DE69309733T2 - Lichthärtbare Zusammensetzungen - Google Patents

Lichthärtbare Zusammensetzungen

Info

Publication number
DE69309733T2
DE69309733T2 DE69309733T DE69309733T DE69309733T2 DE 69309733 T2 DE69309733 T2 DE 69309733T2 DE 69309733 T DE69309733 T DE 69309733T DE 69309733 T DE69309733 T DE 69309733T DE 69309733 T2 DE69309733 T2 DE 69309733T2
Authority
DE
Germany
Prior art keywords
curable compositions
light curable
light
compositions
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69309733T
Other languages
English (en)
Other versions
DE69309733D1 (de
Inventor
Peter Dickinson
Julie Elisabeth Pratt
Fereidoun Abbasi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sericol Ltd
Original Assignee
Sericol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Ltd filed Critical Sericol Ltd
Application granted granted Critical
Publication of DE69309733D1 publication Critical patent/DE69309733D1/de
Publication of DE69309733T2 publication Critical patent/DE69309733T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/44—Preparation of metal salts or ammonium salts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69309733T 1992-02-03 1993-02-03 Lichthärtbare Zusammensetzungen Expired - Fee Related DE69309733T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9202246A GB2263699B (en) 1992-02-03 1992-02-03 Photopolymerizable alcohols and compositions containing them

Publications (2)

Publication Number Publication Date
DE69309733D1 DE69309733D1 (de) 1997-05-22
DE69309733T2 true DE69309733T2 (de) 1997-07-31

Family

ID=10709729

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69309733T Expired - Fee Related DE69309733T2 (de) 1992-02-03 1993-02-03 Lichthärtbare Zusammensetzungen

Country Status (5)

Country Link
US (1) US5332651A (de)
EP (1) EP0555070B1 (de)
JP (1) JP3298962B2 (de)
DE (1) DE69309733T2 (de)
GB (1) GB2263699B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
TW272976B (de) * 1993-08-06 1996-03-21 Ciba Geigy Ag
US6407145B1 (en) 1994-08-04 2002-06-18 Novartis Ag Photocrosslinkable materials and applications
EP0807269B1 (de) * 1995-02-03 1999-10-20 Novartis AG Vernetzbare polymere enthaltend photoinitiatoren
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
GB9604578D0 (en) * 1996-03-04 1996-05-01 Sericol Ltd Photocurable compositions
US5942367A (en) 1996-04-24 1999-08-24 Shin-Etsu Chemical Co., Ltd. Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
GB9721973D0 (en) * 1997-10-17 1997-12-17 Sericol Ltd A screen printing stencil
US6797452B2 (en) 1999-06-04 2004-09-28 Toyo Gosei Kogyo Co., Ltd. Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition
JP4238003B2 (ja) * 2001-10-31 2009-03-11 三菱製紙株式会社 感光性組成物及び平版印刷版
ITTO20020362A1 (it) 2002-04-30 2003-10-30 Metlac S P A Sistema multirivestimento con proprieta' di barriera ai gas, fotoreticolabile mediante radiazione uv particolarmente idoneo per la protezion
KR100534650B1 (ko) * 2003-01-23 2005-12-08 한국과학기술원 패턴화된 콜로이드 결정의 제조방법
GB0318115D0 (en) * 2003-08-01 2003-09-03 Sericol Ltd A printing ink
JP2006249123A (ja) * 2005-03-08 2006-09-21 Konica Minolta Holdings Inc インクジェット用インク
US7767381B2 (en) * 2006-05-17 2010-08-03 Murakami Co., Ltd. Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition
TWI400567B (zh) * 2006-05-22 2013-07-01 Murakami Co Ltd A photosensitive resin composition, and a photosensitive film and a screen printing plate using the same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB207826A (de) * 1922-12-01 1924-10-09 Heddernheimer Kupferwerk Und Sueddeutsche Kabelwerke Aktiengesellschaft
FR65803E (de) * 1950-03-09 1956-03-21
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
US4444868A (en) * 1981-08-06 1984-04-24 Agency Of Industrial Science & Technology Photosensitive composition
JPS5915324B2 (ja) * 1981-10-23 1984-04-09 工業技術院長 感光性樹脂の製法
US4418138A (en) * 1981-11-03 1983-11-29 Sericol Group Limited Photopolymerizable materials for use in producing stencils for screen printing
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
EP0081964B2 (de) * 1981-12-10 1993-08-04 Toray Industries, Inc. Photoempfindliche Polymerzusammensetzung
EP0092901B1 (de) * 1982-04-23 1987-10-14 Autotype International Limited Photopolymere
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
JPH0666030B2 (ja) * 1984-07-04 1994-08-24 工業技術院長 スクリ−ン製版用感光性樹脂組成物
JPS6117138A (ja) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol プラスチツクフイルム塗布用感光性エマルジヨン
JPH0743537B2 (ja) * 1985-04-03 1995-05-15 工業技術院長 感光性樹脂組成物
JPH0762048B2 (ja) * 1986-09-25 1995-07-05 工業技術院長 感光性樹脂
DE3889415T2 (de) * 1987-10-17 1994-09-01 Autotype Int Ltd Photoschablone für Siebdruck.
JPH0713099B2 (ja) * 1988-12-14 1995-02-15 工業技術院長 感光性ポリビニルアルコール誘導体
GB2226564B (en) * 1988-12-16 1993-03-17 Sericol Group Ltd Photopolymerisable polyvinyl alcohols and compositions containing them

Also Published As

Publication number Publication date
US5332651A (en) 1994-07-26
JP3298962B2 (ja) 2002-07-08
EP0555070A1 (de) 1993-08-11
GB2263699B (en) 1995-11-29
EP0555070B1 (de) 1997-04-16
DE69309733D1 (de) 1997-05-22
GB9202246D0 (en) 1992-03-18
JPH0643645A (ja) 1994-02-18
GB2263699A (en) 1993-08-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee