DE69027142T2 - Röntgenstrahl-Belichtungsapparat - Google Patents

Röntgenstrahl-Belichtungsapparat

Info

Publication number
DE69027142T2
DE69027142T2 DE69027142T DE69027142T DE69027142T2 DE 69027142 T2 DE69027142 T2 DE 69027142T2 DE 69027142 T DE69027142 T DE 69027142T DE 69027142 T DE69027142 T DE 69027142T DE 69027142 T2 DE69027142 T2 DE 69027142T2
Authority
DE
Germany
Prior art keywords
exposure apparatus
ray exposure
ray
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69027142T
Other languages
English (en)
Other versions
DE69027142D1 (de
Inventor
Masayuki Suzuki
Shinichiro Uno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69027142D1 publication Critical patent/DE69027142D1/de
Application granted granted Critical
Publication of DE69027142T2 publication Critical patent/DE69027142T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE69027142T 1989-03-22 1990-03-21 Röntgenstrahl-Belichtungsapparat Expired - Fee Related DE69027142T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7095189A JP2637546B2 (ja) 1989-03-22 1989-03-22 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
DE69027142D1 DE69027142D1 (de) 1996-07-04
DE69027142T2 true DE69027142T2 (de) 1996-10-24

Family

ID=13446324

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69027142T Expired - Fee Related DE69027142T2 (de) 1989-03-22 1990-03-21 Röntgenstrahl-Belichtungsapparat

Country Status (4)

Country Link
US (1) US5127029A (de)
EP (1) EP0389259B1 (de)
JP (1) JP2637546B2 (de)
DE (1) DE69027142T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2727787B2 (ja) * 1991-05-13 1998-03-18 三菱電機株式会社 Ｘ線露光装置
US5572562A (en) * 1993-04-30 1996-11-05 Lsi Logic Corporation Image mask substrate for X-ray semiconductor lithography
US5512395A (en) * 1993-04-30 1996-04-30 Lsi Logic Corporation Image masks for semiconductor lithography
JP2526409B2 (ja) * 1994-02-18 1996-08-21 工業技術院長 Ｘ線レンズ
JP5395615B2 (ja) * 2009-10-27 2014-01-22 キヤノン株式会社 無線通信装置、無線通信装置の制御方法及びプログラム
JP5975685B2 (ja) 2012-03-09 2016-08-23 キヤノン株式会社 情報処理装置、情報処理方法
JP6000579B2 (ja) 2012-03-09 2016-09-28 キヤノン株式会社 情報処理装置、情報処理方法
JP5977544B2 (ja) 2012-03-09 2016-08-24 キヤノン株式会社 情報処理装置、情報処理方法
JP6027764B2 (ja) 2012-04-25 2016-11-16 キヤノン株式会社 ミラーシステム、および、その制御方法
CN103353710B (zh) * 2013-06-26 2015-03-18 京东方科技集团股份有限公司 曝光装置、曝光系统及曝光方法
US9757863B2 (en) 2015-01-30 2017-09-12 Canon Kabushiki Kaisha Robot apparatus, exchanger apparatus and robot system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631743A (en) * 1983-09-22 1986-12-23 Agency Of Industrial Science & Technology X-ray generating apparatus
JPS60156000A (ja) * 1984-01-26 1985-08-16 工業技術院長 軟ｘ線投射装置
JPS60226122A (ja) * 1984-04-25 1985-11-11 Hitachi Ltd 光反射鏡および露光装置
JPS6441900A (en) * 1987-08-07 1989-02-14 Nec Corp X-ray exposure system

Also Published As

Publication number Publication date
DE69027142D1 (de) 1996-07-04
JPH02248900A (ja) 1990-10-04
JP2637546B2 (ja) 1997-08-06
US5127029A (en) 1992-06-30
EP0389259A2 (de) 1990-09-26
EP0389259A3 (de) 1991-08-14
EP0389259B1 (de) 1996-05-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee