DE69209028D1 - Ionenstrahl-Analyseverfahren - Google Patents

Ionenstrahl-Analyseverfahren

Info

Publication number
DE69209028D1
DE69209028D1 DE69209028T DE69209028T DE69209028D1 DE 69209028 D1 DE69209028 D1 DE 69209028D1 DE 69209028 T DE69209028 T DE 69209028T DE 69209028 T DE69209028 T DE 69209028T DE 69209028 D1 DE69209028 D1 DE 69209028D1
Authority
DE
Germany
Prior art keywords
ion beam
analysis method
beam analysis
ion
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69209028T
Other languages
English (en)
Other versions
DE69209028T2 (de
Inventor
Hirofumi Fukuyama
Tatuya Noguchi
Kenichi Inoue
Kiyotaka Ishibashi
Shigeto Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of DE69209028D1 publication Critical patent/DE69209028D1/de
Application granted granted Critical
Publication of DE69209028T2 publication Critical patent/DE69209028T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69209028T 1991-12-25 1992-12-21 Ionenstrahl-Analyseverfahren Expired - Fee Related DE69209028T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP34335891 1991-12-25
JP31036092A JP3235681B2 (ja) 1991-12-25 1992-11-19 イオンビーム分析装置

Publications (2)

Publication Number Publication Date
DE69209028D1 true DE69209028D1 (de) 1996-04-18
DE69209028T2 DE69209028T2 (de) 1996-09-12

Family

ID=26566283

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69209028T Expired - Fee Related DE69209028T2 (de) 1991-12-25 1992-12-21 Ionenstrahl-Analyseverfahren

Country Status (4)

Country Link
US (1) US5350920A (de)
EP (1) EP0548899B1 (de)
JP (1) JP3235681B2 (de)
DE (1) DE69209028T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5854490A (en) * 1995-10-03 1998-12-29 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method
JP3544438B2 (ja) * 1996-09-30 2004-07-21 セイコーインスツルメンツ株式会社 イオンビームによる加工装置
JP3449198B2 (ja) * 1997-10-22 2003-09-22 日新電機株式会社 イオン注入装置
US6002208A (en) * 1998-07-02 1999-12-14 Advanced Ion Technology, Inc. Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit
US6137110A (en) * 1998-08-17 2000-10-24 The United States Of America As Represented By The United States Department Of Energy Focused ion beam source method and apparatus
JP3414337B2 (ja) * 1999-11-12 2003-06-09 日新電機株式会社 電磁界レンズの制御方法およびイオン注入装置
JP4148864B2 (ja) * 2003-09-26 2008-09-10 株式会社神戸製鋼所 試料分析装置
EP1526563B1 (de) * 2003-10-20 2018-12-05 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aperturblende für Teilchenstrahlapparat
NL1031800C2 (nl) * 2006-05-11 2007-11-13 Milabs B V Detectieinrichting.
KR20200007103A (ko) * 2015-11-30 2020-01-21 에이에스엠엘 네델란즈 비.브이. 복수의 하전된 입자 빔의 장치
CN108387924A (zh) * 2018-03-08 2018-08-10 西北核技术研究所 一种高精度束流能量分析狭缝装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4055770A (en) * 1972-03-15 1977-10-25 C.G.R.-Mev. Collimator arrangement for a beam of accelerated charged particles
FR2410359A1 (fr) * 1977-11-28 1979-06-22 Anvar Electrode d'extraction mobile pour source d'ions
US4761559A (en) * 1986-09-24 1988-08-02 Eaton Corporation Ion beam implantation display method and apparatus
JPH02295040A (ja) * 1989-05-10 1990-12-05 Hitachi Ltd 集束イオンビーム装置
DE69026751T2 (de) * 1989-05-17 1996-11-14 Kobe Steel Ltd Ionenbündelfokussierungsvorrichtung
GB2233124B (en) * 1989-06-06 1994-02-09 Mitsubishi Electric Corp Ion implantation apparatus

Also Published As

Publication number Publication date
EP0548899A1 (de) 1993-06-30
JPH05234559A (ja) 1993-09-10
JP3235681B2 (ja) 2001-12-04
DE69209028T2 (de) 1996-09-12
US5350920A (en) 1994-09-27
EP0548899B1 (de) 1996-03-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee