DE69323812D1 - Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern - Google Patents

Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern

Info

Publication number
DE69323812D1
DE69323812D1 DE69323812T DE69323812T DE69323812D1 DE 69323812 D1 DE69323812 D1 DE 69323812D1 DE 69323812 T DE69323812 T DE 69323812T DE 69323812 T DE69323812 T DE 69323812T DE 69323812 D1 DE69323812 D1 DE 69323812D1
Authority
DE
Germany
Prior art keywords
reflection film
resist patterns
making resist
making
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69323812T
Other languages
English (en)
Other versions
DE69323812T2 (de
Inventor
Hiroaki Nemoto
Takayoshi Tanabe
Yoshiji Yumoto
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17017352&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69323812(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of DE69323812D1 publication Critical patent/DE69323812D1/de
Application granted granted Critical
Publication of DE69323812T2 publication Critical patent/DE69323812T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69323812T 1992-08-14 1993-08-04 Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern Expired - Lifetime DE69323812T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23757592 1992-08-14

Publications (2)

Publication Number Publication Date
DE69323812D1 true DE69323812D1 (de) 1999-04-15
DE69323812T2 DE69323812T2 (de) 1999-08-26

Family

ID=17017352

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69323812T Expired - Lifetime DE69323812T2 (de) 1992-08-14 1993-08-04 Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern

Country Status (4)

Country Link
US (1) US5410005A (de)
EP (1) EP0583918B1 (de)
KR (1) KR100249445B1 (de)
DE (1) DE69323812T2 (de)

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* Cited by examiner, † Cited by third party
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WO1995010798A1 (en) * 1993-10-12 1995-04-20 Hoechst Celanese Corporation Top anti-reflective coating films
JP3099646B2 (ja) * 1994-09-01 2000-10-16 ブラザー工業株式会社 インクジェット装置の製造方法
US5525457A (en) * 1994-12-09 1996-06-11 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
EP0794199A3 (de) * 1996-03-07 1999-10-20 Wako Pure Chemical Industries, Ltd Funktionelle Polymere
US5652317A (en) * 1996-08-16 1997-07-29 Hoechst Celanese Corporation Antireflective coatings for photoresist compositions
US5708095A (en) * 1996-08-30 1998-01-13 E. I. Du Pont De Nemours And Company Graft copolymers containing sulfonate and phosphonate groups having particular utility as pigmented ink dispersants
US5879863A (en) * 1997-01-22 1999-03-09 Kabushiki Kaisha Toshiba Pattern forming method
US6190839B1 (en) 1998-01-15 2001-02-20 Shipley Company, L.L.C. High conformality antireflective coating compositions
US6242161B1 (en) * 1998-05-29 2001-06-05 Jsr Corporation Acrylic copolymer and reflection-preventing film-forming composition containing the same
US6316113B1 (en) 1999-06-16 2001-11-13 Xerox Corporation Flexible loop leveling blade for flow coating process for manufacture of polymeric printer roll and belt components
KR20020038283A (ko) * 2000-11-17 2002-05-23 박종섭 포토레지스트 단량체, 그의 중합체 및 이를 함유하는포토레지스트 조성물
JP3509760B2 (ja) * 2001-02-08 2004-03-22 株式会社半導体先端テクノロジーズ 半導体装置の製造方法
KR20030059970A (ko) * 2002-01-04 2003-07-12 주식회사 몰커스 패턴 무너짐 현상을 극복하기 위한 유기 난반사 방지막조성물 및 이를 이용한 패턴 형성방법
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法
KR101041285B1 (ko) * 2004-01-15 2011-06-14 제이에스알 가부시끼가이샤 액침용 상층막 형성 조성물 및 포토레지스트 패턴 형성방법
JP4355944B2 (ja) * 2004-04-16 2009-11-04 信越化学工業株式会社 パターン形成方法及びこれに用いるレジスト上層膜材料
US20060008731A1 (en) * 2004-07-09 2006-01-12 Michael Van Der Puy Novel photoresist monomers and polymers
US20060008730A1 (en) * 2004-07-09 2006-01-12 Puy Michael V D Monomers for photoresists bearing acid-labile groups of reduced optical density
EP2277929B1 (de) * 2004-09-30 2012-11-21 JSR Corporation Copolymer und oberfilmbildende Zusammensetzung
KR100574993B1 (ko) * 2004-11-19 2006-05-02 삼성전자주식회사 포토레지스트용 탑 코팅 조성물과 이를 이용한포토레지스트 패턴 형성 방법
JP4322205B2 (ja) * 2004-12-27 2009-08-26 東京応化工業株式会社 レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
JP4724427B2 (ja) * 2005-01-27 2011-07-13 富士フイルム株式会社 塗布組成物、光学フィルム、反射防止フィルム、偏光板およびそれらを用いたディスプレイ装置
JP4595606B2 (ja) * 2005-03-17 2010-12-08 Ｊｓｒ株式会社 反射防止膜形成用組成物、積層体およびレジストパターンの形成方法
KR101365275B1 (ko) * 2006-10-13 2014-02-26 제이에스알 가부시끼가이샤 상층막 형성용 조성물 및 포토레지스트 패턴 형성 방법
US20090035704A1 (en) * 2007-08-03 2009-02-05 Hong Zhuang Underlayer Coating Composition Based on a Crosslinkable Polymer
US8039201B2 (en) * 2007-11-21 2011-10-18 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US20100015550A1 (en) * 2008-07-17 2010-01-21 Weihong Liu Dual damascene via filling composition
US20100272658A1 (en) 2009-04-27 2010-10-28 Akzo Nobel Chemicals International B.V. Enhanced efficiency of sunscreen compositions
US8445181B2 (en) 2010-06-03 2013-05-21 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
KR101807198B1 (ko) * 2010-11-09 2017-12-11 주식회사 동진쎄미켐 극자외선 리소그라피용 포토레지스트 탑코트 조성물과 이를 이용하는 패턴 형성 방법
US8563672B2 (en) * 2010-12-17 2013-10-22 E I Du Pont De Nemours And Company Process for producing fluorinated copolymers of (meth)acrylates and (meth)acrylic acid amine complexes
FR2986004B1 (fr) * 2012-01-25 2014-03-14 Seppic Sa Nouveau polymere epaississant reduisant le caractere collant des formules cosmetiques a base de glycerine
KR102095314B1 (ko) * 2015-09-30 2020-03-31 후지필름 가부시키가이샤 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 적층체

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1175420A (en) * 1967-02-15 1969-12-23 Minnesota Mining & Mfg Fluorine-Containing Polymers
JPS6029724B2 (ja) * 1977-05-13 1985-07-12 旭硝子株式会社 撥水撥油性の優れた重合体の製造方法
JPH02202904A (ja) * 1989-02-02 1990-08-13 Daikin Ind Ltd 含フツ素メタクリル酸エステル系重合体及びレジスト材料
DE4027594A1 (de) * 1990-08-31 1992-03-05 Herberts Gmbh Wasserverduennbares copolymerisat, dessen herstellung und verwendung, sowie waessrige ueberzugsmittel
DE69214035T2 (de) * 1991-06-28 1997-04-10 Ibm Reflexionsverminderde Überzüge
US5139879A (en) * 1991-09-20 1992-08-18 Allied-Signal Inc. Fluoropolymer blend anti-reflection coatings and coated articles
US5118579A (en) * 1991-09-20 1992-06-02 Allied-Signal Inc. Fluoropolymer blends for coatings

Also Published As

Publication number Publication date
KR100249445B1 (ko) 2000-06-01
US5410005A (en) 1995-04-25
EP0583918B1 (de) 1999-03-10
KR940004384A (ko) 1994-03-15
DE69323812T2 (de) 1999-08-26
EP0583918A2 (de) 1994-02-23
EP0583918A3 (de) 1995-04-19

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