JPS6441900A - X-ray exposure system - Google Patents
X-ray exposure systemInfo
- Publication number
- JPS6441900A JPS6441900A JP62196259A JP19625987A JPS6441900A JP S6441900 A JPS6441900 A JP S6441900A JP 62196259 A JP62196259 A JP 62196259A JP 19625987 A JP19625987 A JP 19625987A JP S6441900 A JPS6441900 A JP S6441900A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- slit
- synchrotron radiation
- ray
- radiation ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To transfer a large area with a uniform intensity, by placing a slit continuously controllable from the outside, between a source of a synchrotron radiation ray and an X-ray mirror. CONSTITUTION:A slit 11 is placed between a source 2 of synchrotron radiation ray and a vibrating X-ray mirror 8. The synchrotron radiation ray 3 from the source 2 is projected into the mirror 8, being restricted on its lengthwise beam width. The vibration of the mirror 8 and the movement of the slit 11 is synchronized by controlling the slit driving 13 and the mirror driving 14, based on signals from a controller 12. With compensating a variation of the synchrotron radiation ray caused by an incident angle of the mirror 8 by a width of the slit 11, the synchrotron radiation ray with a specifically uniform intensity is always irradiated to a resist membrane 5, independently from the incident angle of the mirror 8. Thereby a transfer of large area with an uniform intensity is accomplished.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62196259A JPS6441900A (en) | 1987-08-07 | 1987-08-07 | X-ray exposure system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62196259A JPS6441900A (en) | 1987-08-07 | 1987-08-07 | X-ray exposure system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6441900A true JPS6441900A (en) | 1989-02-14 |
Family
ID=16354834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62196259A Pending JPS6441900A (en) | 1987-08-07 | 1987-08-07 | X-ray exposure system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6441900A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5127029A (en) * | 1989-03-22 | 1992-06-30 | Canon Kabushiki Kaisha | X-ray exposure apparatus |
JPH06273599A (en) * | 1993-03-24 | 1994-09-30 | Soltec:Kk | Radiation light exposure device |
KR100902823B1 (en) * | 2002-10-04 | 2009-06-12 | 주식회사 포스코 | Apparatus for separating the lump steel sticked on the top of a ladle |
-
1987
- 1987-08-07 JP JP62196259A patent/JPS6441900A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5127029A (en) * | 1989-03-22 | 1992-06-30 | Canon Kabushiki Kaisha | X-ray exposure apparatus |
JPH06273599A (en) * | 1993-03-24 | 1994-09-30 | Soltec:Kk | Radiation light exposure device |
KR100902823B1 (en) * | 2002-10-04 | 2009-06-12 | 주식회사 포스코 | Apparatus for separating the lump steel sticked on the top of a ladle |
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