DE69309814T2 - Antireflektive und antistatische Bekleidungschicht für eine Elektronenstrahlröhre - Google Patents

Antireflektive und antistatische Bekleidungschicht für eine Elektronenstrahlröhre

Info

Publication number
DE69309814T2
DE69309814T2 DE69309814T DE69309814T DE69309814T2 DE 69309814 T2 DE69309814 T2 DE 69309814T2 DE 69309814 T DE69309814 T DE 69309814T DE 69309814 T DE69309814 T DE 69309814T DE 69309814 T2 DE69309814 T2 DE 69309814T2
Authority
DE
Germany
Prior art keywords
antireflective
electron beam
beam tube
clothing layer
antistatic clothing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69309814T
Other languages
English (en)
Other versions
DE69309814D1 (de
Inventor
Touru Kinoshita
Kenji Takahashi
Tsuneo Yanagisawa
Masaru Uehara
Hitoshi Kimata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Cement Co Ltd
Original Assignee
Sumitomo Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4232336A external-priority patent/JP2859783B2/ja
Priority claimed from JP5023070A external-priority patent/JP2859790B2/ja
Priority claimed from JP13496893A external-priority patent/JP2892250B2/ja
Application filed by Sumitomo Cement Co Ltd filed Critical Sumitomo Cement Co Ltd
Application granted granted Critical
Publication of DE69309814D1 publication Critical patent/DE69309814D1/de
Publication of DE69309814T2 publication Critical patent/DE69309814T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/89—Optical or photographic arrangements structurally combined or co-operating with the vessel
    • H01J29/896—Anti-reflection means, e.g. eliminating glare due to ambient light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/88—Vessels; Containers; Vacuum locks provided with coatings on the walls thereof; Selection of materials for the coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
    • H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/89—Optical components associated with the vessel
    • H01J2229/8913—Anti-reflection, anti-glare, viewing angle and contrast improving treatments or devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/91—Antistatic compositions
DE69309814T 1992-08-31 1993-08-26 Antireflektive und antistatische Bekleidungschicht für eine Elektronenstrahlröhre Expired - Fee Related DE69309814T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4232336A JP2859783B2 (ja) 1992-08-31 1992-08-31 帯電防止・高屈折率膜形成用塗料および帯電防止・反射防止膜付き透明材料積層体および表示装置
JP5023070A JP2859790B2 (ja) 1993-02-10 1993-02-10 帯電防止・高屈折率膜形成用塗料および帯電防止・反射防止膜付き透明材料積層体および表示装置
JP13496893A JP2892250B2 (ja) 1993-06-04 1993-06-04 帯電防止・高屈折率膜形成用塗料、及び帯電防止・反射防止膜付き透明積層体並びに表示装置

Publications (2)

Publication Number Publication Date
DE69309814D1 DE69309814D1 (de) 1997-05-22
DE69309814T2 true DE69309814T2 (de) 1997-10-16

Family

ID=27284095

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69309814T Expired - Fee Related DE69309814T2 (de) 1992-08-31 1993-08-26 Antireflektive und antistatische Bekleidungschicht für eine Elektronenstrahlröhre

Country Status (6)

Country Link
US (2) US5446339A (de)
EP (1) EP0585819B1 (de)
KR (1) KR970001594B1 (de)
CN (1) CN1035262C (de)
DE (1) DE69309814T2 (de)
TW (1) TW265356B (de)

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US5773150A (en) * 1995-11-17 1998-06-30 Chunghwa Picture Tubes, Ltd. Polymeric antistatic coating for cathode ray tubes
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JP2000275409A (ja) 1999-01-18 2000-10-06 Sumitomo Metal Mining Co Ltd 低透過率透明性基材とその製造方法およびこの基材が適用された表示装置
KR100274883B1 (ko) * 1999-03-19 2000-12-15 김순택 음극선관
US6480250B1 (en) 1999-06-02 2002-11-12 Fuji Photo Film Co., Ltd. Low-reflection transparent conductive multi layer film having at least one transparent protective layer having anti-smudge properties
US6440331B1 (en) * 1999-06-03 2002-08-27 Electrochemicals Inc. Aqueous carbon composition and method for coating a non conductive substrate
DE10032631A1 (de) * 2000-07-05 2002-01-17 Bayer Ag Leitfähige, hochabriebfeste Beschichtungen, ein Verfahren zu deren Herstellung und deren Verwendung
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JP3692913B2 (ja) * 2000-07-24 2005-09-07 松下電器産業株式会社 陰極線管、陰極線管の製造方法
TWI300382B (de) * 2001-03-30 2008-09-01 Jsr Corp
US6623662B2 (en) 2001-05-23 2003-09-23 Chunghwa Picture Tubes, Ltd. Carbon black coating for CRT display screen with uniform light absorption
US6624564B2 (en) * 2001-05-25 2003-09-23 Chunghwa Picture Tubes, Ltd. Antistatic/antireflective coating for video display screen with adjustable light transmission
KR20020095890A (ko) * 2001-06-18 2002-12-28 주식회사 엘지이아이 음극선관의 코팅막 구조
US6746530B2 (en) 2001-08-02 2004-06-08 Chunghwa Pictures Tubes, Ltd. High contrast, moisture resistant antistatic/antireflective coating for CRT display screen
US6521346B1 (en) 2001-09-27 2003-02-18 Chunghwa Picture Tubes, Ltd. Antistatic/antireflective coating for video display screen with improved refractivity
US6764580B2 (en) 2001-11-15 2004-07-20 Chungwa Picture Tubes, Ltd. Application of multi-layer antistatic/antireflective coating to video display screen by sputtering
KR100447496B1 (ko) * 2001-12-11 2004-09-07 김은성 보안기 및 그 제조방법
US20030179455A1 (en) * 2002-03-22 2003-09-25 Jeffrey Hunt Fingerprint resistant anti-reflection coatings for plastic substrates
US6656331B2 (en) 2002-04-30 2003-12-02 Chunghwa Picture Tubes, Ltd. Application of antistatic/antireflective coating to a video display screen
CN1751140B (zh) * 2003-02-14 2011-02-02 克拉里宗有限公司 产生臭氧的装置和方法
US7410138B2 (en) * 2003-03-14 2008-08-12 Tgr Intellectual Properties, Llc Display adjustably positionable about swivel and pivot axes
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KR101399273B1 (ko) * 2004-09-16 2014-05-27 가부시키가이샤 니콘 비정질 산화 규소 바인더를 갖는 ＭｇＦ２ 광학 박막, 및 그것을 구비하는 광학 소자, 그리고 그 ＭｇＦ２ 광학 박막의 제조 방법
JP4525425B2 (ja) * 2005-03-31 2010-08-18 株式会社日立製作所 フッ化物コート膜形成処理液，フッ化物コート膜形成方法及び磁石
KR100644266B1 (ko) * 2005-04-07 2006-11-10 주식회사 동부한농 디스플레이 패널에 적층되는 고굴절성 코팅용 조성물
KR100822013B1 (ko) * 2005-04-15 2008-04-14 주식회사 에너세라믹 불소화합물코팅 리튬이차전지 양극 활물질 및 그 제조방법
CN101197243A (zh) 2006-12-08 2008-06-11 清华大学 场发射灯管
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DE102007013181B4 (de) * 2007-03-20 2017-11-09 Evonik Degussa Gmbh Transparente, elektrisch leitfähige Schicht
US20080241368A1 (en) * 2007-03-29 2008-10-02 Matahiro Komuro Treating solution for forming fluoride coating film and method for forming fluoride coating film
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JP5077950B2 (ja) * 2008-03-19 2012-11-21 大日本塗料株式会社 分散液、透明導電膜形成用組成物、透明導電膜及びディスプレイ
JP5389568B2 (ja) * 2009-08-19 2014-01-15 富士フイルム株式会社 透明導電性フィルム
CN105047550B (zh) * 2015-07-27 2017-11-07 京东方科技集团股份有限公司 一种导电组件及其制备方法、基板、显示装置

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Also Published As

Publication number Publication date
TW265356B (de) 1995-12-11
KR940004701A (ko) 1994-03-15
US5446339A (en) 1995-08-29
EP0585819B1 (de) 1997-04-16
US5681885A (en) 1997-10-28
CN1090307A (zh) 1994-08-03
DE69309814D1 (de) 1997-05-22
KR970001594B1 (ko) 1997-02-11
EP0585819A1 (de) 1994-03-09
CN1035262C (zh) 1997-06-25

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Legal Events

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Free format text: NOETH UND KOLLEGEN, 80336 MUENCHEN

8339 Ceased/non-payment of the annual fee