DE69319366D1 - Elektrophotonische Vorrichtung mit Übertragung vertikal zur Oberfläche - Google Patents

Elektrophotonische Vorrichtung mit Übertragung vertikal zur Oberfläche

Info

Publication number
DE69319366D1
DE69319366D1 DE69319366T DE69319366T DE69319366D1 DE 69319366 D1 DE69319366 D1 DE 69319366D1 DE 69319366 T DE69319366 T DE 69319366T DE 69319366 T DE69319366 T DE 69319366T DE 69319366 D1 DE69319366 D1 DE 69319366D1
Authority
DE
Germany
Prior art keywords
vertical transmission
electrophotonic
electrophotonic device
transmission
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69319366T
Other languages
English (en)
Other versions
DE69319366T2 (de
Inventor
Hideo Kosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of DE69319366D1 publication Critical patent/DE69319366D1/de
Application granted granted Critical
Publication of DE69319366T2 publication Critical patent/DE69319366T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/10Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
    • H01L33/105Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector with a resonant cavity structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/12Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
    • H01L31/125Composite devices with photosensitive elements and electroluminescent elements within one single body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0262Photo-diodes, e.g. transceiver devices, bidirectional devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
DE69319366T 1992-04-10 1993-04-08 Elektrophotonische Vorrichtung mit Übertragung vertikal zur Oberfläche Expired - Fee Related DE69319366T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9099592A JP2874442B2 (ja) 1992-04-10 1992-04-10 面入出力光電融合素子

Publications (2)

Publication Number Publication Date
DE69319366D1 true DE69319366D1 (de) 1998-08-06
DE69319366T2 DE69319366T2 (de) 1998-10-22

Family

ID=14014092

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69319366T Expired - Fee Related DE69319366T2 (de) 1992-04-10 1993-04-08 Elektrophotonische Vorrichtung mit Übertragung vertikal zur Oberfläche

Country Status (4)

Country Link
US (1) US5293393A (de)
EP (1) EP0565374B1 (de)
JP (1) JP2874442B2 (de)
DE (1) DE69319366T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0674367B1 (de) * 1993-02-22 1997-12-29 Motorola, Inc. Oberflächenemittierender Laser mit vertikalem Resonator und seitlichem Brechungsindexwellenleiter
US5405710A (en) * 1993-11-22 1995-04-11 At&T Corp. Article comprising microcavity light sources
US5475701A (en) * 1993-12-29 1995-12-12 Honeywell Inc. Integrated laser power monitor
KR100259490B1 (ko) * 1995-04-28 2000-06-15 윤종용 광검출기 일체형 표면광 레이저와 이를 채용한 광픽업 장치
US5848088A (en) * 1995-07-11 1998-12-08 Seiko Epson Corporation Surface emission type semiconductor for laser with optical detector, method of manufacturing thereof, and sensor using the same
US5648979A (en) * 1995-12-29 1997-07-15 Samsung Electronics Co. Ltd. Assembly of VCSEL light source and VCSEL optical detector
CN1089292C (zh) * 1998-03-13 2002-08-21 明石被服兴业株式会社 布制品折痕增强带
US6081379A (en) * 1998-10-28 2000-06-27 Coherent, Inc. Multiple coupled Gires-Tournois interferometers for group-delay-dispersion control
DE10004398A1 (de) * 2000-02-02 2001-08-16 Infineon Technologies Ag VCSEL mit monolithisch integriertem Photodetektor
JP3652252B2 (ja) 2001-01-17 2005-05-25 キヤノン株式会社 半導体光装置
KR100940530B1 (ko) * 2003-01-17 2010-02-10 삼성전자주식회사 실리콘 광소자 제조방법 및 이에 의해 제조된 실리콘광소자 및 이를 적용한 화상 입력 및/또는 출력장치
US7831152B2 (en) * 2002-06-04 2010-11-09 Finisar Corporation Optical transceiver
KR20040076330A (ko) * 2003-02-25 2004-09-01 삼성전자주식회사 실리콘 광소자 및 이를 적용한 광신호 입출력장치
US6977954B2 (en) * 2003-07-25 2005-12-20 University Of Connecticut Semiconductor laser array device employing modulation doped quantum well structures
KR100612875B1 (ko) * 2004-11-24 2006-08-14 삼성전자주식회사 실리콘 광소자 제조방법 및 이에 의해 제조된 실리콘광소자 및 이를 적용한 화상 입력 및/또는 출력장치
KR20060059327A (ko) * 2004-11-27 2006-06-01 삼성전자주식회사 실리콘 광소자 제조방법 및 이에 의해 제조된 실리콘광소자 및 이를 적용한 화상 입력 및/또는 출력장치
JP5239568B2 (ja) * 2008-07-10 2013-07-17 三菱電機株式会社 半導体受光素子
JP2016085968A (ja) * 2014-10-24 2016-05-19 株式会社半導体エネルギー研究所 発光素子、発光装置、電子機器、及び照明装置
CN106201983B (zh) * 2016-07-15 2019-04-23 浪潮(北京)电子信息产业有限公司 一种计算机系统
JP7094694B2 (ja) * 2017-12-01 2022-07-04 キヤノン株式会社 発光素子アレイ及びこれを用いた露光ヘッドと画像形成装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8803080A (nl) * 1988-12-16 1990-07-16 Philips Nv Verstembare halfgeleiderdiodelaser met verdeelde reflectie en vervaardigingswijze van een dergelijke halfgeleiderdiodelaser.
US4949350A (en) * 1989-07-17 1990-08-14 Bell Communications Research, Inc. Surface emitting semiconductor laser
US5012486A (en) * 1990-04-06 1991-04-30 At&T Bell Laboratories Vertical cavity semiconductor laser with lattice-mismatched mirror stack
US5031188A (en) * 1990-04-30 1991-07-09 At&T Bell Laboratories Inline diplex lightwave transceiver
JP2596195B2 (ja) * 1990-08-20 1997-04-02 日本電気株式会社 垂直共振器型面入出力光電融合素子

Also Published As

Publication number Publication date
JPH05299689A (ja) 1993-11-12
EP0565374B1 (de) 1998-07-01
JP2874442B2 (ja) 1999-03-24
DE69319366T2 (de) 1998-10-22
US5293393A (en) 1994-03-08
EP0565374A1 (de) 1993-10-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee