DE69325287D1 - Verfahren zur herstellung von mikrolinsen - Google Patents

Verfahren zur herstellung von mikrolinsen

Info

Publication number
DE69325287D1
DE69325287D1 DE69325287T DE69325287T DE69325287D1 DE 69325287 D1 DE69325287 D1 DE 69325287D1 DE 69325287 T DE69325287 T DE 69325287T DE 69325287 T DE69325287 T DE 69325287T DE 69325287 D1 DE69325287 D1 DE 69325287D1
Authority
DE
Germany
Prior art keywords
micro lenses
producing micro
producing
lenses
micro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69325287T
Other languages
English (en)
Other versions
DE69325287T2 (de
Inventor
George Gal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lockheed Martin Corp
Original Assignee
Lockheed Corp
Lockheed Martin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lockheed Corp, Lockheed Martin Corp filed Critical Lockheed Corp
Application granted granted Critical
Publication of DE69325287D1 publication Critical patent/DE69325287D1/de
Publication of DE69325287T2 publication Critical patent/DE69325287T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0031Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0056Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12002Three-dimensional structures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/124Geodesic lenses or integrated gratings
    • G02B6/1245Geodesic lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/136Integrated optical circuits characterised by the manufacturing method by etching
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06Metal compounds
    • C10M2201/065Sulfides; Selenides; Tellurides
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06Metal compounds
    • C10M2201/065Sulfides; Selenides; Tellurides
    • C10M2201/066Molybdenum sulfide
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/10Carboxylix acids; Neutral salts thereof
    • C10M2207/12Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/125Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of eight up to twenty-nine carbon atoms, i.e. fatty acids
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/10Carboxylix acids; Neutral salts thereof
    • C10M2207/12Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/129Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of thirty or more carbon atoms
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2211/00Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2211/06Perfluorinated compounds
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/02Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen and halogen only
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/04Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/06Perfluoro polymers
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/06Perfluoro polymers
    • C10M2213/062Polytetrafluoroethylene [PTFE]
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/02Bearings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083Constructional arrangements
    • G02B2006/12102Lens
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083Constructional arrangements
    • G02B2006/12104Mirror; Reflectors or the like
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133Functions
    • G02B2006/12147Coupler
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133Functions
    • G02B2006/12154Power divider
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166Manufacturing methods
    • G02B2006/12173Masking
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166Manufacturing methods
    • G02B2006/12176Etching
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166Manufacturing methods
    • G02B2006/12195Tapering

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Optical Integrated Circuits (AREA)
DE69325287T 1992-11-27 1993-10-15 Verfahren zur herstellung von mikrolinsen Expired - Lifetime DE69325287T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/982,514 US5310623A (en) 1992-11-27 1992-11-27 Method for fabricating microlenses
PCT/US1993/009896 WO1994012911A1 (en) 1992-11-27 1993-10-15 Method and apparatus for fabricating microlenses

Publications (2)

Publication Number Publication Date
DE69325287D1 true DE69325287D1 (de) 1999-07-15
DE69325287T2 DE69325287T2 (de) 1999-09-30

Family

ID=25529239

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69325287T Expired - Lifetime DE69325287T2 (de) 1992-11-27 1993-10-15 Verfahren zur herstellung von mikrolinsen

Country Status (5)

Country Link
US (3) US5310623A (de)
EP (1) EP0671024B1 (de)
JP (1) JP3373518B2 (de)
DE (1) DE69325287T2 (de)
WO (1) WO1994012911A1 (de)

Families Citing this family (109)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6749864B2 (en) * 1986-02-13 2004-06-15 Takeda Chemical Industries, Ltd. Stabilized pharmaceutical composition
US5444572A (en) * 1992-11-27 1995-08-22 Lockheed Missiles & Space Company, Inc. Wavefront corrector for scanning microlens arrays
CA2130738A1 (en) * 1993-11-01 1995-05-02 Keith Wayne Goossen Method and arrangement for arbitrary angle mirrors in substrates for use in hybrid optical systems
US5536455A (en) * 1994-01-03 1996-07-16 Omron Corporation Method of manufacturing lens array
US6392808B1 (en) * 1994-02-28 2002-05-21 Digital Optics Corporation Broad band controlled angle analog diffuser and associated methods
FR2722304B1 (fr) * 1994-07-06 1996-08-14 Commissariat Energie Atomique Procede de realisation de guides d'onde circulares et enterres, et dispositifs associes.
IL115295A0 (en) 1995-09-14 1996-12-05 Yeda Res & Dev Multilevel diffractive optical element
US5761364A (en) * 1995-11-02 1998-06-02 Motorola, Inc. Optical waveguide
DE19602736A1 (de) * 1996-01-26 1997-07-31 Inst Mikrotechnik Mainz Gmbh Verfahren und Vorrichtung zur Herstellung von optischen Linsen und optischen Linsenarrays
WO1997028473A1 (de) * 1996-02-03 1997-08-07 Robert Bosch Gmbh Verfahren zur herstellung von optischen bauelementen und optisches bauelement
US5718830A (en) * 1996-02-15 1998-02-17 Lucent Technologies Inc. Method for making microlenses
US5932397A (en) * 1996-05-28 1999-08-03 Rvm Scientific, Inc. Multicolor lithography for control of three dimensional refractive index gradient processing
US6562523B1 (en) 1996-10-31 2003-05-13 Canyon Materials, Inc. Direct write all-glass photomask blanks
AU729612B2 (en) * 1996-11-19 2001-02-08 Alcatel Optical waveguide with Bragg grating
US6107000A (en) * 1996-12-17 2000-08-22 Board Of Regents - University Of California - San Diego Method for producing micro-optic elements with gray scale mask
WO1998033222A1 (en) * 1997-01-27 1998-07-30 Corning Incorporated Rigid battery separator with compliant layer
US6420073B1 (en) 1997-03-21 2002-07-16 Digital Optics Corp. Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask
US6071652A (en) * 1997-03-21 2000-06-06 Digital Optics Corporation Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
US5998066A (en) * 1997-05-16 1999-12-07 Aerial Imaging Corporation Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
US6043481A (en) * 1997-04-30 2000-03-28 Hewlett-Packard Company Optoelectronic array device having a light transmissive spacer layer with a ridged pattern and method of making same
FR2766582A1 (fr) 1997-07-23 1999-01-29 Corning Inc Methode de fabrication de composant optique et composant optique fabrique selon cette methode
US5966478A (en) * 1997-09-17 1999-10-12 Lucent Technologies Inc. Integrated optical circuit having planar waveguide turning mirrors
US6534221B2 (en) 1998-03-28 2003-03-18 Gray Scale Technologies, Inc. Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
US6410213B1 (en) 1998-06-09 2002-06-25 Corning Incorporated Method for making optical microstructures having profile heights exceeding fifteen microns
US6613498B1 (en) * 1998-09-17 2003-09-02 Mems Optical Llc Modulated exposure mask and method of using a modulated exposure mask
US6259567B1 (en) 1998-11-23 2001-07-10 Mems Optical Inc. Microlens structure having two anamorphic surfaces on opposing ends of a single high index substances and method of fabricating the same
US6558878B1 (en) * 1999-07-08 2003-05-06 Korea Electronics Technology Institute Microlens manufacturing method
US6487017B1 (en) 1999-07-23 2002-11-26 Bae Systems Information And Electronic Systems Integration, Inc Trimodal microlens
US6665027B1 (en) 1999-07-23 2003-12-16 Bae Systems Information And Electronic System Integration Inc Color liquid crystal display having diffractive color separation microlenses
US6618106B1 (en) 1999-07-23 2003-09-09 Bae Systems Information And Electronics Systems Integration, Inc Sunlight viewable color liquid crystal display using diffractive color separation microlenses
US6464365B1 (en) 1999-07-23 2002-10-15 Bae Systems Information And Electronic Systems Integration Inc. Light collimator for liquid crystal displays
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
DE19956654B4 (de) * 1999-11-25 2005-04-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Strukturierung von Oberflächen von mikromechanischen und/oder mikrooptischen Bauelementen und/oder Funktionselementen aus glasartigen Materialien
US6355399B1 (en) * 2000-01-18 2002-03-12 Chartered Semiconductor Manufacturing Ltd. One step dual damascene patterning by gray tone mask
TW575786B (en) * 2000-03-14 2004-02-11 Takashi Nishi Exposure controlling photomask and production method thereof
AU2001245787A1 (en) 2000-03-17 2001-10-03 Zograph, Llc High acuity lens system
US6301051B1 (en) * 2000-04-05 2001-10-09 Rockwell Technologies, Llc High fill-factor microlens array and fabrication method
JP4678640B2 (ja) * 2000-05-01 2011-04-27 リコー光学株式会社 濃度分布マスクとそれを用いた3次元構造体製造方法
JP4557373B2 (ja) * 2000-06-13 2010-10-06 リコー光学株式会社 濃度分布マスクを用いた3次元構造体製造方法
US6780570B2 (en) 2000-06-28 2004-08-24 Institut National D'optique Method of fabricating a suspended micro-structure with a sloped support
US6635412B2 (en) * 2000-07-11 2003-10-21 Martin A. Afromowitz Method for fabricating 3-D structures with smoothly-varying topographic features in photo-sensitized epoxy resists
AU2002222920A1 (en) * 2000-07-13 2002-01-30 Seagate Technology Llc Method for topographical patterning of a device
EP1269158A2 (de) 2000-07-21 2003-01-02 Vir A/S Kopplungselemente für oberflächenplasmonen-resonanz-sensoren
US6613243B2 (en) 2000-07-25 2003-09-02 Shipley Company, L.L.C. Method of making a 3-D structure using an erodable mask formed from a film having a composition that varies in its direction of thickness
US6661581B1 (en) 2000-09-29 2003-12-09 Rockwell Scientific Company Graded index microlenses and methods of design and formation
US6629292B1 (en) 2000-10-06 2003-09-30 International Business Machines Corporation Method for forming graphical images in semiconductor devices
WO2002031600A1 (en) * 2000-10-10 2002-04-18 Mems Optical, Inc. Deep grayscale etching of silicon
US6759173B2 (en) 2000-10-26 2004-07-06 Shipley Company, L.L.C. Single mask process for patterning microchip having grayscale and micromachined features
WO2002037146A1 (en) * 2000-11-03 2002-05-10 Mems Optical Inc. Anti-reflective structures
JP4570007B2 (ja) * 2001-09-26 2010-10-27 大日本印刷株式会社 微小な集光レンズの形成方法
US20030209819A1 (en) * 2001-11-02 2003-11-13 Brown David R. Process for making micro-optical elements from a gray scale etched master mold
FR2836558B1 (fr) * 2002-02-22 2004-10-29 Teem Photonics Masque permettant la fabrication d'un guide optique a enterrage variable et procede d'utilisation dudit masque pour obtenir le guide a enterrage variable
DE10392340T5 (de) * 2002-03-05 2005-04-07 Corning Incorporated Optische Elemente und Verfahren zum Vorhersagen der Leistung eines optischen Elements und optischen Systems
AU2003220148A1 (en) * 2002-03-14 2003-09-29 Corning Incorporated Fiber array and methods of fabrication
US7531104B1 (en) 2002-03-20 2009-05-12 Ruey-Jen Hwu Micro-optic elements and method for making the same
US7062135B2 (en) 2002-03-21 2006-06-13 Corning Incorporated Method for fabricating curved elements
US6875695B2 (en) * 2002-04-05 2005-04-05 Mems Optical Inc. System and method for analog replication of microdevices having a desired surface contour
KR20040102089A (ko) * 2002-04-15 2004-12-03 코닌클리케 필립스 일렉트로닉스 엔.브이. 이미징 방법
EP1499915A2 (de) * 2002-04-29 2005-01-26 E.I. Du Pont De Nemours And Company Durch effektiven brechungsindex periodenmoduliertes bragggitter
KR100450935B1 (ko) * 2002-07-03 2004-10-02 삼성전자주식회사 테이퍼형 광도파로 제조방법
US20040012978A1 (en) * 2002-07-18 2004-01-22 Yutaka Doi Direct deposition waveguide mirror
JP2006502439A (ja) * 2002-10-04 2006-01-19 コーニング インコーポレイテッド レンズアレイ、そのレンズアレイの製造方法および感光性ガラスプレート
US7017351B2 (en) * 2002-11-21 2006-03-28 Mems Optical, Inc. Miniature thermoacoustic cooler
DE10260819A1 (de) * 2002-12-23 2004-07-01 Carl Zeiss Smt Ag Verfahren zur Herstellung von mikrostrukturierten optischen Elementen
US6828068B2 (en) * 2003-01-23 2004-12-07 Photronics, Inc. Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
JP4296943B2 (ja) 2003-01-28 2009-07-15 ソニー株式会社 露光用マスクの製造方法および露光方法ならびに3次元形状の製造方法
US7786983B2 (en) 2003-04-08 2010-08-31 Poa Sana Liquidating Trust Apparatus and method for a data input device using a light lamina screen
US20050036728A1 (en) * 2003-08-12 2005-02-17 Henning Braunisch Curved surface for improved optical coupling between optoelectronic device and waveguide
US20050257709A1 (en) * 2003-08-28 2005-11-24 Tony Mule Systems and methods for three-dimensional lithography and nano-indentation
DE10340271B4 (de) * 2003-08-29 2019-01-17 Osram Opto Semiconductors Gmbh Dünnschicht-Leuchtdiodenchip und Verfahren zu seiner Herstellung
US7585596B1 (en) 2003-10-16 2009-09-08 Eric G. Johnson Micro-sculpting using phase masks for projection lithography
US7509011B2 (en) * 2004-01-15 2009-03-24 Poa Sana Liquidating Trust Hybrid waveguide
US7329481B2 (en) * 2004-01-23 2008-02-12 Fujitsu Limited Substrate optical waveguides having fiber-like shape and methods of making the same
US7267930B2 (en) * 2004-06-04 2007-09-11 National Semiconductor Corporation Techniques for manufacturing a waveguide with a three-dimensional lens
US7471865B2 (en) * 2004-06-04 2008-12-30 Poa Sana Liquidating Trust Apparatus and method for a molded waveguide for use with touch screen displays
US7676131B2 (en) * 2004-06-04 2010-03-09 Poa Sana Liquidating Trust Waveguide with a three-dimensional lens
US6979521B1 (en) 2004-06-29 2005-12-27 Matsushita Electric Industrial Co., Ltd. Method of making grayscale mask for grayscale DOE production by using an absorber layer
JP2006065163A (ja) * 2004-08-30 2006-03-09 Omron Corp 光導波路装置
KR100651560B1 (ko) * 2004-11-16 2006-11-29 삼성전자주식회사 평면광파회로 및 그 제작 방법
JP4882224B2 (ja) * 2004-11-26 2012-02-22 ソニー株式会社 固体撮像装置の製造方法
US7376169B2 (en) * 2005-03-07 2008-05-20 Joseph Reid Henrichs Optical phase conjugation laser diode
JP4641835B2 (ja) * 2005-03-16 2011-03-02 リコー光学株式会社 位相シフター光学素子の製造方法及び得られる素子
JP4572821B2 (ja) 2005-11-30 2010-11-04 セイコーエプソン株式会社 グレイスケールマスク、マイクロレンズの製造方法
KR101032278B1 (ko) * 2006-06-29 2011-05-06 아사히 가세이 일렉트로닉스 가부시끼가이샤 플라스틱 렌즈의 제조 방법
US20080031584A1 (en) * 2006-08-02 2008-02-07 National Semiconductor Corporation Apparatus and method for a singulation of polymer waveguides using photolithography
JP4910590B2 (ja) 2006-09-15 2012-04-04 大日本印刷株式会社 パターン形成体の製造方法
KR100826452B1 (ko) * 2006-12-18 2008-04-29 삼성전기주식회사 광학 부품 및 그 제조방법
JP4607944B2 (ja) * 2007-04-17 2011-01-05 キヤノン株式会社 マスクパターンデータの生成方法、情報処理装置、フォトマスク作製システム、及び、マイクロレンズアレイの製造方法
US8236480B2 (en) * 2007-05-24 2012-08-07 The United States of America, as represented by the Secretary of Commere, the National Institute of Standards and Technology Fabrication method of topographically modulated microstructures using pattern homogenization with UV light
US20080309900A1 (en) * 2007-06-12 2008-12-18 Micron Technology, Inc. Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure
US8372578B2 (en) * 2007-10-09 2013-02-12 The United States Of America, As Represented By The Secretary Of The Navy Gray-tone lithography using optical diffusers
US7968959B2 (en) * 2008-10-17 2011-06-28 The United States Of America As Represented By The Secretary Of The Navy Methods and systems of thick semiconductor drift detector fabrication
US8071275B2 (en) * 2008-04-10 2011-12-06 Lexmark International, Inc. Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods
US7920329B2 (en) * 2008-06-20 2011-04-05 Aptina Imaging Corporation Embedded lens for achromatic wafer-level optical module and methods of forming the same
US20100034072A1 (en) * 2008-08-07 2010-02-11 Panasonic Corporation Fresnel member having variable sag for multiple wavelength optical system
US8284506B2 (en) 2008-10-21 2012-10-09 Gentex Corporation Apparatus and method for making and assembling a multi-lens optical device
JP2010175697A (ja) * 2009-01-28 2010-08-12 Toppan Printing Co Ltd 濃度分布マスク
JP5402316B2 (ja) * 2009-06-26 2014-01-29 富士ゼロックス株式会社 フォトマスク、及び光学素子の製造方法
JP5515843B2 (ja) * 2010-02-23 2014-06-11 凸版印刷株式会社 多層型ステンシルマスクの製造方法
US8861132B2 (en) 2010-07-06 2014-10-14 International Business Machines Corporation Low friction tape head and system implementing same
DE102010039757A1 (de) * 2010-08-25 2012-03-01 Carl Zeiss Ag Verfahren zur Herstellung einer eine gekrümmte Wirkfläche nachstellenden Fresnel-Struktur
US8679733B2 (en) * 2011-01-19 2014-03-25 International Business Machines Corporation Patterning process for small devices
JP5764948B2 (ja) * 2011-02-02 2015-08-19 株式会社ニコン グレースケールマスク
US9096426B2 (en) 2013-04-05 2015-08-04 The United States Of America As Represented By The Secretary Of The Army Electronic device structure and method of making electronic devices and integrated circuits using grayscale technology and multilayer thin-film composites
JP6409499B2 (ja) * 2014-10-24 2018-10-24 大日本印刷株式会社 パターンデータの作製方法およびフォトマスク
JP6409498B2 (ja) * 2014-10-24 2018-10-24 大日本印刷株式会社 パターンデータの作製方法
CN104793288A (zh) * 2015-04-30 2015-07-22 上海美维科技有限公司 一种含有光波导耦合器件的印制线路板的制造方法
CN110673261B (zh) * 2019-09-06 2021-01-22 上海大学 基于紫外灰阶光刻制备光波导球形凹面镜的方法
US11886001B2 (en) * 2019-12-20 2024-01-30 Snap Inc. Optical waveguide fabrication process

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3932184A (en) * 1973-05-29 1976-01-13 Bell Telephone Laboratories, Incorporated Fabrication of microlenses
US4279690A (en) * 1975-10-28 1981-07-21 Texas Instruments Incorporated High-radiance emitters with integral microlens
US4200794A (en) * 1978-11-08 1980-04-29 Control Data Corporation Micro lens array and micro deflector assembly for fly's eye electron beam tubes using silicon components and techniques of fabrication and assembly
JPS5565910A (en) * 1978-11-10 1980-05-17 Komatsu Denshi Kinzoku Kk Production of optical branching and coupling device
US4427265A (en) * 1980-06-27 1984-01-24 Canon Kabushiki Kaisha Diffusion plate
DE3125317A1 (de) * 1980-06-27 1982-04-01 Canon K.K., Tokyo Einstellscheibe
US4530736A (en) * 1983-11-03 1985-07-23 International Business Machines Corporation Method for manufacturing Fresnel phase reversal plate lenses
DE3575805D1 (de) * 1984-10-11 1990-03-08 Hitachi Ltd Halterung fuer optische linse.
JPS61113062A (ja) * 1984-11-07 1986-05-30 Nec Kyushu Ltd フオトマスク
US4691993A (en) * 1985-05-13 1987-09-08 Minnesota Mining And Manufacturing Company Transparent sheets containing directional images and method for forming the same
GB8519910D0 (en) * 1985-08-08 1985-09-18 Secr Defence Photolithographic masks
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
US4986633A (en) * 1987-09-22 1991-01-22 Brother Kogyo Kabushiki Kaisha Microlens and process for producing same
WO1989006596A1 (en) * 1988-01-13 1989-07-27 Eastman Kodak Company Method of making a thin lens
US5136164A (en) * 1988-10-13 1992-08-04 Mission Research Corporation Infrared detectors arrays with enhanced tolerance to ionizing nuclear radiation
US4983040A (en) * 1988-11-04 1991-01-08 The Research Foundation Of State University Of New York Light scattering and spectroscopic detector
WO1991002380A1 (en) * 1989-08-11 1991-02-21 Santa Barbara Research Center Method of fabricating a binary optics microlens upon a detector array
JPH03191348A (ja) * 1989-12-20 1991-08-21 Nec Corp 縮小投影露光用レティクル
US5135609A (en) * 1990-07-06 1992-08-04 The Board Of Trustees Of The Leland Stanford Junior University Quantum lithography mask and fabrication method
US5213916A (en) * 1990-10-30 1993-05-25 International Business Machines Corporation Method of making a gray level mask
US5273622A (en) * 1991-01-28 1993-12-28 Sarcos Group System for continuous fabrication of micro-structures and thin film semiconductor devices on elongate substrates
US5139609A (en) * 1991-02-11 1992-08-18 The Aerospace Corporation Apparatus and method for longitudinal diode bar pumping of solid state lasers
US5246800A (en) * 1991-09-12 1993-09-21 Etec Systems, Inc. Discrete phase shift mask writing
US5281305A (en) * 1992-05-22 1994-01-25 Northrop Corporation Method for the production of optical waveguides employing trench and fill techniques

Also Published As

Publication number Publication date
US5480764A (en) 1996-01-02
US5482800A (en) 1996-01-09
JP3373518B2 (ja) 2003-02-04
US5310623A (en) 1994-05-10
JPH08504515A (ja) 1996-05-14
EP0671024A1 (de) 1995-09-13
WO1994012911A1 (en) 1994-06-09
EP0671024B1 (de) 1999-06-09
DE69325287T2 (de) 1999-09-30

Similar Documents

Publication Publication Date Title
DE69325287T2 (de) Verfahren zur herstellung von mikrolinsen
DE69305634D1 (de) Verfahren zur herstellung von mikrostrukturen
ATE243211T1 (de) Verfahren zur herstellung von dihalogenazolopyrimidinen
DE59604922D1 (de) Verfahren zur herstellung von polyalkoholen
DE69604277T2 (de) Verfahren zur herstellung von nootkaton
DE69331269T2 (de) Verfahren zur herstellung von antikörpern
DE59601604D1 (de) Verfahren zur herstellung von n-aryl- und n-hetarylhydroxylaminen
DE59305905D1 (de) Verfahren zur herstellung von n-alkanoyl-polyhydroxyalkylaminen
DE69414253T2 (de) Verfahren zur herstellung von oximin
DE69327650D1 (de) Verfahren zur herstellung von chlordioxid
DE69616322D1 (de) Verfahren zur herstellung von 3-isochromanonen
DE59401406D1 (de) Verfahren zur herstellung von naphtalocyaninen
DE69116895D1 (de) Verfahren zur herstellung von dinitrotoluol
DE69615836T2 (de) Verfahren zur herstellung von boroxyd
DE69324697T2 (de) Verfahren zur herstellung von dinitrotoluol
DE59404478D1 (de) Verfahren zur herstellung von polyvinylpyridin-n-oxiden
DE69318307D1 (de) Verfahren zur herstellung von difluormethan
DE69418472D1 (de) Verfahren zur herstellung von goethit
DE69120394D1 (de) Verfahren zur herstellung von dichlorpentafluorpropan
DE69411012T2 (de) Verfahren zur herstellung von cumenhydroperoxyd
DE69315049T2 (de) Verfahren zur herstellung von alkadienolen
DE69308599D1 (de) Verfahren zur herstellung von 2-paradioxanonen
ATA235592A (de) Verfahren zur herstellung von arylhydantoinen
ATA13292A (de) Verfahren zur herstellung von ceftriaxondinatrium-salzhemiheptahydrat
ATA208790A (de) Verfahren zur herstellung von polysiloxanimiden

Legal Events

Date Code Title Description
8364 No opposition during term of opposition