DE69030409D1 - Herstellungsverfahren für eine selbstjustierte diffundierte Verbindungsstruktur - Google Patents
Herstellungsverfahren für eine selbstjustierte diffundierte VerbindungsstrukturInfo
- Publication number
- DE69030409D1 DE69030409D1 DE69030409T DE69030409T DE69030409D1 DE 69030409 D1 DE69030409 D1 DE 69030409D1 DE 69030409 T DE69030409 T DE 69030409T DE 69030409 T DE69030409 T DE 69030409T DE 69030409 D1 DE69030409 D1 DE 69030409D1
- Authority
- DE
- Germany
- Prior art keywords
- self
- manufacturing process
- connection structure
- diffused connection
- aligned diffused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2257—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer being silicon or silicide or SIPOS, e.g. polysilicon, porous silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28525—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising semiconducting material
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/382,879 US5026663A (en) | 1989-07-21 | 1989-07-21 | Method of fabricating a structure having self-aligned diffused junctions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69030409D1 true DE69030409D1 (de) | 1997-05-15 |
DE69030409T2 DE69030409T2 (de) | 1997-10-23 |
Family
ID=23510780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69030409T Expired - Fee Related DE69030409T2 (de) | 1989-07-21 | 1990-07-16 | Herstellungsverfahren für eine selbstjustierte diffundierte Verbindungsstruktur |
Country Status (4)
Country | Link |
---|---|
US (1) | US5026663A (de) |
EP (1) | EP0409132B1 (de) |
JP (1) | JPH0370127A (de) |
DE (1) | DE69030409T2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5397912A (en) * | 1991-12-02 | 1995-03-14 | Motorola, Inc. | Lateral bipolar transistor |
US5156987A (en) * | 1991-12-18 | 1992-10-20 | Micron Technology, Inc. | High performance thin film transistor (TFT) by solid phase epitaxial regrowth |
US5331116A (en) * | 1992-04-30 | 1994-07-19 | Sgs-Thomson Microelectronics, Inc. | Structure and method for forming contact structures in integrated circuits |
US5650655A (en) | 1994-04-28 | 1997-07-22 | Micron Technology, Inc. | Integrated circuitry having electrical interconnects |
US5493130A (en) * | 1993-06-10 | 1996-02-20 | Micron Technology, Inc. | Integrated circuitry having an electrically conductive sidewall link positioned over and electrically interconnecting respective outer sidewalls of two conductive layers |
JP2679647B2 (ja) * | 1994-09-28 | 1997-11-19 | 日本電気株式会社 | 半導体装置 |
US5844297A (en) * | 1995-09-26 | 1998-12-01 | Symbios, Inc. | Antifuse device for use on a field programmable interconnect chip |
KR100255512B1 (ko) * | 1996-06-29 | 2000-05-01 | 김영환 | 플래쉬 메모리 소자 제조방법 |
US6387768B1 (en) * | 2000-08-29 | 2002-05-14 | Semiconductor Components Industries Llc | Method of manufacturing a semiconductor component and semiconductor component thereof |
US6809396B2 (en) * | 2002-11-25 | 2004-10-26 | Semiconductor Components Industries, L.L.C. | Integrated circuit with a high speed narrow base width vertical PNP transistor |
US6998670B2 (en) * | 2003-04-25 | 2006-02-14 | Atmel Corporation | Twin EEPROM memory transistors with subsurface stepped floating gates |
US7232732B2 (en) * | 2003-10-06 | 2007-06-19 | Atmel Corporation | Semiconductor device with a toroidal-like junction |
US20050239250A1 (en) * | 2003-08-11 | 2005-10-27 | Bohumil Lojek | Ultra dense non-volatile memory array |
US7169660B2 (en) * | 2003-10-06 | 2007-01-30 | Atmel Corporation | Lithography-independent fabrication of small openings for forming vertical mos transistor |
US7300850B2 (en) * | 2005-09-30 | 2007-11-27 | Semiconductor Components Industries, L.L.C. | Method of forming a self-aligned transistor |
US20070166971A1 (en) * | 2006-01-17 | 2007-07-19 | Atmel Corporation | Manufacturing of silicon structures smaller than optical resolution limits |
US20070235797A1 (en) * | 2006-03-29 | 2007-10-11 | Bohumil Lojek | Process for reducing a size of a compact EEPROM device |
JP2013001435A (ja) * | 2011-06-17 | 2013-01-07 | Nitto Lifetech Kk | 袋体構成部材用多孔質フィルム及びカイロ用袋体構成部材 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4209350A (en) * | 1978-11-03 | 1980-06-24 | International Business Machines Corporation | Method for forming diffusions having narrow dimensions utilizing reactive ion etching |
US4333794A (en) * | 1981-04-07 | 1982-06-08 | International Business Machines Corporation | Omission of thick Si3 N4 layers in ISA schemes |
US4483726A (en) * | 1981-06-30 | 1984-11-20 | International Business Machines Corporation | Double self-aligned fabrication process for making a bipolar transistor structure having a small polysilicon-to-extrinsic base contact area |
NL8105920A (nl) * | 1981-12-31 | 1983-07-18 | Philips Nv | Halfgeleiderinrichting en werkwijze voor het vervaardigen van een dergelijke halfgeleiderinrichting. |
US4507171A (en) * | 1982-08-06 | 1985-03-26 | International Business Machines Corporation | Method for contacting a narrow width PN junction region |
US4545114A (en) * | 1982-09-30 | 1985-10-08 | Fujitsu Limited | Method of producing semiconductor device |
NL8302541A (nl) * | 1983-07-15 | 1985-02-01 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting, en halfgeleiderinrichting vervaardigd volgens de werkwijze. |
US4569701A (en) * | 1984-04-05 | 1986-02-11 | At&T Bell Laboratories | Technique for doping from a polysilicon transfer layer |
JPH0658912B2 (ja) * | 1985-05-07 | 1994-08-03 | 日本電信電話株式会社 | バイポーラトランジスタの製造方法 |
US4678537A (en) * | 1985-05-23 | 1987-07-07 | Sony Corporation | Method of manufacturing semiconductor devices |
JPS63193562A (ja) * | 1987-02-06 | 1988-08-10 | Toshiba Corp | バイポ−ラトランジスタの製造方法 |
US4839305A (en) * | 1988-06-28 | 1989-06-13 | Texas Instruments Incorporated | Method of making single polysilicon self-aligned transistor |
-
1989
- 1989-07-21 US US07/382,879 patent/US5026663A/en not_active Expired - Fee Related
-
1990
- 1990-07-16 DE DE69030409T patent/DE69030409T2/de not_active Expired - Fee Related
- 1990-07-16 EP EP90113569A patent/EP0409132B1/de not_active Expired - Lifetime
- 1990-07-20 JP JP2190905A patent/JPH0370127A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0409132A3 (en) | 1991-11-21 |
JPH0370127A (ja) | 1991-03-26 |
US5026663A (en) | 1991-06-25 |
EP0409132A2 (de) | 1991-01-23 |
DE69030409T2 (de) | 1997-10-23 |
EP0409132B1 (de) | 1997-04-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |