DE69130732D1 - Herstellungsverfahren für eine Opto-elektronische Strahlungsdetektormatrix - Google Patents

Herstellungsverfahren für eine Opto-elektronische Strahlungsdetektormatrix

Info

Publication number
DE69130732D1
DE69130732D1 DE69130732T DE69130732T DE69130732D1 DE 69130732 D1 DE69130732 D1 DE 69130732D1 DE 69130732 T DE69130732 T DE 69130732T DE 69130732 T DE69130732 T DE 69130732T DE 69130732 D1 DE69130732 D1 DE 69130732D1
Authority
DE
Germany
Prior art keywords
opto
manufacturing process
radiation detector
detector matrix
electronic radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69130732T
Other languages
English (en)
Other versions
DE69130732T2 (de
Inventor
Harold A Timlin
Charles J Martin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cincinnati Electronics Corp
Original Assignee
Cincinnati Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cincinnati Electronics Corp filed Critical Cincinnati Electronics Corp
Publication of DE69130732D1 publication Critical patent/DE69130732D1/de
Application granted granted Critical
Publication of DE69130732T2 publication Critical patent/DE69130732T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers
    • H01L27/14649—Infrared imagers
    • H01L27/1465—Infrared imagers of the hybrid type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/35—Mechanical effects
    • H01L2924/351—Thermal stress
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/977—Thinning or removal of substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
DE69130732T 1990-11-06 1991-10-31 Herstellungsverfahren für eine Opto-elektronische Strahlungsdetektormatrix Expired - Lifetime DE69130732T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/609,678 US5227656A (en) 1990-11-06 1990-11-06 Electro-optical detector array

Publications (2)

Publication Number Publication Date
DE69130732D1 true DE69130732D1 (de) 1999-02-18
DE69130732T2 DE69130732T2 (de) 1999-09-09

Family

ID=24441847

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130732T Expired - Lifetime DE69130732T2 (de) 1990-11-06 1991-10-31 Herstellungsverfahren für eine Opto-elektronische Strahlungsdetektormatrix

Country Status (7)

Country Link
US (2) US5227656A (de)
EP (1) EP0485115B1 (de)
JP (1) JP3257687B2 (de)
KR (1) KR100274124B1 (de)
CA (1) CA2054934C (de)
DE (1) DE69130732T2 (de)
IL (1) IL99856A (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2693033B1 (fr) * 1992-06-30 1994-08-19 Commissariat Energie Atomique Dispositif d'imagerie de grande dimension.
US5591678A (en) * 1993-01-19 1997-01-07 He Holdings, Inc. Process of manufacturing a microelectric device using a removable support substrate and etch-stop
US5494833A (en) * 1994-07-14 1996-02-27 The United States Of America As Represented By The Secretary Of The Air Force Backside illuminated MSM device method
US5472914A (en) * 1994-07-14 1995-12-05 The United States Of America As Represented By The Secretary Of The Air Force Wafer joined optoelectronic integrated circuits and method
US5646066A (en) * 1995-03-01 1997-07-08 Texas Instruments Incorporated Method for forming electrical contact to the optical coating of an infrared detector from the backside of the detector
US6235141B1 (en) 1996-09-27 2001-05-22 Digital Optics Corporation Method of mass producing and packaging integrated optical subsystems
US6114739A (en) * 1998-10-19 2000-09-05 Agilent Technologies Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode
FR2818443B1 (fr) * 2000-12-20 2003-10-31 Sagem Procede de fabrication de detecteur matriciel infrarouge a eclairage par la face arriere
FR2820242B1 (fr) * 2001-01-31 2003-06-13 Sagem Detecteur infrarouge hybride
GB2392308B (en) * 2002-08-15 2006-10-25 Detection Technology Oy Packaging structure for imaging detectors
US7351977B2 (en) 2002-11-08 2008-04-01 L-3 Communications Cincinnati Electronics Corporation Methods and systems for distinguishing multiple wavelengths of radiation and increasing detected signals in a detection system using micro-optic structures
US7095026B2 (en) * 2002-11-08 2006-08-22 L-3 Communications Cincinnati Electronics Corporation Methods and apparatuses for selectively limiting undesired radiation
US20070110361A1 (en) * 2003-08-26 2007-05-17 Digital Optics Corporation Wafer level integration of multiple optical elements
CN101459203B (zh) * 2003-09-09 2011-06-15 旭化成电子材料元件株式会社 红外线传感器ic、红外线传感器及其制造方法
JP4800883B2 (ja) * 2006-09-06 2011-10-26 日置電機株式会社 赤外線センサの製造方法
GB2441814B (en) * 2006-09-07 2012-04-11 Detection Technology Oy Photodiode array output signal multiplexing
US7777186B2 (en) * 2008-08-14 2010-08-17 L-3 Communications Cincinnati Electronics Corporation Pixel interconnect insulators and methods thereof
FR2938973B1 (fr) * 2008-11-27 2011-03-04 Sagem Defense Securite Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe
US8338200B2 (en) 2011-02-02 2012-12-25 L-3 Communications Cincinnati Electronics Corporation Frontside-illuminated inverted quantum well infrared photodetector devices and methods of fabricating the same
WO2013040184A1 (en) * 2011-09-13 2013-03-21 L-3 Communications Cincinnati Electronics Corporation Frontside-illuminated barrier infrared photodetector device and methods of fabricating the same
RU2519024C1 (ru) * 2012-07-31 2014-06-10 Открытое акционерное общество "НПО Орион" Многоэлементный ик фотоприемник
CN103633107B (zh) * 2013-12-16 2016-05-11 中国电子科技集团公司第四十四研究所 焦平面探测器安装结构
CN106415788B (zh) * 2014-04-07 2020-10-16 菲力尔系统公司 用于联接半导体基板的方法和系统
RU2571434C1 (ru) * 2014-10-03 2015-12-20 Российская Федерация, от имени которой выступает - Министерство промышленности и торговли Российской Федерации Матрица фоточувствительных элементов
US11094736B1 (en) 2014-11-07 2021-08-17 Hrl Laboratories, Llc Device and method for reducing cracking of material due to thermal mismatch
US10020343B2 (en) 2015-09-25 2018-07-10 Flir Systems, Inc. Wafer-level back-end fabrication systems and methods
CN105870032B (zh) * 2016-04-29 2018-06-29 河南科技大学 一种快速估算红外焦平面探测器中光敏元芯片厚度的方法
RU2628449C1 (ru) * 2016-11-02 2017-08-16 Акционерное общество "НПО "Орион" Способ изготовления многоэлементного ИК фотоприемника
RU2703497C1 (ru) * 2019-01-14 2019-10-17 Акционерное общество "НПО "Орион" Многоэлементный фотоприемник
CN110010758A (zh) * 2019-03-28 2019-07-12 浙江森尼克半导体有限公司 一种磷掺锑化铟薄膜、霍尔传感器件及其制备方法
RU2739863C1 (ru) * 2020-03-23 2020-12-29 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" Способ создания диодных оптоэлектронных пар, стойких к гамма-нейтронному излучению
CN111640803B (zh) * 2020-05-18 2022-03-11 中国电子科技集团公司第十一研究所 红外焦平面探测器的芯片组件及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3555818A (en) * 1968-04-22 1971-01-19 Blaine H Vlier Electrostatic precipitator
US3483096A (en) * 1968-04-25 1969-12-09 Avco Corp Process for making an indium antimonide infrared detector contact
US3808435A (en) * 1973-05-29 1974-04-30 Texas Instruments Inc Infra-red quantum differential detector system
US4053919A (en) * 1976-08-18 1977-10-11 The United States Of America As Represented By The Secretary Of The Air Force High speed infrared detector
US4364077A (en) * 1980-09-09 1982-12-14 The United States Of America As Represented By The Secretary Of The Air Force P+ N Gallium phosphide photodiodes
JPS5773984A (en) * 1980-10-27 1982-05-08 Fujitsu Ltd Manufacture of photodetector
GB2116363B (en) * 1982-03-03 1985-10-16 Philips Electronic Associated Multi-level infra-red detectors and their manufacture
JPS58164261A (ja) * 1982-03-25 1983-09-29 Toshiba Corp 赤外線撮像装置の製造方法
FR2536908B1 (fr) * 1982-11-30 1986-03-14 Telecommunications Sa Procede de fabrication d'un detecteur infrarouge matriciel a eclairage par la face avant
FR2556135B1 (fr) * 1983-12-02 1986-09-19 Thomson Csf Photo-diode a l'antimoniure d'indium et procede de fabrication
US4646120A (en) * 1985-03-21 1987-02-24 The United States Of America As Represented By The Secretary Of The Army Photodiode array
US4639756A (en) * 1986-05-05 1987-01-27 Santa Barbara Research Center Graded gap inversion layer photodiode array
US4956687A (en) * 1986-06-26 1990-09-11 Santa Barbara Research Center Backside contact blocked impurity band detector
US5116427A (en) * 1987-08-20 1992-05-26 Kopin Corporation High temperature photovoltaic cell
US4783594A (en) * 1987-11-20 1988-11-08 Santa Barbara Research Center Reticular detector array
FR2633101B1 (fr) * 1988-06-16 1992-02-07 Commissariat Energie Atomique Photodiode et matrice de photodiodes sur hgcdte et leurs procedes de fabrication
US4975567A (en) * 1989-06-29 1990-12-04 The United States Of America As Represented By The Secretary Of The Navy Multiband photoconductive detector based on layered semiconductor quantum wells

Also Published As

Publication number Publication date
KR100274124B1 (ko) 2000-12-15
US5304500A (en) 1994-04-19
IL99856A (en) 1994-12-29
IL99856A0 (en) 1992-08-18
EP0485115A2 (de) 1992-05-13
EP0485115B1 (de) 1999-01-07
JP3257687B2 (ja) 2002-02-18
JPH04290265A (ja) 1992-10-14
KR920010983A (ko) 1992-06-27
CA2054934C (en) 1999-07-13
EP0485115A3 (en) 1992-07-29
DE69130732T2 (de) 1999-09-09
US5227656A (en) 1993-07-13
CA2054934A1 (en) 1992-05-07

Similar Documents

Publication Publication Date Title
DE69130732T2 (de) Herstellungsverfahren für eine Opto-elektronische Strahlungsdetektormatrix
DE69028046T2 (de) Strahlungsabschirmung für thermoelektrisch gekühlte Infrarotdetektoren
DE69032785T2 (de) Strahlungsdetektormatrix mit strahlungsempfindlichen brücken
DE69029464T2 (de) Festkörperstrahlungsdetektor
DE69116770T2 (de) Strahlungsdetektor
DE69019497D1 (de) Strahlungsdetektor mit Szintillationsmatrix.
DE69022191T2 (de) Lineare Strahlungssonde.
DE3886233D1 (de) Halbleiter-Strahlungsdetektor.
DE69002265D1 (de) Strahlungsdetektor.
DE69019212T2 (de) Strahlungsmessvorrichtung.
DE3885653D1 (de) Strahlungsdetektor.
DE59010567D1 (de) Kernspinresonanz-spektrometer
FR2701148B1 (fr) Plaque réfléchissante et son procédé de fabrication.
DE69014892D1 (de) Einrichtung für infrarotausstrahlung.
DE69007303D1 (de) Strahlungsdetektor.
DE69200216T2 (de) Herstellungsverfahren für eine optoelektronische Vorrichtung.
DE69026117T2 (de) Hochgenauigkeits- und hochflexibilitätsenergiestrahlbearbeitungsanlage
BR8001933A (pt) Suporte de acondicionamento de componentes e processo de fabricacao utilizando o dito suporte
DE68908494T2 (de) Passiv-Strahlungsdetektor.
DE69028403D1 (de) Nachweismaterial für ionisierende strahlung
DE69006224D1 (de) Strahlungsdetektor.
FR2645266B1 (fr) Detecteur photo-electrique
DE69033187T2 (de) Strahlungsresistente Halbleiterstruktur
IT8467303A1 (it) Rivelatore di elio ad assorbimento ottico.
ITMI911939A0 (it) Processo di fabbricazione di lattine

Legal Events

Date Code Title Description
8364 No opposition during term of opposition