DE69420565D1 - Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor - Google Patents

Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor

Info

Publication number
DE69420565D1
DE69420565D1 DE69420565T DE69420565T DE69420565D1 DE 69420565 D1 DE69420565 D1 DE 69420565D1 DE 69420565 T DE69420565 T DE 69420565T DE 69420565 T DE69420565 T DE 69420565T DE 69420565 D1 DE69420565 D1 DE 69420565D1
Authority
DE
Germany
Prior art keywords
driver circuit
power transistor
semiconductor components
electronic semiconductor
electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69420565T
Other languages
English (en)
Other versions
DE69420565T2 (de
Inventor
Giovanna Cacciola
Salvatore Leonardi
Gianpiero Montalbano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CORIMME Consorzio per Ricerca Sulla Microelettronica nel Mezzogiorno
Original Assignee
CORIMME Consorzio per Ricerca Sulla Microelettronica nel Mezzogiorno
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CORIMME Consorzio per Ricerca Sulla Microelettronica nel Mezzogiorno filed Critical CORIMME Consorzio per Ricerca Sulla Microelettronica nel Mezzogiorno
Publication of DE69420565D1 publication Critical patent/DE69420565D1/de
Application granted granted Critical
Publication of DE69420565T2 publication Critical patent/DE69420565T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0928—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising both N- and P- wells in the substrate, e.g. twin-tub
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Element Separation (AREA)
DE69420565T 1994-10-27 1994-10-27 Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor Expired - Fee Related DE69420565T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP94830505A EP0709890B1 (de) 1994-10-27 1994-10-27 Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor

Publications (2)

Publication Number Publication Date
DE69420565D1 true DE69420565D1 (de) 1999-10-14
DE69420565T2 DE69420565T2 (de) 2000-03-30

Family

ID=8218558

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69420565T Expired - Fee Related DE69420565T2 (de) 1994-10-27 1994-10-27 Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor

Country Status (4)

Country Link
US (2) US5708290A (de)
EP (1) EP0709890B1 (de)
JP (1) JPH08274183A (de)
DE (1) DE69420565T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112289787A (zh) * 2020-09-17 2021-01-29 南京通华芯微电子有限公司 一种具有多种控制功能的mos器件

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5896313A (en) * 1997-06-02 1999-04-20 Micron Technology, Inc. Vertical bipolar SRAM cell, array and system, and a method of making the cell and the array
DE19752848C2 (de) * 1997-11-28 2003-12-24 Infineon Technologies Ag Elektrisch entkoppelter Feldeffekt-Transistor in Dreifach-Wanne und Verwendung desselben
IT1298516B1 (it) * 1998-01-30 2000-01-12 Sgs Thomson Microelectronics Dispositivo elettronico di potenza integrato su un materiale semiconduttore e relativo processo di fabricazione
US6495423B1 (en) 1999-08-26 2002-12-17 Stmicroelectronics S.R.L. Electronic power device monolithically integrated on a semiconductor and comprising edge protection structures having a limited planar dimension
US6451655B1 (en) 1999-08-26 2002-09-17 Stmicroelectronics S.R.L. Electronic power device monolithically integrated on a semiconductor and comprising a first power region and at least a second region as well as an isolation structure of limited planar dimension
US6245609B1 (en) * 1999-09-27 2001-06-12 Taiwan Semiconductor Manufacturing Company High voltage transistor using P+ buried layer
JP2002324846A (ja) * 2001-04-25 2002-11-08 Sanken Electric Co Ltd 半導体装置及びその製造方法
JP2003258119A (ja) * 2002-03-07 2003-09-12 Seiko Epson Corp 半導体装置の製造方法
US6661042B2 (en) * 2002-03-11 2003-12-09 Monolithic System Technology, Inc. One-transistor floating-body DRAM cell in bulk CMOS process with electrically isolated charge storage region
US6686624B2 (en) 2002-03-11 2004-02-03 Monolithic System Technology, Inc. Vertical one-transistor floating-body DRAM cell in bulk CMOS process with electrically isolated charge storage region
US6946720B2 (en) * 2003-02-13 2005-09-20 Intersil Americas Inc. Bipolar transistor for an integrated circuit having variable value emitter ballast resistors
JP2006013450A (ja) * 2004-05-27 2006-01-12 Renesas Technology Corp 半導体装置およびその製造方法
JP4890838B2 (ja) * 2005-11-17 2012-03-07 ルネサスエレクトロニクス株式会社 半導体集積回路のレイアウト設計方法、及びレイアウト設計ツール
JP2008042013A (ja) * 2006-08-08 2008-02-21 Sanyo Electric Co Ltd 半導体装置の製造方法
JP5119626B2 (ja) * 2006-08-18 2013-01-16 富士通セミコンダクター株式会社 電気ヒューズ回路
US9029750B1 (en) * 2011-08-02 2015-05-12 Northrop Grumman Systems Corporation CMOS and CCD sensor R/O with high gain and no kTC noise

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0618255B2 (ja) * 1984-04-04 1994-03-09 株式会社東芝 半導体装置
JPS63198367A (ja) * 1987-02-13 1988-08-17 Toshiba Corp 半導体装置
IT1221587B (it) * 1987-09-07 1990-07-12 S G S Microelettronics Spa Procedimento di fabbricazione di un dispositivo integrato monolitico a semiconduttore avente strati epitas siali a bassa concentrazione di impurita'
US5512774A (en) * 1988-02-08 1996-04-30 Kabushiki Kaisha Toshiba Dielectrically isolated substrate and semiconductor device using the same
IT1228900B (it) * 1989-02-27 1991-07-09 Sgs Thomson Microelectronics Struttura integrata monolitica per sistema di pilotaggio a due stadi con componente circuitale traslatore di livello del segnale di pilotaggio per transistori di potenza.
JPH07109861B2 (ja) * 1990-01-19 1995-11-22 株式会社東芝 電荷転送デバイスを含む半導体装置およびその製造方法
JP3216206B2 (ja) * 1992-03-30 2001-10-09 株式会社デンソー 半導体装置及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112289787A (zh) * 2020-09-17 2021-01-29 南京通华芯微电子有限公司 一种具有多种控制功能的mos器件
CN112289787B (zh) * 2020-09-17 2024-01-26 南京通华芯微电子有限公司 一种具有多种控制功能的mos器件

Also Published As

Publication number Publication date
US6033947A (en) 2000-03-07
JPH08274183A (ja) 1996-10-18
DE69420565T2 (de) 2000-03-30
EP0709890A1 (de) 1996-05-01
US5708290A (en) 1998-01-13
EP0709890B1 (de) 1999-09-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee