DE69130987D1 - Vorrichtung zur Behandlung von Halbleiter-Plättchen - Google Patents
Vorrichtung zur Behandlung von Halbleiter-PlättchenInfo
- Publication number
- DE69130987D1 DE69130987D1 DE69130987T DE69130987T DE69130987D1 DE 69130987 D1 DE69130987 D1 DE 69130987D1 DE 69130987 T DE69130987 T DE 69130987T DE 69130987 T DE69130987 T DE 69130987T DE 69130987 D1 DE69130987 D1 DE 69130987D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor wafers
- treating semiconductor
- treating
- wafers
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51331890A | 1990-04-20 | 1990-04-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69130987D1 true DE69130987D1 (de) | 1999-04-15 |
DE69130987T2 DE69130987T2 (de) | 1999-09-30 |
Family
ID=24042751
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69118228T Expired - Fee Related DE69118228T2 (de) | 1990-04-20 | 1991-04-09 | Klemmechanismus für physikalische Dampfniederschlagvorrichtung |
DE69130987T Expired - Fee Related DE69130987T2 (de) | 1990-04-20 | 1991-04-09 | Vorrichtung zur Behandlung von Halbleiter-Plättchen |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69118228T Expired - Fee Related DE69118228T2 (de) | 1990-04-20 | 1991-04-09 | Klemmechanismus für physikalische Dampfniederschlagvorrichtung |
Country Status (5)
Country | Link |
---|---|
EP (3) | EP0452779B1 (de) |
JP (1) | JP2662106B2 (de) |
KR (1) | KR100240195B1 (de) |
DE (2) | DE69118228T2 (de) |
ES (1) | ES2086429T3 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4201211C2 (de) * | 1992-01-18 | 2001-04-26 | Leybold Ag | Beschichtungsanlage |
EP0595307A3 (en) * | 1992-10-27 | 1994-06-15 | Applied Materials Inc | Clamp ring and processing chamber comprising said clamp ring |
KR960006956B1 (ko) * | 1993-02-06 | 1996-05-25 | 현대전자산업주식회사 | 이시알(ecr) 장비 |
US5511799A (en) * | 1993-06-07 | 1996-04-30 | Applied Materials, Inc. | Sealing device useful in semiconductor processing apparatus for bridging materials having a thermal expansion differential |
US5509464A (en) * | 1993-07-30 | 1996-04-23 | Applied Materials, Inc. | Method and apparatus for cooling rectangular substrates |
US5513594A (en) * | 1993-10-20 | 1996-05-07 | Mcclanahan; Adolphus E. | Clamp with wafer release for semiconductor wafer processing equipment |
KR950025850A (ko) * | 1994-02-17 | 1995-09-18 | 서성기 | 박막의 열처리 장치 |
US5791895A (en) * | 1994-02-17 | 1998-08-11 | Novellus Systems, Inc. | Apparatus for thermal treatment of thin film wafer |
US5522937A (en) * | 1994-05-03 | 1996-06-04 | Applied Materials, Inc. | Welded susceptor assembly |
US5595241A (en) * | 1994-10-07 | 1997-01-21 | Sony Corporation | Wafer heating chuck with dual zone backplane heating and segmented clamping member |
AU6962196A (en) | 1995-09-01 | 1997-03-27 | Advanced Semiconductor Materials America, Inc. | Wafer support system |
US6113702A (en) * | 1995-09-01 | 2000-09-05 | Asm America, Inc. | Wafer support system |
GB2311651A (en) * | 1996-03-27 | 1997-10-01 | Surface Tech Sys Ltd | Clamping device |
US6014082A (en) * | 1997-10-03 | 2000-01-11 | Sony Corporation | Temperature monitoring and calibration system for control of a heated CVD chuck |
EP1042787B1 (de) * | 1997-12-23 | 2005-03-02 | Unaxis Balzers Aktiengesellschaft | Haltevorrichtung |
FR2792084A1 (fr) * | 1999-04-12 | 2000-10-13 | Joint Industrial Processors For Electronics | Dispositif de chauffage et de refroidissement integre dans un reacteur de traitement thermique d'un substrat |
US6176931B1 (en) | 1999-10-29 | 2001-01-23 | International Business Machines Corporation | Wafer clamp ring for use in an ionized physical vapor deposition apparatus |
JP2001135712A (ja) * | 1999-11-05 | 2001-05-18 | Nec Corp | 真空処理装置 |
CN100358098C (zh) * | 2005-08-05 | 2007-12-26 | 中微半导体设备(上海)有限公司 | 半导体工艺件处理装置 |
US8092606B2 (en) | 2007-12-18 | 2012-01-10 | Asm Genitech Korea Ltd. | Deposition apparatus |
US8937800B2 (en) * | 2012-04-24 | 2015-01-20 | Applied Materials, Inc. | Electrostatic chuck with advanced RF and temperature uniformity |
KR102578750B1 (ko) * | 2018-12-27 | 2023-09-13 | 캐논 톡키 가부시키가이샤 | 얼라인먼트 시스템, 성막 장치, 성막 방법, 및 전자 디바이스 제조방법 |
CN114086124A (zh) * | 2021-11-29 | 2022-02-25 | 重庆忽米网络科技有限公司 | 一种晶圆pvd沉淀加工方法及系统 |
CN115466933A (zh) * | 2022-08-30 | 2022-12-13 | 厦门金鹭特种合金有限公司 | 一种工装基座、工装及其应用 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4261762A (en) | 1979-09-14 | 1981-04-14 | Eaton Corporation | Method for conducting heat to or from an article being treated under vacuum |
US4743570A (en) | 1979-12-21 | 1988-05-10 | Varian Associates, Inc. | Method of thermal treatment of a wafer in an evacuated environment |
US4512391A (en) | 1982-01-29 | 1985-04-23 | Varian Associates, Inc. | Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet |
US4457359A (en) | 1982-05-25 | 1984-07-03 | Varian Associates, Inc. | Apparatus for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer |
US4542298A (en) | 1983-06-09 | 1985-09-17 | Varian Associates, Inc. | Methods and apparatus for gas-assisted thermal transfer with a semiconductor wafer |
US4671204A (en) | 1986-05-16 | 1987-06-09 | Varian Associates, Inc. | Low compliance seal for gas-enhanced wafer cooling in vacuum |
KR0129663B1 (ko) * | 1988-01-20 | 1998-04-06 | 고다까 토시오 | 에칭 장치 및 방법 |
DE58905888D1 (de) * | 1988-07-15 | 1993-11-18 | Balzers Hochvakuum | Haltevorrichtung für eine Scheibe sowie Anwendung derselben. |
JPH0291933A (ja) * | 1988-09-29 | 1990-03-30 | Nec Corp | イオン注入装置 |
-
1991
- 1991-04-09 EP EP91105629A patent/EP0452779B1/de not_active Expired - Lifetime
- 1991-04-09 EP EP95111667A patent/EP0688042B1/de not_active Expired - Lifetime
- 1991-04-09 ES ES91105629T patent/ES2086429T3/es not_active Expired - Lifetime
- 1991-04-09 EP EP95111668A patent/EP0688043A1/de not_active Ceased
- 1991-04-09 DE DE69118228T patent/DE69118228T2/de not_active Expired - Fee Related
- 1991-04-09 DE DE69130987T patent/DE69130987T2/de not_active Expired - Fee Related
- 1991-04-18 JP JP8666691A patent/JP2662106B2/ja not_active Expired - Lifetime
- 1991-04-19 KR KR1019910006264A patent/KR100240195B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0688042A1 (de) | 1995-12-20 |
EP0688042B1 (de) | 1999-03-10 |
KR910019120A (ko) | 1991-11-30 |
ES2086429T3 (es) | 1996-07-01 |
EP0452779B1 (de) | 1996-03-27 |
DE69130987T2 (de) | 1999-09-30 |
EP0452779A2 (de) | 1991-10-23 |
JPH04226051A (ja) | 1992-08-14 |
EP0452779A3 (en) | 1992-09-02 |
EP0688043A1 (de) | 1995-12-20 |
DE69118228D1 (de) | 1996-05-02 |
KR100240195B1 (ko) | 2000-01-15 |
DE69118228T2 (de) | 1996-11-21 |
JP2662106B2 (ja) | 1997-10-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |