DE69221778T2 - Strahlungsempfindliche Materialien - Google Patents
Strahlungsempfindliche MaterialienInfo
- Publication number
- DE69221778T2 DE69221778T2 DE69221778T DE69221778T DE69221778T2 DE 69221778 T2 DE69221778 T2 DE 69221778T2 DE 69221778 T DE69221778 T DE 69221778T DE 69221778 T DE69221778 T DE 69221778T DE 69221778 T2 DE69221778 T2 DE 69221778T2
- Authority
- DE
- Germany
- Prior art keywords
- radiation sensitive
- radiation
- sensitive materials
- aqueous media
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB919110418A GB9110418D0 (en) | 1991-05-14 | 1991-05-14 | Radiation-sensitive material |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69221778D1 DE69221778D1 (de) | 1997-10-02 |
DE69221778T2 true DE69221778T2 (de) | 1998-03-12 |
Family
ID=10694976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69221778T Expired - Lifetime DE69221778T2 (de) | 1991-05-14 | 1992-05-13 | Strahlungsempfindliche Materialien |
Country Status (8)
Country | Link |
---|---|
US (2) | US5609980A (de) |
EP (1) | EP0518487B1 (de) |
JP (1) | JP3150756B2 (de) |
AT (1) | ATE157464T1 (de) |
CA (1) | CA2068546A1 (de) |
DE (1) | DE69221778T2 (de) |
ES (1) | ES2106136T3 (de) |
GB (1) | GB9110418D0 (de) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9110418D0 (en) * | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Radiation-sensitive material |
GB2273366B (en) * | 1992-11-18 | 1996-03-27 | Du Pont | Forming images on radiation-sensitive plates |
US5948596A (en) * | 1997-05-27 | 1999-09-07 | Kodak Polychrome Graphics Llc | Digital printing plate comprising a thermal mask |
US5952131A (en) * | 1998-04-27 | 1999-09-14 | Xerox Corporation | Core and shell matrix compositions and processes |
US6479207B1 (en) * | 1999-04-22 | 2002-11-12 | Konica Corporation | Printing plate element and production method thereof |
KR100442859B1 (ko) * | 2001-04-04 | 2004-08-02 | 삼성전자주식회사 | 실리콘을 함유하는 알킬 비닐 에테르의 중합체로이루어지는 감광성 폴리머 및 이를 포함하는 레지스트조성물 |
US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
KR100493015B1 (ko) * | 2001-08-25 | 2005-06-07 | 삼성전자주식회사 | 감광성 폴리머 및 이를 포함하는 포토레지스트 조성물 |
DE60315086T2 (de) * | 2002-03-13 | 2008-04-10 | Fujifilm Corp. | Lithographischer Druckplattenvorläufer |
US7172850B2 (en) | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
US6521343B1 (en) * | 2002-05-16 | 2003-02-18 | Westvaco Corporation | Cationic core-shell particles with stabilizer-containing acid-swellable shells |
US6572969B1 (en) * | 2002-05-16 | 2003-06-03 | Meadwestvaco Corporation | Core shell polymeric compositions |
US6767638B2 (en) * | 2002-05-16 | 2004-07-27 | Meadwestvaco Corporation | Core-shell polymeric compositions |
US6521342B1 (en) * | 2002-06-12 | 2003-02-18 | Westvaco Corporation | Cationic core-shell particles with acid-swellable shells |
JP2005121949A (ja) * | 2003-10-17 | 2005-05-12 | Konica Minolta Medical & Graphic Inc | 印刷版材料 |
US20090183647A1 (en) * | 2008-01-22 | 2009-07-23 | Mathias Jarek | Imageable elements with coalescing core-shell particles |
JP5175582B2 (ja) * | 2008-03-10 | 2013-04-03 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
US8377624B2 (en) * | 2009-03-27 | 2013-02-19 | Eastman Kodak Company | Negative-working thermal imageable elements |
US8221960B2 (en) | 2009-06-03 | 2012-07-17 | Eastman Kodak Company | On-press development of imaged elements |
US8257907B2 (en) * | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
US8329382B2 (en) * | 2009-09-02 | 2012-12-11 | Eastman Kodak Company | Method of processing elements with coalesced particles |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB887356A (en) | 1957-10-08 | 1962-01-17 | Vinyl Products Ltd | Improvements in or relating to the manufacture of synthetic resin emulsions |
GB1139896A (en) * | 1963-12-05 | 1969-01-15 | Gevaert Photo Prod Nv | Light- and heat-sensitive recording materials and information recording processes using such materials |
GB1107249A (en) | 1964-08-31 | 1968-03-27 | Johnson & Son Inc S C | Alkali-soluble resins and method of preparing the same |
US4154614A (en) * | 1975-07-02 | 1979-05-15 | Nippon Paint Co., Ltd. | Photosensitive diazo composition with graft copolymer for use in printing screen |
US4882259A (en) * | 1984-08-23 | 1989-11-21 | The Mead Corporation | Photosensitive imaging material employing photosensitive microcapsules containing a solid diluent |
JPS61193888A (ja) * | 1985-02-25 | 1986-08-28 | Ricoh Co Ltd | 感熱記録材料 |
JPS61229595A (ja) * | 1985-04-04 | 1986-10-13 | Ricoh Co Ltd | スクリ−ン印刷用ダイレクト製版材料 |
JPH0677147B2 (ja) * | 1986-04-23 | 1994-09-28 | 富士写真フイルム株式会社 | 平版印刷原版 |
EP0258719A3 (de) * | 1986-08-30 | 1989-07-05 | Ciba-Geigy Ag | Zweischichtensystem |
JPH082701B2 (ja) * | 1986-09-04 | 1996-01-17 | 株式会社リコー | 平版印刷用原版 |
JPH01113290A (ja) * | 1987-10-27 | 1989-05-01 | Ricoh Co Ltd | 感熱記録型平版印刷用原版 |
US4868016A (en) | 1988-02-23 | 1989-09-19 | Rohm And Haas Company | Method of treating substrates |
JPH028847A (ja) * | 1988-06-28 | 1990-01-12 | Konica Corp | 湿し水不要平版印刷版材料 |
US4956252A (en) * | 1988-08-30 | 1990-09-11 | E. I. Dupont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
US5075192A (en) * | 1988-08-30 | 1991-12-24 | E. I. Du Pont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
JPH0816779B2 (ja) | 1988-12-02 | 1996-02-21 | 富士写真フイルム株式会社 | 新規な感光性化合物及びそれを用いたフオトレジストの形成方法 |
DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
CA2016919C (en) * | 1989-05-18 | 2003-07-29 | Masaru Nanpei | Photosensitive resin compositions |
DE3920230A1 (de) * | 1989-06-21 | 1991-01-24 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
EP0495000A4 (en) * | 1989-10-02 | 1992-10-21 | S.C. Johnson & Son, Inc. | Stable emulsion polymers and methods of preparing same |
US5085976A (en) * | 1990-06-11 | 1992-02-04 | E. I. Du Pont De Nemours And Company | Process for dimensionally stabilizing photopolymer flexographic printing plates |
US5348844A (en) * | 1990-12-03 | 1994-09-20 | Napp Systems, Inc. | Photosensitive polymeric printing medium and water developable printing plates |
GB9110418D0 (en) * | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Radiation-sensitive material |
-
1991
- 1991-05-14 GB GB919110418A patent/GB9110418D0/en active Pending
-
1992
- 1992-05-13 EP EP92304295A patent/EP0518487B1/de not_active Expired - Lifetime
- 1992-05-13 CA CA002068546A patent/CA2068546A1/en not_active Abandoned
- 1992-05-13 DE DE69221778T patent/DE69221778T2/de not_active Expired - Lifetime
- 1992-05-13 AT AT92304295T patent/ATE157464T1/de not_active IP Right Cessation
- 1992-05-13 ES ES92304295T patent/ES2106136T3/es not_active Expired - Lifetime
- 1992-05-14 JP JP12224292A patent/JP3150756B2/ja not_active Expired - Fee Related
- 1992-05-14 US US07/883,019 patent/US5609980A/en not_active Expired - Lifetime
-
1996
- 1996-11-01 US US08/742,735 patent/US5928833A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0518487A3 (en) | 1994-05-18 |
US5928833A (en) | 1999-07-27 |
DE69221778D1 (de) | 1997-10-02 |
ES2106136T3 (es) | 1997-11-01 |
ATE157464T1 (de) | 1997-09-15 |
CA2068546A1 (en) | 1992-11-15 |
GB9110418D0 (en) | 1991-07-03 |
US5609980A (en) | 1997-03-11 |
JP3150756B2 (ja) | 2001-03-26 |
EP0518487A2 (de) | 1992-12-16 |
EP0518487B1 (de) | 1997-08-27 |
JPH06186745A (ja) | 1994-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AGFA-GEVAERT N.V., MORTSEL, BE |
|
8328 | Change in the person/name/address of the agent |
Free format text: STEILING, L., DIPL.-CHEM. DR., PAT.-ANW., 51373 LEVERKUSEN |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: AGFA GRAPHICS N.V., MORTSEL, BE |
|
R082 | Change of representative |
Ref document number: 518487 Country of ref document: EP Representative=s name: LOTHAR STEILING, 51373 LEVERKUSEN, DE |