DE69426096D1 - Verfahren zur Bildung von mehrfachen Schichten - Google Patents

Verfahren zur Bildung von mehrfachen Schichten

Info

Publication number
DE69426096D1
DE69426096D1 DE69426096T DE69426096T DE69426096D1 DE 69426096 D1 DE69426096 D1 DE 69426096D1 DE 69426096 T DE69426096 T DE 69426096T DE 69426096 T DE69426096 T DE 69426096T DE 69426096 D1 DE69426096 D1 DE 69426096D1
Authority
DE
Germany
Prior art keywords
multiple layers
forming multiple
forming
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69426096T
Other languages
English (en)
Other versions
DE69426096T2 (de
Inventor
Shinji Uchida
Tsuguhiro Korenaga
Hideo Kurokawa
Akito Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69426096D1 publication Critical patent/DE69426096D1/de
Publication of DE69426096T2 publication Critical patent/DE69426096T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69426096T 1993-07-15 1994-07-13 Verfahren zur Bildung von mehrfachen Schichten Expired - Fee Related DE69426096T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17542393A JP3405562B2 (ja) 1993-07-15 1993-07-15 多層膜の成膜装置並びに光学特性の測定方法及び成膜方法

Publications (2)

Publication Number Publication Date
DE69426096D1 true DE69426096D1 (de) 2000-11-16
DE69426096T2 DE69426096T2 (de) 2001-05-10

Family

ID=15995843

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69426096T Expired - Fee Related DE69426096T2 (de) 1993-07-15 1994-07-13 Verfahren zur Bildung von mehrfachen Schichten

Country Status (4)

Country Link
US (1) US5863379A (de)
EP (1) EP0634626B1 (de)
JP (1) JP3405562B2 (de)
DE (1) DE69426096T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3745790B2 (ja) * 1995-05-15 2006-02-15 株式会社デンソー 光情報記録媒体の製造装置及び製造方法
JP3625736B2 (ja) * 2000-04-27 2005-03-02 古河電気工業株式会社 光学フィルタの製造方法
FR2816714B1 (fr) * 2000-11-16 2003-10-10 Shakticom Procede et dispositif de depot de couches minces
WO2002061169A1 (fr) * 2001-02-01 2002-08-08 Nikon Corporation Procede et dispositif pour former un film et procede de fabrication d'un element optique
US6558735B2 (en) * 2001-04-20 2003-05-06 Eastman Kodak Company Reusable mass-sensor in manufacture of organic light-emitting devices
US6513451B2 (en) * 2001-04-20 2003-02-04 Eastman Kodak Company Controlling the thickness of an organic layer in an organic light-emiting device
US6589804B1 (en) * 2001-07-12 2003-07-08 Advanced Micro Devices, Inc. Oxide/nitride or oxide/nitride/oxide thickness measurement using scatterometry
TW584742B (en) * 2002-01-25 2004-04-21 Alps Electric Co Ltd Multilayer film optical filter, method of producing the same, and optical component using the same
CN100487948C (zh) * 2004-03-03 2009-05-13 三洋电机株式会社 测定沉积膜厚度的方法及装置和形成材料层的方法及装置
JP4924311B2 (ja) * 2007-09-11 2012-04-25 株式会社ニコン 成膜装置、およびそれを用いた成膜方法
JP4976979B2 (ja) 2007-10-18 2012-07-18 Ｇｋｎドライブラインジャパン株式会社 デファレンシャル装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
JPS5135679A (ja) * 1974-09-21 1976-03-26 Ulvac Corp Tasosumakukeiseisochiniokeru makuatsukanshisochi
DE2750421C2 (de) * 1977-11-11 1986-09-25 Leybold-Heraeus GmbH, 5000 Köln Meßverfahren und Meßvorrichtungen für die Herstellung von Vielfach-Schichtsystemen
JPH01259175A (ja) * 1988-04-09 1989-10-16 Ulvac Corp 多層膜成膜用プラズマｃｖｄ装置
US5410411A (en) 1992-01-17 1995-04-25 Matsushita Electric Industrial Co., Ltd. Method of and apparatus for forming multi-layer film
US5425964A (en) * 1994-07-22 1995-06-20 Rockwell International Corporation Deposition of multiple layer thin films using a broadband spectral monitor

Also Published As

Publication number Publication date
JP3405562B2 (ja) 2003-05-12
EP0634626A3 (de) 1996-10-16
EP0634626B1 (de) 2000-10-11
DE69426096T2 (de) 2001-05-10
US5863379A (en) 1999-01-26
JPH0734247A (ja) 1995-02-03
EP0634626A2 (de) 1995-01-18

Similar Documents

Publication Publication Date Title
DE69027206D1 (de) Verfahren zur bildung von epitaxialschichten
DE69431573D1 (de) Verfahren zur Herstellung von Schichten
DE69429068D1 (de) Verfahren zur Reduzierung von Farbübersprechen
DE69325889D1 (de) Verfahren zur Segmentierung von Bildmerkmalen
DE59405731D1 (de) Verfahren zur herstellung von funktionellen glasartigen schichten
DE19581484T1 (de) Vorrichtung zur Bildung von Dünnschichten
DE69413270D1 (de) Verfahren zur Tonerherstellung
DE69602300D1 (de) Verfahren zur Abscheidung von Kohlenstoffschichten
DE69618310D1 (de) Verfahren zur Selektion von Adsorptionsmitteln
DE69603255D1 (de) Verfahren zur modifizierung von oberflächen
DE19581482T1 (de) Verfahren und Ausrüstung zur Bildung von Dünnschichten
DE69410932D1 (de) Verfahren zur Herstellung von Strickwaren
DE69412434D1 (de) Verfahren zur Reinigung von Phenol
DE69400609D1 (de) Verfahren zur Bildung Si-0 enthaltender Überzüge
DE69428124D1 (de) Verfahren zur herstellung von perhalofluorierten butanen
DE69228044D1 (de) Verfahren zur Strukturierung von Wolframschichten
DE59406145D1 (de) Verfahren zur gewinnung von adsorptionsmaterial
ATA150594A (de) Verfahren zur kristallisation von iopamidol
DE69502137D1 (de) Verfahren zur Methathesis von Olefinen
DE69331777D1 (de) Verfahren zur herstellung von tetrakisfluorophenylborat
DE69613322D1 (de) Verfahren zur Verbindung von Strukturelementen
DE59406740D1 (de) Verfahren zur herstellung von polytetrahydrofuran
DE69504563D1 (de) Verfahren zur Herstellung von Dünnschichten
DE69426096D1 (de) Verfahren zur Bildung von mehrfachen Schichten
DE69430338D1 (de) Verfahren zur Spectrometrie

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee