DE69103338T2 - Verfahren zur Herstellung einer elektrolumineszenten Dünnschichtvorrichtung und Apparat für ihre Herstellung. - Google Patents

Verfahren zur Herstellung einer elektrolumineszenten Dünnschichtvorrichtung und Apparat für ihre Herstellung.

Info

Publication number
DE69103338T2
DE69103338T2 DE69103338T DE69103338T DE69103338T2 DE 69103338 T2 DE69103338 T2 DE 69103338T2 DE 69103338 T DE69103338 T DE 69103338T DE 69103338 T DE69103338 T DE 69103338T DE 69103338 T2 DE69103338 T2 DE 69103338T2
Authority
DE
Germany
Prior art keywords
manufacturing
thin film
same
film device
electroluminescent thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69103338T
Other languages
English (en)
Other versions
DE69103338D1 (de
Inventor
Hiroyuki Shimoyama
Noriaki Nakamura
Kinichi Isaka
Akio Inohara
Hiroshi Kishishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE69103338D1 publication Critical patent/DE69103338D1/de
Application granted granted Critical
Publication of DE69103338T2 publication Critical patent/DE69103338T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
DE69103338T 1990-05-30 1991-05-30 Verfahren zur Herstellung einer elektrolumineszenten Dünnschichtvorrichtung und Apparat für ihre Herstellung. Expired - Fee Related DE69103338T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2140629A JPH0793193B2 (ja) 1990-05-30 1990-05-30 薄膜ｅｌ素子の製造方法

Publications (2)

Publication Number Publication Date
DE69103338D1 DE69103338D1 (de) 1994-09-15
DE69103338T2 true DE69103338T2 (de) 1995-02-16

Family

ID=15273141

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69103338T Expired - Fee Related DE69103338T2 (de) 1990-05-30 1991-05-30 Verfahren zur Herstellung einer elektrolumineszenten Dünnschichtvorrichtung und Apparat für ihre Herstellung.

Country Status (4)

Country Link
US (1) US5372837A (de)
EP (1) EP0459806B1 (de)
JP (1) JPH0793193B2 (de)
DE (1) DE69103338T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69522295T2 (de) * 1994-05-31 2002-04-18 Toray Industries Verfahren und vorrichtung zur herstellung eines beschichteten substrats
US6610352B2 (en) * 2000-12-22 2003-08-26 Ifire Technology, Inc. Multiple source deposition process
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7238383B2 (en) * 2003-03-07 2007-07-03 Eastman Kodak Company Making and using compacted pellets for OLED displays
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
JP4849829B2 (ja) * 2005-05-15 2012-01-11 株式会社ソニー・コンピュータエンタテインメント センタ装置
US8419857B2 (en) * 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating
US20100247809A1 (en) * 2009-03-31 2010-09-30 Neal James W Electron beam vapor deposition apparatus for depositing multi-layer coating
WO2016202387A1 (en) * 2015-06-17 2016-12-22 Applied Materials, Inc. Method for measuring a deposition rate and deposition rate control system
US20180187302A1 (en) * 2015-09-21 2018-07-05 Jose Manuel Dieguez-Campo Measurement assembly for measuring a deposition rate and method therefore
CN108933184B (zh) * 2018-07-17 2020-05-05 武汉理工大学 一种纳米合金薄膜透明电极制备方法及装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3063867A (en) * 1958-12-16 1962-11-13 Western Electric Co Deposition and measurement of layer thickness
US3847114A (en) * 1971-06-09 1974-11-12 Ise Electronics Corp Apparatus for vapor deposition and ion implantation
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
US4539217A (en) * 1984-06-27 1985-09-03 Eaton Corporation Dose control method
US4631197A (en) * 1985-07-17 1986-12-23 Motorola, Inc. Apparatus and method for adjusting the frequency of a resonator by laser
JPS62149864A (ja) * 1985-12-24 1987-07-03 Ishikawajima Harima Heavy Ind Co Ltd 電子ビ−ムの照射方法
US4794302A (en) * 1986-01-08 1988-12-27 Kabushiki Kaisha Komatsu Seisakusho Thin film el device and method of manufacturing the same
US5025664A (en) * 1989-11-02 1991-06-25 Leybold Inficon, Inc. Multiple crystal head for deposition thickness monitor
US5112642A (en) * 1990-03-30 1992-05-12 Leybold Inficon, Inc. Measuring and controlling deposition on a piezoelectric monitor crystal

Also Published As

Publication number Publication date
US5372837A (en) 1994-12-13
EP0459806B1 (de) 1994-08-10
EP0459806A1 (de) 1991-12-04
JPH0434891A (ja) 1992-02-05
DE69103338D1 (de) 1994-09-15
JPH0793193B2 (ja) 1995-10-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN

8339 Ceased/non-payment of the annual fee