DE69226061D1 - Aminoketonsensibilisatore für wasserlösliche Photopolymerzusammensetzungen - Google Patents

Aminoketonsensibilisatore für wasserlösliche Photopolymerzusammensetzungen

Info

Publication number
DE69226061D1
DE69226061D1 DE69226061T DE69226061T DE69226061D1 DE 69226061 D1 DE69226061 D1 DE 69226061D1 DE 69226061 T DE69226061 T DE 69226061T DE 69226061 T DE69226061 T DE 69226061T DE 69226061 D1 DE69226061 D1 DE 69226061D1
Authority
DE
Germany
Prior art keywords
aminoketone
sensitizers
water
photopolymer compositions
soluble photopolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69226061T
Other languages
English (en)
Other versions
DE69226061T2 (de
Inventor
Mohammad Ali
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of DE69226061D1 publication Critical patent/DE69226061D1/de
Application granted granted Critical
Publication of DE69226061T2 publication Critical patent/DE69226061T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
DE1992626061 1991-10-25 1992-08-18 Aminoketonsensibilisatore für wasserlösliche Photopolymerzusammensetzungen Expired - Fee Related DE69226061T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78446891A 1991-10-25 1991-10-25
US78446791A 1991-10-25 1991-10-25

Publications (2)

Publication Number Publication Date
DE69226061D1 true DE69226061D1 (de) 1998-08-06
DE69226061T2 DE69226061T2 (de) 1999-01-28

Family

ID=27120286

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992626061 Expired - Fee Related DE69226061T2 (de) 1991-10-25 1992-08-18 Aminoketonsensibilisatore für wasserlösliche Photopolymerzusammensetzungen

Country Status (3)

Country Link
EP (1) EP0538997B1 (de)
JP (1) JPH05271319A (de)
DE (1) DE69226061T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5455143A (en) * 1991-10-25 1995-10-03 Minnesota Mining And Manufacturing Company Aminoketone sensitizers for aqueous soluble photopolymer compositions
US5415976A (en) * 1991-10-25 1995-05-16 Minnesota Mining And Manufacturing Company Aminoketone sensitizers for photopolymer compositions
JP3084677B2 (ja) * 1993-05-11 2000-09-04 キヤノン株式会社 スチリルクマリン化合物、光増感剤、感光性樹脂組成物、ホログラム記録媒体
JPH0867866A (ja) * 1994-06-20 1996-03-12 Canon Inc 光重合剤及び／又は光架橋剤に対する可視光増感剤、感光性組成物及びホログラム記録媒体
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
WO2012137219A2 (en) 2011-04-05 2012-10-11 Grasim Industries Limited A process for making fibril-free lyocell fabrics
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4971892A (en) * 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators

Also Published As

Publication number Publication date
JPH05271319A (ja) 1993-10-19
EP0538997A1 (de) 1993-04-28
DE69226061T2 (de) 1999-01-28
EP0538997B1 (de) 1998-07-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee