DE69429791D1 - Verfahren zur Herstellung eines Resistmusters sowie ein Oxidationsmittel enthaltender Photoresist - Google Patents

Verfahren zur Herstellung eines Resistmusters sowie ein Oxidationsmittel enthaltender Photoresist

Info

Publication number
DE69429791D1
DE69429791D1 DE69429791T DE69429791T DE69429791D1 DE 69429791 D1 DE69429791 D1 DE 69429791D1 DE 69429791 T DE69429791 T DE 69429791T DE 69429791 T DE69429791 T DE 69429791T DE 69429791 D1 DE69429791 D1 DE 69429791D1
Authority
DE
Germany
Prior art keywords
producing
resist pattern
oxidizing agent
photoresist containing
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69429791T
Other languages
English (en)
Other versions
DE69429791T2 (de
Inventor
Andre Weill
Philippe Romand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orange SA
Original Assignee
France Telecom SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by France Telecom SA filed Critical France Telecom SA
Publication of DE69429791D1 publication Critical patent/DE69429791D1/de
Application granted granted Critical
Publication of DE69429791T2 publication Critical patent/DE69429791T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
DE1994629791 1993-03-02 1994-03-01 Verfahren zur Herstellung eines Resistmusters sowie ein Oxidationsmittel enthaltender Photoresist Expired - Lifetime DE69429791T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9302384A FR2702288B1 (fr) 1993-03-02 1993-03-02 Procede de formation d'un motif de photoresist sur la surface d'un substrat et solution de photoresist comprenant un compose oxydant.

Publications (2)

Publication Number Publication Date
DE69429791D1 true DE69429791D1 (de) 2002-03-21
DE69429791T2 DE69429791T2 (de) 2002-08-01

Family

ID=9444570

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994629791 Expired - Lifetime DE69429791T2 (de) 1993-03-02 1994-03-01 Verfahren zur Herstellung eines Resistmusters sowie ein Oxidationsmittel enthaltender Photoresist

Country Status (4)

Country Link
EP (1) EP0614126B1 (de)
JP (1) JPH06273945A (de)
DE (1) DE69429791T2 (de)
FR (1) FR2702288B1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7244369B2 (en) 1997-07-05 2007-07-17 Deutsche Telekom Ag Method for producing active or passive components on a polymer basis for integrated optical devices
CA2296569A1 (en) * 1997-07-05 1999-01-21 Deutsche Telekom Ag Process for the fabrication of active and passive polymer-based components for integrated optics

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU772396A1 (ru) * 1976-09-21 1984-06-15 Институт химии АН СССР Негативный фоторезист
DE3321281A1 (de) * 1982-06-22 1983-12-22 ASEA AB, 72183 Västerås Verfahren zur erhoehung der elektrischen leitfaehigkeit impraegnierbarer materialien
DE3305934A1 (de) * 1983-02-21 1984-08-23 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur temperaturbehandlung von substraten, insbesondere von halbleiterkristallscheiben
GB2169608B (en) * 1984-12-28 1988-02-24 Hoechst Gosei Kk Process for producting electrically conductive composite polymer article

Also Published As

Publication number Publication date
FR2702288A1 (fr) 1994-09-09
EP0614126B1 (de) 2002-02-06
FR2702288B1 (fr) 1995-09-22
DE69429791T2 (de) 2002-08-01
JPH06273945A (ja) 1994-09-30
EP0614126A1 (de) 1994-09-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition