DE69510427D1 - Plasmareaktoren zur Halbleiterscheibenbehandlung - Google Patents

Plasmareaktoren zur Halbleiterscheibenbehandlung

Info

Publication number
DE69510427D1
DE69510427D1 DE69510427T DE69510427T DE69510427D1 DE 69510427 D1 DE69510427 D1 DE 69510427D1 DE 69510427 T DE69510427 T DE 69510427T DE 69510427 T DE69510427 T DE 69510427T DE 69510427 D1 DE69510427 D1 DE 69510427D1
Authority
DE
Germany
Prior art keywords
windings
spiral
vacuum chamber
semiconductor wafer
winding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69510427T
Other languages
English (en)
Other versions
DE69510427T2 (de
Inventor
Xue-Yu Qian
Arthur H Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE69510427D1 publication Critical patent/DE69510427D1/de
Publication of DE69510427T2 publication Critical patent/DE69510427T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
DE69510427T 1994-10-31 1995-10-13 Plasmareaktoren zur Halbleiterscheibenbehandlung Expired - Lifetime DE69510427T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33256994A 1994-10-31 1994-10-31

Publications (2)

Publication Number Publication Date
DE69510427D1 true DE69510427D1 (de) 1999-07-29
DE69510427T2 DE69510427T2 (de) 1999-12-30

Family

ID=23298820

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69510427T Expired - Lifetime DE69510427T2 (de) 1994-10-31 1995-10-13 Plasmareaktoren zur Halbleiterscheibenbehandlung

Country Status (6)

Country Link
US (2) US6297468B1 (de)
EP (1) EP0710055B1 (de)
JP (1) JPH08227878A (de)
KR (1) KR100362455B1 (de)
AT (1) ATE181637T1 (de)
DE (1) DE69510427T2 (de)

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JP4107596B2 (ja) * 1996-10-02 2008-06-25 東京エレクトロン株式会社 プラズマ処理装置
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KR100486724B1 (ko) * 2002-10-15 2005-05-03 삼성전자주식회사 사행 코일 안테나를 구비한 유도결합 플라즈마 발생장치
US7871490B2 (en) * 2003-03-18 2011-01-18 Top Engineering Co., Ltd. Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
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JP4621287B2 (ja) 2009-03-11 2011-01-26 株式会社イー・エム・ディー プラズマ処理装置
JP5462369B2 (ja) 2010-09-10 2014-04-02 株式会社イー・エム・ディー プラズマ処理装置
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JP5977986B2 (ja) * 2011-11-08 2016-08-24 株式会社日立ハイテクノロジーズ 熱処理装置
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JP5800937B2 (ja) * 2014-03-14 2015-10-28 東京エレクトロン株式会社 プラズマ処理装置
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Also Published As

Publication number Publication date
KR100362455B1 (ko) 2003-02-19
JPH08227878A (ja) 1996-09-03
DE69510427T2 (de) 1999-12-30
US6297468B1 (en) 2001-10-02
EP0710055A1 (de) 1996-05-01
EP0710055B1 (de) 1999-06-23
US6291793B1 (en) 2001-09-18
ATE181637T1 (de) 1999-07-15

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