfindliche Flachdruckplatte
DE69500801D1 (de) Lithographische Druckplatte
DE69901282T2 (de) Lichtempfindliche Flachdruckplatte

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP