DE69118066D1 - Oberflächenemittierender Halbleiterlaser - Google Patents
Oberflächenemittierender HalbleiterlaserInfo
- Publication number
- DE69118066D1 DE69118066D1 DE69118066T DE69118066T DE69118066D1 DE 69118066 D1 DE69118066 D1 DE 69118066D1 DE 69118066 T DE69118066 T DE 69118066T DE 69118066 T DE69118066 T DE 69118066T DE 69118066 D1 DE69118066 D1 DE 69118066D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- surface emitting
- emitting semiconductor
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18338—Non-circular shape of the structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/16—Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
- H01S2301/166—Single transverse or lateral mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18394—Apertures, e.g. defined by the shape of the upper electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2211—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on II-VI materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2222—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties
- H01S5/2224—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties semi-insulating semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4068—Edge-emitting structures with lateral coupling by axially offset or by merging waveguides, e.g. Y-couplers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24200090 | 1990-09-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69118066D1 true DE69118066D1 (de) | 1996-04-25 |
DE69118066T2 DE69118066T2 (de) | 1996-09-19 |
Family
ID=17082765
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69118065T Expired - Lifetime DE69118065T2 (de) | 1990-09-12 | 1991-09-10 | Oberflächenemittierender Halbleiterlaser und Verfahren zu seiner Herstellung |
DE69116038T Expired - Lifetime DE69116038T2 (de) | 1990-09-12 | 1991-09-10 | Oberflächenemittierender Halbleiterlaser |
DE69118066T Expired - Lifetime DE69118066T2 (de) | 1990-09-12 | 1991-09-10 | Oberflächenemittierender Halbleiterlaser |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69118065T Expired - Lifetime DE69118065T2 (de) | 1990-09-12 | 1991-09-10 | Oberflächenemittierender Halbleiterlaser und Verfahren zu seiner Herstellung |
DE69116038T Expired - Lifetime DE69116038T2 (de) | 1990-09-12 | 1991-09-10 | Oberflächenemittierender Halbleiterlaser |
Country Status (5)
Country | Link |
---|---|
US (3) | US5182757A (de) |
EP (3) | EP0475372B1 (de) |
KR (3) | KR100210288B1 (de) |
DE (3) | DE69118065T2 (de) |
TW (1) | TW229338B (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5317584A (en) * | 1990-09-12 | 1994-05-31 | Seiko Epson Corporation | Surface emission type semiconductor laser |
US5436922A (en) * | 1990-09-12 | 1995-07-25 | Seiko Epson Corporation | Surface emission type semiconductor laser |
US5356832A (en) * | 1990-09-12 | 1994-10-18 | Seiko Epson Corporation | Method of making surface emission type semiconductor laser |
US5537666A (en) * | 1990-09-12 | 1996-07-16 | Seiko Epson Coropration | Surface emission type semiconductor laser |
US5404369A (en) * | 1990-09-12 | 1995-04-04 | Seiko Epson Corporation | Surface emission type semiconductor laser |
US5295148A (en) * | 1990-09-12 | 1994-03-15 | Seiko Epson Corporation | Surface emission type semiconductor laser |
DE69207521T2 (de) * | 1991-03-28 | 1996-09-05 | Seiko Epson Corp | Senkrecht zur Oberfläche emittierender Halbleiterlaser und Verfahren zu seiner Herstellung |
WO1992021069A1 (en) | 1991-05-14 | 1992-11-26 | Seiko Epson Corporation | Image-forming device |
KR950007490B1 (ko) * | 1991-12-28 | 1995-07-11 | 엘지전자주식회사 | 반도체 레이저 |
US5341001A (en) * | 1992-02-13 | 1994-08-23 | Matsushita Electric Industrial Co., Ltd. | Sulfide-selenide manganese-zinc mixed crystal photo semiconductor and laser diode |
US5245622A (en) * | 1992-05-07 | 1993-09-14 | Bandgap Technology Corporation | Vertical-cavity surface-emitting lasers with intra-cavity structures |
US5351255A (en) * | 1992-05-12 | 1994-09-27 | North Carolina State University Of Raleigh | Inverted integrated heterostructure of group II-VI semiconductor materials including epitaxial ohmic contact and method of fabricating same |
JPH065975A (ja) * | 1992-06-22 | 1994-01-14 | Matsushita Electric Ind Co Ltd | 半導体レーザ |
JP3095545B2 (ja) * | 1992-09-29 | 2000-10-03 | 株式会社東芝 | 面発光型半導体発光装置およびその製造方法 |
JPH0722646A (ja) * | 1993-06-30 | 1995-01-24 | Mitsubishi Chem Corp | 電流ブロック層を有するled |
SE501722C2 (sv) * | 1993-09-10 | 1995-05-02 | Ellemtel Utvecklings Ab | Ytemitterande laseranordning med vertikal kavitet |
SE501721C2 (sv) * | 1993-09-10 | 1995-05-02 | Ellemtel Utvecklings Ab | Laseranordning med i en optisk kavitet seriekopplade laserstrukturer |
KR100363503B1 (ko) * | 1994-01-20 | 2003-02-05 | 세이코 엡슨 가부시키가이샤 | 표면방출형반도체레이저와그제조방법 |
JP3452982B2 (ja) * | 1994-08-24 | 2003-10-06 | ローム株式会社 | Ledプリントヘッド、およびledアレイチップ、ならびにそのledアレイチップの製造方法 |
US5778018A (en) * | 1994-10-13 | 1998-07-07 | Nec Corporation | VCSELs (vertical-cavity surface emitting lasers) and VCSEL-based devices |
US5838705A (en) * | 1996-11-04 | 1998-11-17 | Motorola, Inc. | Light emitting device having a defect inhibition layer |
KR100322061B1 (ko) * | 1998-07-01 | 2002-03-08 | 김순택 | Crt용반도체레이저스크린 |
KR100322060B1 (ko) * | 1998-07-01 | 2002-03-08 | 김순택 | Crt용반도체레이저스크린및그제조방법 |
US6291839B1 (en) * | 1998-09-11 | 2001-09-18 | Lulileds Lighting, U.S. Llc | Light emitting device having a finely-patterned reflective contact |
DE19911433B4 (de) | 1999-03-04 | 2006-06-08 | Infineon Technologies Ag | Optische Sendeanordnung |
WO2001078261A2 (en) * | 2000-04-10 | 2001-10-18 | Lenslet Ltd. | Ofdm modem with an optical processor |
US7170919B2 (en) * | 2003-06-23 | 2007-01-30 | Northrop Grumman Corporation | Diode-pumped solid-state laser gain module |
KR100714639B1 (ko) * | 2003-10-21 | 2007-05-07 | 삼성전기주식회사 | 발광 소자 |
JP2006128475A (ja) * | 2004-10-29 | 2006-05-18 | Mitsubishi Electric Corp | 半導体レーザ |
KR100638732B1 (ko) * | 2005-04-15 | 2006-10-30 | 삼성전기주식회사 | 수직구조 질화물 반도체 발광소자의 제조방법 |
US8373153B2 (en) | 2009-05-26 | 2013-02-12 | University Of Seoul Industry Cooperation Foundation | Photodetectors |
US8367925B2 (en) * | 2009-06-29 | 2013-02-05 | University Of Seoul Industry Cooperation Foundation | Light-electricity conversion device |
US8809834B2 (en) * | 2009-07-06 | 2014-08-19 | University Of Seoul Industry Cooperation Foundation | Photodetector capable of detecting long wavelength radiation |
US8748862B2 (en) * | 2009-07-06 | 2014-06-10 | University Of Seoul Industry Cooperation Foundation | Compound semiconductors |
US8395141B2 (en) * | 2009-07-06 | 2013-03-12 | University Of Seoul Industry Cooperation Foundation | Compound semiconductors |
US8227793B2 (en) * | 2009-07-06 | 2012-07-24 | University Of Seoul Industry Cooperation Foundation | Photodetector capable of detecting the visible light spectrum |
US8368990B2 (en) | 2009-08-21 | 2013-02-05 | University Of Seoul Industry Cooperation Foundation | Polariton mode optical switch with composite structure |
US8368047B2 (en) * | 2009-10-27 | 2013-02-05 | University Of Seoul Industry Cooperation Foundation | Semiconductor device |
US8058641B2 (en) | 2009-11-18 | 2011-11-15 | University of Seoul Industry Corporation Foundation | Copper blend I-VII compound semiconductor light-emitting devices |
US10186676B2 (en) * | 2017-03-13 | 2019-01-22 | Intel Corporation | Emissive devices for displays |
US10651527B2 (en) | 2017-08-22 | 2020-05-12 | Qorvo Us, Inc. | Spatial power-combining devices with segmented waveguides and antennas |
WO2020026573A1 (ja) * | 2018-07-31 | 2020-02-06 | ソニー株式会社 | 面発光半導体レーザ |
KR102515120B1 (ko) * | 2019-01-21 | 2023-03-29 | 한온시스템 주식회사 | 스크롤 압축기 |
KR20230012705A (ko) | 2021-07-16 | 2023-01-26 | 주식회사 노브메타파마 | 고시페틴의 제조방법 |
CN113675726A (zh) * | 2021-10-21 | 2021-11-19 | 福建慧芯激光科技有限公司 | 一种高速垂直腔面发射激光器的外延结构 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6170280A (ja) * | 1984-09-12 | 1986-04-11 | M & M Technol:Kk | 弁 |
JPS6179280A (ja) * | 1984-09-27 | 1986-04-22 | Agency Of Ind Science & Technol | 面発光型半導体レ−ザ装置及びその製造方法 |
FR2606223B1 (fr) * | 1986-10-29 | 1996-03-01 | Seiko Epson Corp | Laser a semiconducteur et son procede de fabrication |
JPH01125990A (ja) * | 1987-11-11 | 1989-05-18 | Mitsubishi Electric Corp | 半導体発光装置 |
JPH01264285A (ja) * | 1988-04-15 | 1989-10-20 | Omron Tateisi Electron Co | 面発光型半導体レーザ |
JPH01266779A (ja) * | 1988-04-19 | 1989-10-24 | Canon Inc | 面発光レーザ |
US5031187A (en) * | 1990-02-14 | 1991-07-09 | Bell Communications Research, Inc. | Planar array of vertical-cavity, surface-emitting lasers |
US5045897A (en) * | 1990-03-14 | 1991-09-03 | Santa Barbara Research Center | Quaternary II-VI materials for photonics |
US5052016A (en) * | 1990-05-18 | 1991-09-24 | University Of New Mexico | Resonant-periodic-gain distributed-feedback surface-emitting semiconductor laser |
US5068868A (en) * | 1990-05-21 | 1991-11-26 | At&T Bell Laboratories | Vertical cavity surface emitting lasers with electrically conducting mirrors |
US5086430A (en) * | 1990-12-14 | 1992-02-04 | Bell Communications Research, Inc. | Phase-locked array of reflectivity-modulated surface-emitting lasers |
-
1991
- 1991-09-09 US US07/756,981 patent/US5182757A/en not_active Expired - Lifetime
- 1991-09-09 US US07/756,980 patent/US5181221A/en not_active Expired - Lifetime
- 1991-09-09 US US07/756,979 patent/US5181219A/en not_active Expired - Lifetime
- 1991-09-10 EP EP91115317A patent/EP0475372B1/de not_active Expired - Lifetime
- 1991-09-10 EP EP91115318A patent/EP0475373B1/de not_active Expired - Lifetime
- 1991-09-10 DE DE69118065T patent/DE69118065T2/de not_active Expired - Lifetime
- 1991-09-10 EP EP91115316A patent/EP0475371B1/de not_active Expired - Lifetime
- 1991-09-10 DE DE69116038T patent/DE69116038T2/de not_active Expired - Lifetime
- 1991-09-10 DE DE69118066T patent/DE69118066T2/de not_active Expired - Lifetime
- 1991-09-12 KR KR1019910016035A patent/KR100210288B1/ko not_active IP Right Cessation
- 1991-09-12 KR KR1019910016034A patent/KR100210289B1/ko not_active IP Right Cessation
- 1991-09-12 KR KR1019910016033A patent/KR100210290B1/ko not_active IP Right Cessation
- 1991-09-14 TW TW080107294A patent/TW229338B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69118066T2 (de) | 1996-09-19 |
KR920007283A (ko) | 1992-04-28 |
US5182757A (en) | 1993-01-26 |
KR100210288B1 (ko) | 1999-07-15 |
EP0475372A2 (de) | 1992-03-18 |
DE69118065T2 (de) | 1996-09-19 |
EP0475373A2 (de) | 1992-03-18 |
EP0475371A2 (de) | 1992-03-18 |
KR920007282A (ko) | 1992-04-28 |
DE69116038D1 (de) | 1996-02-15 |
KR920007281A (ko) | 1992-04-28 |
KR100210290B1 (ko) | 1999-07-15 |
EP0475371B1 (de) | 1996-03-20 |
EP0475371A3 (en) | 1992-08-05 |
TW229338B (de) | 1994-09-01 |
KR100210289B1 (ko) | 1999-07-15 |
US5181219A (en) | 1993-01-19 |
EP0475372B1 (de) | 1996-01-03 |
EP0475373A3 (en) | 1992-08-12 |
DE69116038T2 (de) | 1996-06-20 |
DE69118065D1 (de) | 1996-04-25 |
US5181221A (en) | 1993-01-19 |
EP0475372A3 (en) | 1992-08-05 |
EP0475373B1 (de) | 1996-03-20 |
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