FR2938973B1 - Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe - Google Patents

Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe

Info

Publication number
FR2938973B1
FR2938973B1 FR0858073A FR0858073A FR2938973B1 FR 2938973 B1 FR2938973 B1 FR 2938973B1 FR 0858073 A FR0858073 A FR 0858073A FR 0858073 A FR0858073 A FR 0858073A FR 2938973 B1 FR2938973 B1 FR 2938973B1
Authority
FR
France
Prior art keywords
antimonially
infrared
manufacturing
transparent substrate
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0858073A
Other languages
English (en)
Other versions
FR2938973A1 (fr
Inventor
Arnaud Cordat
Herve Sik
Stephane Demiguel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societe Francaise de Detecteurs Infrarouges SOFRADIR SAS
Original Assignee
Sagem Defense Securite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sagem Defense Securite SA filed Critical Sagem Defense Securite SA
Priority to FR0858073A priority Critical patent/FR2938973B1/fr
Priority to EP09797114A priority patent/EP2351085A2/fr
Priority to PCT/FR2009/052328 priority patent/WO2010061151A2/fr
Priority to US13/130,705 priority patent/US20110233609A1/en
Publication of FR2938973A1 publication Critical patent/FR2938973A1/fr
Application granted granted Critical
Publication of FR2938973B1 publication Critical patent/FR2938973B1/fr
Priority to IL213085A priority patent/IL213085A/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers
    • H01L27/14649—Infrared imagers
    • H01L27/1465—Infrared imagers of the hybrid type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/1469—Assemblies, i.e. hybrid integration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14694—The active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
    • H01L31/1032—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIBVI compounds, e.g. HgCdTe IR photodiodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
    • H01L31/1035—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIIBV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1892—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof methods involving the use of temporary, removable substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
FR0858073A 2008-11-27 2008-11-27 Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe Expired - Fee Related FR2938973B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0858073A FR2938973B1 (fr) 2008-11-27 2008-11-27 Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe
EP09797114A EP2351085A2 (fr) 2008-11-27 2009-11-27 Procede de fabrication de cellules matricielles photosensibles dans l'infrarouge collees par adhesion moleculaire sur substrat optiquement transparent et capteur associe
PCT/FR2009/052328 WO2010061151A2 (fr) 2008-11-27 2009-11-27 Procede de fabrication de cellules matricielles photosensibles dans l'infrarouge collees par adhesion moleculaire sur substrat optiquement transparent et capteur associe
US13/130,705 US20110233609A1 (en) 2008-11-27 2009-11-27 Method for Producing Infrared-Photosensitive Matrix Cells Adhering to an Optically Transparent Substrate by Molecular Adhesion, and Related Sensor
IL213085A IL213085A (en) 2008-11-27 2011-05-24 A method of producing infrared light sensitive matrix cells that adheres to an optically transparent substrate through molecular adhesion and a related sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0858073A FR2938973B1 (fr) 2008-11-27 2008-11-27 Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe

Publications (2)

Publication Number Publication Date
FR2938973A1 FR2938973A1 (fr) 2010-05-28
FR2938973B1 true FR2938973B1 (fr) 2011-03-04

Family

ID=40937344

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0858073A Expired - Fee Related FR2938973B1 (fr) 2008-11-27 2008-11-27 Cellules matricielles photosensibles dans l'infrarouge a base d'antimoniure sur substrat optiquement transparent et procede de fabrication associe

Country Status (5)

Country Link
US (1) US20110233609A1 (fr)
EP (1) EP2351085A2 (fr)
FR (1) FR2938973B1 (fr)
IL (1) IL213085A (fr)
WO (1) WO2010061151A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9918023B2 (en) 2010-04-23 2018-03-13 Flir Systems, Inc. Segmented focal plane array architecture
JP5486541B2 (ja) * 2011-03-31 2014-05-07 浜松ホトニクス株式会社 フォトダイオードアレイモジュール及びその製造方法
FR2990565B1 (fr) 2012-05-09 2016-10-28 Commissariat Energie Atomique Procede de realisation de detecteurs infrarouges
US10020343B2 (en) 2015-09-25 2018-07-10 Flir Systems, Inc. Wafer-level back-end fabrication systems and methods
RU2703497C1 (ru) * 2019-01-14 2019-10-17 Акционерное общество "НПО "Орион" Многоэлементный фотоприемник
FR3114819B1 (fr) * 2020-10-06 2023-07-14 Pesci Raphael Alliage pour brasure utilisation dans un detecteur d'un tel alliage
CN114477075B (zh) * 2022-01-25 2022-10-28 北京智创芯源科技有限公司 一种片上集成微纳结构的加工方法、红外探测器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227656A (en) * 1990-11-06 1993-07-13 Cincinnati Electronics Corporation Electro-optical detector array
US5264699A (en) * 1991-02-20 1993-11-23 Amber Engineering, Inc. Infrared detector hybrid array with improved thermal cycle reliability and method for making same
JPH0513667A (ja) * 1991-07-04 1993-01-22 Fujitsu Ltd 半導体装置
US6133570A (en) * 1994-03-15 2000-10-17 Lockheed Martin Corporation Semiconductor photovoltaic diffractive resonant optical cavity infrared detector
US5672545A (en) * 1994-08-08 1997-09-30 Santa Barbara Research Center Thermally matched flip-chip detector assembly and method
DE19513678C2 (de) * 1995-04-11 2002-03-14 Aeg Infrarot Module Gmbh Detektoranordnung bestehend aus mehreren Submodulen
JP2671859B2 (ja) * 1995-04-14 1997-11-05 日本電気株式会社 赤外線検出素子及びその製造方法
US5846850A (en) * 1995-09-05 1998-12-08 Raytheon Ti Systems, Inc. Double sided interdiffusion process and structure for a double layer heterojunction focal plane array
US6417514B1 (en) * 2000-02-10 2002-07-09 Raytheon Company Sensor/support system having a stabilization structure affixed to a side of a platform oppositely disposed from a sensor assembly
FR2810453B1 (fr) * 2000-06-15 2002-11-15 Sofradir Detecteur de rayonnements electromagnetiques, et notamment de rayonnements infrarouges, et procede pour la realisation d'un tel detecteur
US6864552B2 (en) * 2003-01-21 2005-03-08 Mp Technologies, Llc Focal plane arrays in type II-superlattices

Also Published As

Publication number Publication date
EP2351085A2 (fr) 2011-08-03
FR2938973A1 (fr) 2010-05-28
IL213085A (en) 2016-03-31
IL213085A0 (en) 2011-07-31
WO2010061151A3 (fr) 2011-11-17
US20110233609A1 (en) 2011-09-29
WO2010061151A2 (fr) 2010-06-03

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Legal Events

Date Code Title Description
TP Transmission of property

Owner name: SOFRADIR, FR

Effective date: 20131129

ST Notification of lapse

Effective date: 20150731