DE69224791T2 - Elektrostatische antiklebe Halteplatte für eine Niederdruckumgebung - Google Patents

Elektrostatische antiklebe Halteplatte für eine Niederdruckumgebung

Info

Publication number
DE69224791T2
DE69224791T2 DE69224791T DE69224791T DE69224791T2 DE 69224791 T2 DE69224791 T2 DE 69224791T2 DE 69224791 T DE69224791 T DE 69224791T DE 69224791 T DE69224791 T DE 69224791T DE 69224791 T2 DE69224791 T2 DE 69224791T2
Authority
DE
Germany
Prior art keywords
low pressure
holding plate
pressure environment
adhesive holding
electrostatic anti
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69224791T
Other languages
English (en)
Other versions
DE69224791D1 (de
Inventor
Arthur Sherman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Semiconductor Equipment Associates Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of DE69224791D1 publication Critical patent/DE69224791D1/de
Application granted granted Critical
Publication of DE69224791T2 publication Critical patent/DE69224791T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S269/00—Work holders
    • Y10S269/903—Work holder for electrical circuit assemblages or wiring systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
DE69224791T 1991-11-07 1992-11-09 Elektrostatische antiklebe Halteplatte für eine Niederdruckumgebung Expired - Fee Related DE69224791T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78922291A 1991-11-07 1991-11-07

Publications (2)

Publication Number Publication Date
DE69224791D1 DE69224791D1 (de) 1998-04-23
DE69224791T2 true DE69224791T2 (de) 1998-07-09

Family

ID=25146963

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69224791T Expired - Fee Related DE69224791T2 (de) 1991-11-07 1992-11-09 Elektrostatische antiklebe Halteplatte für eine Niederdruckumgebung
DE69231299T Expired - Fee Related DE69231299T2 (de) 1991-11-07 1992-11-09 Verfahren zur Herstellung einer elektrostatischen Halteplatte

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69231299T Expired - Fee Related DE69231299T2 (de) 1991-11-07 1992-11-09 Verfahren zur Herstellung einer elektrostatischen Halteplatte

Country Status (4)

Country Link
US (1) US5426558A (de)
EP (2) EP0734055B1 (de)
JP (1) JP3332251B2 (de)
DE (2) DE69224791T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10330901B4 (de) * 2002-07-08 2010-02-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrostatisches Fixierelement und Verfahren zu seiner Herstellung

Families Citing this family (39)

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US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5631803A (en) * 1995-01-06 1997-05-20 Applied Materials, Inc. Erosion resistant electrostatic chuck with improved cooling system
EP0669644B1 (de) * 1994-02-28 1997-08-20 Applied Materials, Inc. Elektrostatische Halteplatte
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
JPH09213777A (ja) * 1996-01-31 1997-08-15 Kyocera Corp 静電チャック
US5754391A (en) * 1996-05-17 1998-05-19 Saphikon Inc. Electrostatic chuck
JP3455026B2 (ja) * 1996-09-30 2003-10-06 京セラ株式会社 静電チャック
US6529362B2 (en) * 1997-03-06 2003-03-04 Applied Materials Inc. Monocrystalline ceramic electrostatic chuck
US5833073A (en) * 1997-06-02 1998-11-10 Fluoroware, Inc. Tacky film frame for electronic device
US5978202A (en) * 1997-06-27 1999-11-02 Applied Materials, Inc. Electrostatic chuck having a thermal transfer regulator pad
JPH11157953A (ja) * 1997-12-02 1999-06-15 Nhk Spring Co Ltd セラミックスと金属との構造体及びそれを用いた静電チャック装置
JP3356115B2 (ja) * 1999-05-20 2002-12-09 ウシオ電機株式会社 レジスト硬化装置
US6248642B1 (en) 1999-06-24 2001-06-19 Ibis Technology Corporation SIMOX using controlled water vapor for oxygen implants
US6433342B1 (en) 1999-08-18 2002-08-13 Ibis Technology Corporation Coated wafer holding pin
US6423975B1 (en) 1999-08-18 2002-07-23 Ibis Technology, Inc. Wafer holder for simox processing
US6452195B1 (en) 1999-08-18 2002-09-17 Ibis Technology Corporation Wafer holding pin
US6155436A (en) * 1999-08-18 2000-12-05 Ibis Technology Corporation Arc inhibiting wafer holder assembly
JP3492325B2 (ja) * 2000-03-06 2004-02-03 キヤノン株式会社 画像表示装置の製造方法
JP3851489B2 (ja) * 2000-04-27 2006-11-29 日本発条株式会社 静電チャック
TWI254403B (en) * 2000-05-19 2006-05-01 Ngk Insulators Ltd Electrostatic clamper, and electrostatic attracting structures
US6583980B1 (en) * 2000-08-18 2003-06-24 Applied Materials Inc. Substrate support tolerant to thermal expansion stresses
US20070139855A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
CN101221893B (zh) * 2007-01-12 2010-05-19 北京北方微电子基地设备工艺研究中心有限责任公司 一种促进半导体晶片上静电电荷消散的方法
US7667944B2 (en) * 2007-06-29 2010-02-23 Praxair Technology, Inc. Polyceramic e-chuck
US20090075012A1 (en) * 2007-09-13 2009-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9194189B2 (en) 2011-09-19 2015-11-24 Baker Hughes Incorporated Methods of forming a cutting element for an earth-boring tool, a related cutting element, and an earth-boring tool including such a cutting element
US9315424B2 (en) * 2011-11-30 2016-04-19 Component Re-Engineering Company, Inc. Multi-layer plate device
US9105492B2 (en) 2012-05-08 2015-08-11 LuxVue Technology Corporation Compliant micro device transfer head
US9034754B2 (en) 2012-05-25 2015-05-19 LuxVue Technology Corporation Method of forming a micro device transfer head with silicon electrode
US8569115B1 (en) 2012-07-06 2013-10-29 LuxVue Technology Corporation Method of forming a compliant bipolar micro device transfer head with silicon electrodes
CN103578899B (zh) * 2012-08-06 2016-08-24 中微半导体设备(上海)有限公司 等离子体处理设备及其静电卡盘
US9255001B2 (en) 2012-12-10 2016-02-09 LuxVue Technology Corporation Micro device transfer head array with metal electrodes
US9236815B2 (en) * 2012-12-10 2016-01-12 LuxVue Technology Corporation Compliant micro device transfer head array with metal electrodes
ES2952036T3 (es) 2013-06-12 2023-10-26 Rohinni Inc Teclado de retroiluminación con fuentes generadoras de luz depositadas
WO2017124109A1 (en) 2016-01-15 2017-07-20 Rohinni, LLC Apparatus and method of backlighting through a cover on the apparatus
JP6924618B2 (ja) * 2017-05-30 2021-08-25 東京エレクトロン株式会社 静電チャック及びプラズマ処理装置
JP7059064B2 (ja) * 2018-03-26 2022-04-25 株式会社日立ハイテク プラズマ処理装置
JP6583897B1 (ja) * 2018-05-25 2019-10-02 ▲らん▼海精研股▲ふん▼有限公司 セラミック製静電チャックの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059104B2 (ja) * 1982-02-03 1985-12-23 株式会社東芝 静電チヤツク板
JPS59124140A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 静電吸着装置
JPS61192435A (ja) * 1985-02-21 1986-08-27 Canon Inc 静電吸着保持装置
JP2678381B2 (ja) * 1987-05-06 1997-11-17 ユニサーチ・リミテッド 交流電界励振を利用した静電チャック
JP2665242B2 (ja) * 1988-09-19 1997-10-22 東陶機器株式会社 静電チャック
US5001594A (en) * 1989-09-06 1991-03-19 Mcnc Electrostatic handling device
DE69103915T2 (de) * 1990-01-25 1995-05-11 Applied Materials Inc Elektrostatische Klemmvorrichtung und Verfahren.
FR2661039B1 (fr) * 1990-04-12 1997-04-30 Commissariat Energie Atomique Porte-substrat electrostatique.
US5166856A (en) * 1991-01-31 1992-11-24 International Business Machines Corporation Electrostatic chuck with diamond coating
US5155652A (en) * 1991-05-02 1992-10-13 International Business Machines Corporation Temperature cycling ceramic electrostatic chuck

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10330901B4 (de) * 2002-07-08 2010-02-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrostatisches Fixierelement und Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
EP0734055B1 (de) 2000-07-26
JP3332251B2 (ja) 2002-10-07
US5426558A (en) 1995-06-20
EP0734055A3 (de) 1996-11-27
DE69231299T2 (de) 2001-01-18
JPH05245734A (ja) 1993-09-24
DE69224791D1 (de) 1998-04-23
DE69231299D1 (de) 2000-08-31
EP0734055A2 (de) 1996-09-25
EP0541400A3 (en) 1993-06-30
EP0541400A2 (de) 1993-05-12
EP0541400B1 (de) 1998-03-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.(N.

8339 Ceased/non-payment of the annual fee