DE69511288D1 - Vertikal angeordneter schüttschicht-filmverdampfer für halogenidfreie silizium enthaltende verbindungen - Google Patents
Vertikal angeordneter schüttschicht-filmverdampfer für halogenidfreie silizium enthaltende verbindungenInfo
- Publication number
- DE69511288D1 DE69511288D1 DE69511288T DE69511288T DE69511288D1 DE 69511288 D1 DE69511288 D1 DE 69511288D1 DE 69511288 T DE69511288 T DE 69511288T DE 69511288 T DE69511288 T DE 69511288T DE 69511288 D1 DE69511288 D1 DE 69511288D1
- Authority
- DE
- Germany
- Prior art keywords
- halogenide
- vertically arranged
- film evaporator
- free silicon
- bulk film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
- B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S159/00—Concentrating evaporators
- Y10S159/01—Electric heat
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S159/00—Concentrating evaporators
- Y10S159/32—Indirect heat exchange
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S261/00—Gas and liquid contact apparatus
- Y10S261/65—Vaporizers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Glass Melting And Manufacturing (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/368,319 US5558687A (en) | 1994-12-30 | 1994-12-30 | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
PCT/US1995/016737 WO1996020897A1 (en) | 1994-12-30 | 1995-12-19 | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69511288D1 true DE69511288D1 (de) | 1999-09-09 |
DE69511288T2 DE69511288T2 (de) | 2000-02-24 |
Family
ID=23450739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69511288T Expired - Fee Related DE69511288T2 (de) | 1994-12-30 | 1995-12-19 | Vertikal angeordneter schüttschicht-filmverdampfer für halogenidfreie silizium enthaltende verbindungen |
Country Status (7)
Country | Link |
---|---|
US (2) | US5558687A (de) |
EP (1) | EP0800489B1 (de) |
JP (1) | JPH10511923A (de) |
AU (1) | AU705116B2 (de) |
CA (1) | CA2208031A1 (de) |
DE (1) | DE69511288T2 (de) |
WO (1) | WO1996020897A1 (de) |
Families Citing this family (60)
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WO1999003787A1 (en) * | 1997-07-21 | 1999-01-28 | Corning Incorporated | Methods and apparatus for producing low flow rates of feedstock vapors |
JP4108926B2 (ja) * | 1997-09-24 | 2008-06-25 | コーニング インコーポレイテッド | 溶融SiO2−TiO2ガラスの製造法 |
US6086711A (en) * | 1997-10-06 | 2000-07-11 | Nisene Technology Group | Vapor generation system and process |
US6094940A (en) * | 1997-10-09 | 2000-08-01 | Nikon Corporation | Manufacturing method of synthetic silica glass |
US6161398A (en) * | 1998-04-09 | 2000-12-19 | Lucent Technologies, Inc. | Methods of and systems for vapor delivery control in optical preform manufacture |
US6336347B1 (en) | 1998-12-28 | 2002-01-08 | Pirelli Cavi E Sistemi S.P.A. | Process for producing silica by decomposition of an organosilane |
FR2800754B1 (fr) | 1999-11-08 | 2003-05-09 | Joint Industrial Processors For Electronics | Dispositif evaporateur d'une installation de depot chimique en phase vapeur |
DE19960333C2 (de) * | 1999-12-15 | 2002-12-19 | Tetra Laval Holdings & Finance | Vorrichtung zum Herstellen eines Gasgemisches und deren Verwendung |
US6418756B1 (en) | 2000-01-28 | 2002-07-16 | Corning Incorporated | Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture |
KR20030005387A (ko) * | 2000-05-25 | 2003-01-17 | 코닝 인코포레이티드 | 티타니아 도핑된 용융 실리카 예형의 제조 방법 |
FR2815336B1 (fr) * | 2000-10-16 | 2002-12-13 | Didier Costes | Appareil de dessalement d'eau utilisant un cycle a air humide |
WO2004002909A1 (en) * | 2002-06-28 | 2004-01-08 | Pirelli & C. S.P.A. | Method and device for vaporizing a liquid reactant in manufacturing a glass preform |
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US11260316B2 (en) * | 2002-11-13 | 2022-03-01 | Deka Products Limited Partnership | Pressurized vapor cycle liquid distillation |
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US5349829A (en) * | 1992-05-21 | 1994-09-27 | Aoc, Inc. | Method and apparatus for evaporatively cooling gases and/or fluids |
NL9201854A (nl) * | 1992-10-26 | 1994-05-16 | Franciscus Petrus Maria Nooren | Werkwijze en inrichting voor het zuiveren van vloeibaar materiaal, in het bijzonder polysiloxaan alsmede toepassing van het gezuiverde vloeibare materiaal. |
US5356451A (en) * | 1993-12-20 | 1994-10-18 | Corning Incorporated | Method and apparatus for vaporization of liquid reactants |
-
1994
- 1994-12-30 US US08/368,319 patent/US5558687A/en not_active Expired - Fee Related
-
1995
- 1995-12-19 CA CA002208031A patent/CA2208031A1/en not_active Abandoned
- 1995-12-19 DE DE69511288T patent/DE69511288T2/de not_active Expired - Fee Related
- 1995-12-19 WO PCT/US1995/016737 patent/WO1996020897A1/en active IP Right Grant
- 1995-12-19 AU AU46438/96A patent/AU705116B2/en not_active Ceased
- 1995-12-19 EP EP95944370A patent/EP0800489B1/de not_active Expired - Lifetime
- 1995-12-19 JP JP8521095A patent/JPH10511923A/ja not_active Ceased
- 1995-12-22 US US08/577,985 patent/US5707415A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU4643896A (en) | 1996-07-24 |
EP0800489A1 (de) | 1997-10-15 |
DE69511288T2 (de) | 2000-02-24 |
JPH10511923A (ja) | 1998-11-17 |
AU705116B2 (en) | 1999-05-13 |
CA2208031A1 (en) | 1996-07-11 |
US5707415A (en) | 1998-01-13 |
WO1996020897A1 (en) | 1996-07-11 |
EP0800489B1 (de) | 1999-08-04 |
US5558687A (en) | 1996-09-24 |
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