DE69204329D1 - Schützeinrichtung mit kippbarem Objekttisch, und optische Lithographieeinrichtung mit einer derartigen Einrichtung. - Google Patents
Schützeinrichtung mit kippbarem Objekttisch, und optische Lithographieeinrichtung mit einer derartigen Einrichtung.Info
- Publication number
- DE69204329D1 DE69204329D1 DE69204329T DE69204329T DE69204329D1 DE 69204329 D1 DE69204329 D1 DE 69204329D1 DE 69204329 T DE69204329 T DE 69204329T DE 69204329 T DE69204329 T DE 69204329T DE 69204329 D1 DE69204329 D1 DE 69204329D1
- Authority
- DE
- Germany
- Prior art keywords
- object table
- optical lithography
- protective
- tiltable
- tiltable object
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000206 photolithography Methods 0.000 title 1
- 230000001681 protective effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
- B23Q1/36—Springs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/50—Movable or adjustable work or tool supports using particular mechanisms with rotating pairs only, the rotating pairs being the first two elements of the mechanism
- B23Q1/54—Movable or adjustable work or tool supports using particular mechanisms with rotating pairs only, the rotating pairs being the first two elements of the mechanism two rotating pairs only
- B23Q1/545—Movable or adjustable work or tool supports using particular mechanisms with rotating pairs only, the rotating pairs being the first two elements of the mechanism two rotating pairs only comprising spherical surfaces
- B23Q1/5462—Movable or adjustable work or tool supports using particular mechanisms with rotating pairs only, the rotating pairs being the first two elements of the mechanism two rotating pairs only comprising spherical surfaces with one supplementary sliding pair
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9100421A NL9100421A (nl) | 1991-03-08 | 1991-03-08 | Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69204329D1 true DE69204329D1 (de) | 1995-10-05 |
DE69204329T2 DE69204329T2 (de) | 1996-04-25 |
Family
ID=19858996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69204329T Expired - Fee Related DE69204329T2 (de) | 1991-03-08 | 1992-03-03 | Schützeinrichtung mit kippbarem Objekttisch, und optische Lithographieeinrichtung mit einer derartigen Einrichtung. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5204712A (de) |
EP (1) | EP0503712B1 (de) |
JP (1) | JP3291310B2 (de) |
KR (1) | KR100233614B1 (de) |
DE (1) | DE69204329T2 (de) |
NL (1) | NL9100421A (de) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5813287A (en) | 1994-03-02 | 1998-09-29 | Renishaw Plc | Coordinate positioning machine |
DE69536045D1 (de) * | 1994-03-02 | 2010-04-01 | Renishaw Plc | Koordinaten-Positionierungsmaschine |
JP3221823B2 (ja) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法 |
US5991005A (en) * | 1996-04-11 | 1999-11-23 | Nikon Corporation | Stage apparatus and exposure apparatus having the same |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JPH10521A (ja) * | 1996-06-07 | 1998-01-06 | Nikon Corp | 支持装置 |
US5815246A (en) * | 1996-12-24 | 1998-09-29 | U.S. Philips Corporation | Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
US5835198A (en) * | 1997-01-06 | 1998-11-10 | Etec Systems, Inc. | Articulated platform mechanism for laser pattern generation on a workpiece |
JPH10209035A (ja) * | 1997-01-23 | 1998-08-07 | Nikon Corp | 露光装置 |
JPH11191585A (ja) * | 1997-12-26 | 1999-07-13 | Canon Inc | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
US6054784A (en) * | 1997-12-29 | 2000-04-25 | Asm Lithography B.V. | Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
DE19805875C1 (de) * | 1998-02-13 | 1999-04-08 | Schott Glas | Trägertisch für eine Photomaske in einer Vorrichtung zur Mikrochip-Herstellung |
US6621556B2 (en) * | 2000-02-28 | 2003-09-16 | Nikon Corporation | Projection exposure apparatus and manufacturing and adjusting methods thereof |
TW509823B (en) | 2000-04-17 | 2002-11-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
DE10062713C1 (de) * | 2000-12-15 | 2002-09-05 | Zeiss Carl | Verfahren zum Beschichten von Substraten und Maskenhaltern |
US6646719B2 (en) * | 2001-01-31 | 2003-11-11 | Nikon Corporation | Support assembly for an exposure apparatus |
EP1243969A1 (de) * | 2001-03-20 | 2002-09-25 | Asm Lithography B.V. | Lithographischer Projektionsapparat und zugehöriges Positionierungssystem |
DE10115915A1 (de) * | 2001-03-30 | 2002-10-02 | Zeiss Carl | Vorrichtung zur Justierung von Einrichtungen und zum Einstellen von Verstellwegen |
DE10136387A1 (de) * | 2001-07-26 | 2003-02-13 | Zeiss Carl | Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie |
DE10140174B4 (de) * | 2001-08-22 | 2005-11-10 | Leica Microsystems Semiconductor Gmbh | Koordinaten-Messtisch und Koordinaten-Messgerät |
DE10219514A1 (de) * | 2002-04-30 | 2003-11-13 | Zeiss Carl Smt Ag | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
US7760452B2 (en) * | 2003-04-25 | 2010-07-20 | Canon Kabushiki Kaisha | Driving apparatus, optical system, exposure apparatus and device fabrication method |
US6891601B2 (en) * | 2003-07-17 | 2005-05-10 | Newport Corporation | High resolution, dynamic positioning mechanism for specimen inspection and processing |
US7265917B2 (en) * | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
US7515359B2 (en) | 2004-04-14 | 2009-04-07 | Carl Zeiss Smt Ag | Support device for positioning an optical element |
JP2007025374A (ja) * | 2005-07-19 | 2007-02-01 | Mitsubishi Electric Corp | 反射鏡支持調整機構 |
TWI372271B (en) * | 2005-09-13 | 2012-09-11 | Zeiss Carl Smt Gmbh | Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device |
DE102006034455A1 (de) * | 2006-07-26 | 2008-01-31 | Carl Zeiss Industrielle Messtechnik Gmbh | Lageveränderliche Werkstückauflage für eine Maschine und Bearbeitungsanlage mit einer entsprechenden Werkstückauflage |
KR101302300B1 (ko) * | 2006-12-22 | 2013-09-03 | 주식회사 케이씨텍 | 대면적 기판의 방향 전환장치 |
DE102008000967B4 (de) * | 2008-04-03 | 2015-04-09 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
DE102009029536A1 (de) * | 2008-09-17 | 2010-04-15 | Carl Zeiss Smt Ag | Verbindungsanordnung für eine optische Einrichtung |
JP6068349B2 (ja) * | 2010-10-21 | 2017-01-25 | ソルラブス、 インコーポレイテッドThorlabs, Inc. | ナノポジショナーのための平行度維持装置 |
US8542450B2 (en) | 2011-02-08 | 2013-09-24 | Utah State University Research Foundation | Kinematic optic mount |
US20130125793A1 (en) * | 2011-11-22 | 2013-05-23 | Alex K. Deyhim | Two degrees of freedom optical table |
CN103066894B (zh) * | 2012-12-12 | 2015-05-20 | 清华大学 | 一种六自由度磁悬浮工件台 |
CN104062854B (zh) * | 2013-03-21 | 2016-08-03 | 上海微电子装备有限公司 | 用于光刻设备的调平调焦装置 |
CN104110561B (zh) * | 2014-06-25 | 2016-06-29 | 华南理工大学 | 一种基于柔顺机构的大行程平面三自由度精密定位平台 |
KR102296804B1 (ko) * | 2014-07-03 | 2021-08-31 | 뉴포트 코포레이션 | 다축 포지셔닝 장치 |
GB2541171A (en) * | 2015-07-29 | 2017-02-15 | Skf Ab | A device for adjusting the positioning of an apparatus relative to a foundation in a shaft alignment process and a method thereof |
WO2017207016A1 (en) * | 2016-05-30 | 2017-12-07 | Carl Zeiss Smt Gmbh | Optical imaging arrangement with a piezoelectric device |
CN111650816B (zh) * | 2019-03-04 | 2021-07-23 | 上海微电子装备(集团)股份有限公司 | 柔性连接装置、测量系统及光刻机 |
CN112756996A (zh) * | 2020-12-29 | 2021-05-07 | 中国科学院长春光学精密机械与物理研究所 | 一种六自由度调节装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
US4473291A (en) * | 1983-03-24 | 1984-09-25 | Opti-Copy, Inc. | Support arrangement for track mounted cameras, projectors and camera/projectors |
US4676649A (en) * | 1985-11-27 | 1987-06-30 | Compact Spindle Bearing Corp. | Multi-axis gas bearing stage assembly |
JPS62200726A (ja) * | 1986-02-28 | 1987-09-04 | Canon Inc | 露光装置 |
NL8600785A (nl) * | 1986-03-27 | 1987-10-16 | Asm Lithography Bv | Positioneerinrichting met een z-manipulator en een o-manipulator. |
NL8601095A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Positioneerinrichting. |
NL8601547A (nl) * | 1986-06-16 | 1988-01-18 | Philips Nv | Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting. |
JPH0812843B2 (ja) * | 1989-03-15 | 1996-02-07 | 日本精工株式会社 | 光学結像装置及び方法 |
NL8902471A (nl) * | 1989-10-05 | 1991-05-01 | Philips Nv | Tweetraps positioneerinrichting. |
US5130747A (en) * | 1990-09-28 | 1992-07-14 | Kabushiki Kaisha Toshiba | Carrier apparatus |
-
1991
- 1991-03-08 NL NL9100421A patent/NL9100421A/nl not_active Application Discontinuation
- 1991-10-09 US US07/774,763 patent/US5204712A/en not_active Expired - Lifetime
-
1992
- 1992-03-03 DE DE69204329T patent/DE69204329T2/de not_active Expired - Fee Related
- 1992-03-03 EP EP92200610A patent/EP0503712B1/de not_active Expired - Lifetime
- 1992-03-05 KR KR1019920003607A patent/KR100233614B1/ko not_active IP Right Cessation
- 1992-03-05 JP JP04818692A patent/JP3291310B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3291310B2 (ja) | 2002-06-10 |
KR930020245A (ko) | 1993-10-19 |
EP0503712A1 (de) | 1992-09-16 |
DE69204329T2 (de) | 1996-04-25 |
JPH0737771A (ja) | 1995-02-07 |
KR100233614B1 (ko) | 1999-12-01 |
EP0503712B1 (de) | 1995-08-30 |
US5204712A (en) | 1993-04-20 |
NL9100421A (nl) | 1992-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: ASM LITHOGRAPHY B.V., VELDHOVEN, NL |
|
8339 | Ceased/non-payment of the annual fee |