ES2106136T3 - Materiales sensibles a la radiacion. - Google Patents

Materiales sensibles a la radiacion.

Info

Publication number
ES2106136T3
ES2106136T3 ES92304295T ES92304295T ES2106136T3 ES 2106136 T3 ES2106136 T3 ES 2106136T3 ES 92304295 T ES92304295 T ES 92304295T ES 92304295 T ES92304295 T ES 92304295T ES 2106136 T3 ES2106136 T3 ES 2106136T3
Authority
ES
Spain
Prior art keywords
radiation sensitive
radiation
sensitive materials
aqueous media
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92304295T
Other languages
English (en)
Inventor
John Robert Wade
Michael John Pratt
Andrew Ernest Matthews
David Edward Murray
Allen Peter Gates
William Antony King
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Du Pont UK Ltd
Original Assignee
Du Pont UK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont UK Ltd filed Critical Du Pont UK Ltd
Application granted granted Critical
Publication of ES2106136T3 publication Critical patent/ES2106136T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Materials For Photolithography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)

Abstract

SE PRESENTA UN MATERIAL SENSIBLE A LA RADIACION QUE COMPRENDE PARTICULAS QUE INCLUYEN UN NUCLEO INSOLUBLE EN AGUA Y DEFORMABLE POR LA ACCION DEL CALOR RODEADO POR UNA CUBIERTA QUE ES SOLUBLE EN UN MEDIO ACUOSO. EL MATERIAL TAMBIEN INCLUYE UN COMPONENTE SENSIBLE A LA RADIACION QUE, DESPUES DE SU EXPOSICION A LA RADIACION, PROVOCA QUE LAS CARACTERISTICAS DE SOLUBILIDAD DEL MATERIAL CAMBIE. EL MATERIAL PUEDE SER TRABAJADO POSITIVA O NEGATIVAMENTE Y PUEDE SER RECUBIERTO SOBRE UN SUBSTRATO A PARTIR DE UN MEDIO ACUOSO PARA FORMAR UNA PLACA SENSIBLE A LA RADIACION QUE, DESPUES DE SU EXPOSICION, PUEDE SER REVELADA EN UN MEDIO ACUOSO Y CALENTADA PARA PROVOCAR QUE LAS PARTICULAS SE FUNDAN Y FORMEN UNA IMAGEN DE IMPRESION DURADERA.
ES92304295T 1991-05-14 1992-05-13 Materiales sensibles a la radiacion. Expired - Lifetime ES2106136T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB919110418A GB9110418D0 (en) 1991-05-14 1991-05-14 Radiation-sensitive material

Publications (1)

Publication Number Publication Date
ES2106136T3 true ES2106136T3 (es) 1997-11-01

Family

ID=10694976

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92304295T Expired - Lifetime ES2106136T3 (es) 1991-05-14 1992-05-13 Materiales sensibles a la radiacion.

Country Status (8)

Country Link
US (2) US5609980A (es)
EP (1) EP0518487B1 (es)
JP (1) JP3150756B2 (es)
AT (1) ATE157464T1 (es)
CA (1) CA2068546A1 (es)
DE (1) DE69221778T2 (es)
ES (1) ES2106136T3 (es)
GB (1) GB9110418D0 (es)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9110418D0 (en) * 1991-05-14 1991-07-03 Du Pont Howson Ltd Radiation-sensitive material
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5948596A (en) * 1997-05-27 1999-09-07 Kodak Polychrome Graphics Llc Digital printing plate comprising a thermal mask
US5952131A (en) * 1998-04-27 1999-09-14 Xerox Corporation Core and shell matrix compositions and processes
US6479207B1 (en) * 1999-04-22 2002-11-12 Konica Corporation Printing plate element and production method thereof
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
KR100442859B1 (ko) * 2001-04-04 2004-08-02 삼성전자주식회사 실리콘을 함유하는 알킬 비닐 에테르의 중합체로이루어지는 감광성 폴리머 및 이를 포함하는 레지스트조성물
KR100493015B1 (ko) * 2001-08-25 2005-06-07 삼성전자주식회사 감광성 폴리머 및 이를 포함하는 포토레지스트 조성물
DE60315086T2 (de) * 2002-03-13 2008-04-10 Fujifilm Corp. Lithographischer Druckplattenvorläufer
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7172850B2 (en) 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US6572969B1 (en) * 2002-05-16 2003-06-03 Meadwestvaco Corporation Core shell polymeric compositions
US6767638B2 (en) * 2002-05-16 2004-07-27 Meadwestvaco Corporation Core-shell polymeric compositions
US6521343B1 (en) * 2002-05-16 2003-02-18 Westvaco Corporation Cationic core-shell particles with stabilizer-containing acid-swellable shells
US6521342B1 (en) * 2002-06-12 2003-02-18 Westvaco Corporation Cationic core-shell particles with acid-swellable shells
JP2005121949A (ja) * 2003-10-17 2005-05-12 Konica Minolta Medical & Graphic Inc 印刷版材料
US20090183647A1 (en) * 2008-01-22 2009-07-23 Mathias Jarek Imageable elements with coalescing core-shell particles
JP5175582B2 (ja) * 2008-03-10 2013-04-03 富士フイルム株式会社 平版印刷版の作製方法
US8377624B2 (en) * 2009-03-27 2013-02-19 Eastman Kodak Company Negative-working thermal imageable elements
US8221960B2 (en) * 2009-06-03 2012-07-17 Eastman Kodak Company On-press development of imaged elements
US8257907B2 (en) * 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8329382B2 (en) * 2009-09-02 2012-12-11 Eastman Kodak Company Method of processing elements with coalesced particles

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB887356A (en) 1957-10-08 1962-01-17 Vinyl Products Ltd Improvements in or relating to the manufacture of synthetic resin emulsions
GB1139896A (en) * 1963-12-05 1969-01-15 Gevaert Photo Prod Nv Light- and heat-sensitive recording materials and information recording processes using such materials
GB1107249A (en) 1964-08-31 1968-03-27 Johnson & Son Inc S C Alkali-soluble resins and method of preparing the same
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
US4882259A (en) * 1984-08-23 1989-11-21 The Mead Corporation Photosensitive imaging material employing photosensitive microcapsules containing a solid diluent
JPS61193888A (ja) * 1985-02-25 1986-08-28 Ricoh Co Ltd 感熱記録材料
JPS61229595A (ja) * 1985-04-04 1986-10-13 Ricoh Co Ltd スクリ−ン印刷用ダイレクト製版材料
JPH0677147B2 (ja) * 1986-04-23 1994-09-28 富士写真フイルム株式会社 平版印刷原版
EP0258719A3 (de) * 1986-08-30 1989-07-05 Ciba-Geigy Ag Zweischichtensystem
JPH082701B2 (ja) * 1986-09-04 1996-01-17 株式会社リコー 平版印刷用原版
JPH01113290A (ja) * 1987-10-27 1989-05-01 Ricoh Co Ltd 感熱記録型平版印刷用原版
US4868016A (en) 1988-02-23 1989-09-19 Rohm And Haas Company Method of treating substrates
JPH028847A (ja) * 1988-06-28 1990-01-12 Konica Corp 湿し水不要平版印刷版材料
US4956252A (en) * 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US5075192A (en) * 1988-08-30 1991-12-24 E. I. Du Pont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
JPH0816779B2 (ja) 1988-12-02 1996-02-21 富士写真フイルム株式会社 新規な感光性化合物及びそれを用いたフオトレジストの形成方法
DE3903001A1 (de) * 1989-02-02 1990-08-16 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
CA2016919C (en) * 1989-05-18 2003-07-29 Masaru Nanpei Photosensitive resin compositions
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
CA2066596C (en) * 1989-10-02 1994-04-26 Richard A. Kiehlbauch Stable emulsion polymers and methods of preparing same
US5085976A (en) * 1990-06-11 1992-02-04 E. I. Du Pont De Nemours And Company Process for dimensionally stabilizing photopolymer flexographic printing plates
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
GB9110418D0 (en) * 1991-05-14 1991-07-03 Du Pont Howson Ltd Radiation-sensitive material

Also Published As

Publication number Publication date
US5609980A (en) 1997-03-11
ATE157464T1 (de) 1997-09-15
DE69221778T2 (de) 1998-03-12
US5928833A (en) 1999-07-27
EP0518487A2 (en) 1992-12-16
GB9110418D0 (en) 1991-07-03
JP3150756B2 (ja) 2001-03-26
CA2068546A1 (en) 1992-11-15
EP0518487A3 (en) 1994-05-18
JPH06186745A (ja) 1994-07-08
DE69221778D1 (de) 1997-10-02
EP0518487B1 (en) 1997-08-27

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