DE69529909D1 - Verfahren zur herstellung einer elektronischen schaltung - Google Patents

Verfahren zur herstellung einer elektronischen schaltung

Info

Publication number
DE69529909D1
DE69529909D1 DE69529909T DE69529909T DE69529909D1 DE 69529909 D1 DE69529909 D1 DE 69529909D1 DE 69529909 T DE69529909 T DE 69529909T DE 69529909 T DE69529909 T DE 69529909T DE 69529909 D1 DE69529909 D1 DE 69529909D1
Authority
DE
Germany
Prior art keywords
producing
electronic circuit
electronic
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69529909T
Other languages
English (en)
Other versions
DE69529909T2 (de
Inventor
Ltd Imai
Ltd Kabeta
Ltd Syuto
Ltd Wakamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Momentive Performance Materials Japan LLC
Original Assignee
GE Toshiba Silicones Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GE Toshiba Silicones Co Ltd filed Critical GE Toshiba Silicones Co Ltd
Application granted granted Critical
Publication of DE69529909D1 publication Critical patent/DE69529909D1/de
Publication of DE69529909T2 publication Critical patent/DE69529909T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
DE69529909T 1994-09-06 1995-04-18 Verfahren zur herstellung einer elektronischen schaltung Expired - Fee Related DE69529909T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21275394 1994-09-06
PCT/JP1995/000752 WO1996008127A1 (fr) 1994-09-06 1995-04-18 Procede de fabrication d'un circuit electronique

Publications (2)

Publication Number Publication Date
DE69529909D1 true DE69529909D1 (de) 2003-04-17
DE69529909T2 DE69529909T2 (de) 2003-12-04

Family

ID=16627850

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69529909T Expired - Fee Related DE69529909T2 (de) 1994-09-06 1995-04-18 Verfahren zur herstellung einer elektronischen schaltung

Country Status (4)

Country Link
US (1) US5759638A (de)
EP (1) EP0781079B1 (de)
DE (1) DE69529909T2 (de)
WO (1) WO1996008127A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001005942A (ja) * 1999-06-24 2001-01-12 Shinko Electric Ind Co Ltd Ｉｃカード及びその製造方法並びにアンテナ付き半導体装置及びその製造方法
EP1363363B1 (de) * 1999-07-02 2004-09-22 Shin-Etsu Polymer Co., Ltd. Rohrförmiger Schaltkreisverbinder
US6998332B2 (en) * 2004-01-08 2006-02-14 International Business Machines Corporation Method of independent P and N gate length control of FET device made by sidewall image transfer technique
JP4500995B2 (ja) * 2004-03-08 2010-07-14 国立大学法人広島大学 導電性材料、電子回路基板、および、電子回路基板の製造方法
JP2007116036A (ja) * 2005-10-24 2007-05-10 Mitsui Chemicals Inc 配線基板の製造方法
JP2007116037A (ja) * 2005-10-24 2007-05-10 Mitsui Chemicals Inc 配線基板の製造方法
JP2007116038A (ja) * 2005-10-24 2007-05-10 Mitsui Chemicals Inc 配線基板の製造方法
KR20140075046A (ko) * 2012-12-07 2014-06-19 삼성정밀화학 주식회사 자외선 경화형 유기실록산 수지를 포함한 평탄화막의 형성방법 및 이로부터 형성된 평탄화막

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663224A (en) * 1966-11-03 1972-05-16 Teeg Research Inc Electrical components, electrical circuits, and the like, and methods for making the same by means of radiation sensitive elements
JPS62111449A (ja) * 1985-11-08 1987-05-22 Nippon Telegr & Teleph Corp <Ntt> 導電性パタン形成方法
DE3634281A1 (de) * 1986-10-08 1988-04-21 Basf Ag Elektrisch leitfaehige polysilane
US4921321A (en) * 1989-04-27 1990-05-01 American Telephone And Telegraph Company Silicon network polymers
JPH036231A (ja) * 1989-06-02 1991-01-11 Mitsui Petrochem Ind Ltd 新規な重合体およびその用途
JPH036232A (ja) * 1989-06-02 1991-01-11 Mitsui Petrochem Ind Ltd 新規な重合体およびその用途
JP2685699B2 (ja) * 1992-10-20 1997-12-03 信越化学工業株式会社 導電性ケイ素系重合体組成物
JP2746523B2 (ja) * 1993-08-04 1998-05-06 東芝シリコーン株式会社 硬化性ポリシラン組成物

Also Published As

Publication number Publication date
EP0781079B1 (de) 2003-03-12
EP0781079A4 (de) 1999-03-24
DE69529909T2 (de) 2003-12-04
US5759638A (en) 1998-06-02
WO1996008127A1 (fr) 1996-03-14
EP0781079A1 (de) 1997-06-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee