DE69121446T2 - Zerstäubungssystem - Google Patents

Zerstäubungssystem

Info

Publication number
DE69121446T2
DE69121446T2 DE1991621446 DE69121446T DE69121446T2 DE 69121446 T2 DE69121446 T2 DE 69121446T2 DE 1991621446 DE1991621446 DE 1991621446 DE 69121446 T DE69121446 T DE 69121446T DE 69121446 T2 DE69121446 T2 DE 69121446T2
Authority
DE
Germany
Prior art keywords
atomization system
atomization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1991621446
Other languages
English (en)
Other versions
DE69121446D1 (de
Inventor
Avi Tepman
Norman William Parker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE69121446D1 publication Critical patent/DE69121446D1/de
Publication of DE69121446T2 publication Critical patent/DE69121446T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
DE1991621446 1990-03-30 1991-03-28 Zerstäubungssystem Expired - Fee Related DE69121446T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50239190A 1990-03-30 1990-03-30
US51271990A 1990-04-23 1990-04-23

Publications (2)

Publication Number Publication Date
DE69121446D1 DE69121446D1 (de) 1996-09-26
DE69121446T2 true DE69121446T2 (de) 1997-02-20

Family

ID=27054142

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991621446 Expired - Fee Related DE69121446T2 (de) 1990-03-30 1991-03-28 Zerstäubungssystem

Country Status (4)

Country Link
EP (1) EP0451642B1 (de)
JP (2) JP2934042B2 (de)
DE (1) DE69121446T2 (de)
ES (1) ES2090161T3 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188717A (en) * 1991-09-12 1993-02-23 Novellus Systems, Inc. Sweeping method and magnet track apparatus for magnetron sputtering
US5314597A (en) * 1992-03-20 1994-05-24 Varian Associates, Inc. Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile
US5374343A (en) * 1992-05-15 1994-12-20 Anelva Corporation Magnetron cathode assembly
US5431799A (en) * 1993-10-29 1995-07-11 Applied Materials, Inc. Collimation hardware with RF bias rings to enhance sputter and/or substrate cavity ion generation efficiency
AU4855696A (en) * 1995-01-12 1996-07-31 Boc Group, Inc., The Rotatable magnetron with curved or segmented end magnets
US5907220A (en) * 1996-03-13 1999-05-25 Applied Materials, Inc. Magnetron for low pressure full face erosion
WO1998037569A1 (en) * 1997-02-24 1998-08-27 Novellus Systems, Inc. Magnetic circuit for magnetron sputtering
US5876574A (en) * 1997-04-23 1999-03-02 Applied Materials, Inc. Magnet design for a sputtering chamber
US5795451A (en) * 1997-06-12 1998-08-18 Read-Rite Corporation Sputtering apparatus with a rotating magnet array
KR100345924B1 (ko) * 2000-01-24 2002-07-27 한전건 평판 마그네트론 스퍼터링 장치
KR100439474B1 (ko) * 2001-09-12 2004-07-09 삼성전자주식회사 스퍼터링 장치
DE10234858A1 (de) * 2002-07-31 2004-02-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Erzeugung einer Magnetron-Entladung
EP1710829A1 (de) * 2005-04-05 2006-10-11 Applied Films GmbH & Co. KG Magnetanordnung für ein Planar-Magnetron
CN106609352B (zh) * 2015-10-27 2019-04-23 北京北方华创微电子装备有限公司 溅射装置及其操作方法
CN108004516B (zh) * 2016-10-31 2020-06-19 北京北方华创微电子装备有限公司 磁控溅射腔室、磁控溅射设备以及磁控管

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2707144A1 (de) * 1976-02-19 1977-08-25 Sloan Technology Corp Kathodenzerstaeubungsvorrichtung
JPS60224775A (ja) * 1984-04-20 1985-11-09 Fujitsu Ltd スパツタ装置
JPS6260866A (ja) * 1985-08-02 1987-03-17 Fujitsu Ltd マグネトロンスパツタ装置
DE3619194A1 (de) * 1986-06-06 1987-12-10 Leybold Heraeus Gmbh & Co Kg Magnetron-zerstaeubungskatode fuer vakuum-beschichtungsanlagen
JP2627651B2 (ja) * 1988-10-17 1997-07-09 アネルバ株式会社 マグネトロンスパッタリング装置

Also Published As

Publication number Publication date
JPH04228567A (ja) 1992-08-18
EP0451642B1 (de) 1996-08-21
EP0451642A3 (en) 1992-02-26
ES2090161T3 (es) 1996-10-16
JP3535305B2 (ja) 2004-06-07
DE69121446D1 (de) 1996-09-26
EP0451642A2 (de) 1991-10-16
JPH0995781A (ja) 1997-04-08
JP2934042B2 (ja) 1999-08-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee