DE69023592D1 - Verfahren zur Korrektur des Astigmatismus eines Strahles dessen Querschnittsform veränderbar ist. - Google Patents

Verfahren zur Korrektur des Astigmatismus eines Strahles dessen Querschnittsform veränderbar ist.

Info

Publication number
DE69023592D1
DE69023592D1 DE69023592T DE69023592T DE69023592D1 DE 69023592 D1 DE69023592 D1 DE 69023592D1 DE 69023592 T DE69023592 T DE 69023592T DE 69023592 T DE69023592 T DE 69023592T DE 69023592 D1 DE69023592 D1 DE 69023592D1
Authority
DE
Germany
Prior art keywords
astigmatism
correcting
changed
sectional shape
whose cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69023592T
Other languages
English (en)
Other versions
DE69023592T2 (de
Inventor
Kiyoshi Hattori
Shuichi Tamamushi
Eiji Nishimura
Naotaka Ikeda
Hirotsugu Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE69023592D1 publication Critical patent/DE69023592D1/de
Application granted granted Critical
Publication of DE69023592T2 publication Critical patent/DE69023592T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69023592T 1989-09-21 1990-09-21 Verfahren zur Korrektur des Astigmatismus eines Strahles dessen Querschnittsform veränderbar ist. Expired - Fee Related DE69023592T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1243313A JP2835097B2 (ja) 1989-09-21 1989-09-21 荷電ビームの非点収差補正方法

Publications (2)

Publication Number Publication Date
DE69023592D1 true DE69023592D1 (de) 1995-12-21
DE69023592T2 DE69023592T2 (de) 1996-03-28

Family

ID=17101977

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69023592T Expired - Fee Related DE69023592T2 (de) 1989-09-21 1990-09-21 Verfahren zur Korrektur des Astigmatismus eines Strahles dessen Querschnittsform veränderbar ist.

Country Status (4)

Country Link
US (1) US5047646A (de)
EP (1) EP0419287B1 (de)
JP (1) JP2835097B2 (de)
DE (1) DE69023592T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5172331A (en) * 1989-12-18 1992-12-15 Fujitsu Limited Apparatus and method for effecting exposure of sample to charged particle beam
US5283440A (en) * 1990-10-05 1994-02-01 Hitachi, Ltd. Electron beam writing system used in a cell projection method
US5391886A (en) * 1991-08-09 1995-02-21 Fujitsu Limited Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system
US5304811A (en) * 1991-08-09 1994-04-19 Fujitsu Ltd. Lithography system using charged-particle beam and method of using the same
US5389858A (en) * 1992-07-16 1995-02-14 International Business Machines Corporation Variable axis stigmator
JP3402868B2 (ja) * 1995-09-14 2003-05-06 株式会社東芝 荷電粒子光学鏡筒における非点収差の補正及び焦点合わせ方法
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
US6025600A (en) * 1998-05-29 2000-02-15 International Business Machines Corporation Method for astigmatism correction in charged particle beam systems
DE19827819C2 (de) * 1998-06-17 2003-07-03 Equicon Software Gmbh Jena Verfahren zur Steuerung von Elektronenstrahl-Belichtungsanlagen mit Formstrahlprinzip
US6825480B1 (en) * 1999-06-23 2004-11-30 Hitachi, Ltd. Charged particle beam apparatus and automatic astigmatism adjustment method
JP3993094B2 (ja) * 2000-07-27 2007-10-17 株式会社荏原製作所 シートビーム式検査装置
US7062091B2 (en) * 2001-01-16 2006-06-13 Applied Precision, Llc Coordinate calibration for scanning systems
JP4006216B2 (ja) 2001-10-26 2007-11-14 日本電子株式会社 可変面積型電子ビーム描画装置を用いた描画方法
JP4158199B2 (ja) * 2004-01-30 2008-10-01 株式会社島津製作所 Ｔｆｔアレイ検査装置
JP4299293B2 (ja) * 2005-11-17 2009-07-22 株式会社ニューフレアテクノロジー 荷電ビーム描画装置
JP4801996B2 (ja) * 2006-01-05 2011-10-26 株式会社ニューフレアテクノロジー 試料移動機構及び荷電粒子ビーム描画装置
KR101350980B1 (ko) * 2007-12-31 2014-01-15 삼성전자주식회사 Ｃｄ 선형성을 보정할 수 있는 가변 성형 빔을 이용한 노광방법 및 이를 이용한 패턴 형성 방법
JP2011171009A (ja) * 2010-02-16 2011-09-01 Sii Nanotechnology Inc 集束イオンビーム装置
US8760563B2 (en) 2010-10-19 2014-06-24 Hand Held Products, Inc. Autofocusing optical imaging device
US8692927B2 (en) 2011-01-19 2014-04-08 Hand Held Products, Inc. Imaging terminal having focus control
JP6349944B2 (ja) * 2014-05-13 2018-07-04 株式会社ニューフレアテクノロジー 電子ビーム描画装置及び電子ビーム描画方法
JP7200062B2 (ja) * 2019-07-26 2023-01-06 日本電子株式会社 荷電粒子ビーム装置
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4090077A (en) * 1969-03-05 1978-05-16 Siemens Aktiengesellschaft Particle beam device with a deflection system and a stigmator
GB2002547B (en) * 1977-07-30 1982-01-20 Tee W Investigation of astigmatism in electron beam probe instruments
JPS5613649A (en) * 1979-07-12 1981-02-10 Akashi Seisakusho Co Ltd Correcting method and device for astigmatism in scanning type electron microscope and the like
JPS5693318A (en) * 1979-12-10 1981-07-28 Fujitsu Ltd Electron beam exposure device
JPS56147350A (en) * 1980-04-16 1981-11-16 Nichidenshi Tekunikusu:Kk Correction method and performing device of astigmatism
GB2123582B (en) * 1982-06-18 1986-01-29 Nat Res Dev Correction of astigmatism in electron beam instruments
JPS60147117A (ja) * 1984-01-10 1985-08-03 Fujitsu Ltd 電子ビ−ム装置の調整方法
JPH0793253B2 (ja) * 1986-10-31 1995-10-09 株式会社東芝 荷電ビ−ム露光装置
GB2197751A (en) * 1986-11-24 1988-05-25 Philips Electronic Associated Variable shaped spot electron beam pattern generator
JPS63200444A (ja) * 1987-02-16 1988-08-18 Jeol Ltd 走査型電子顕微鏡等の自動非点収差補正方法
JPH0756786B2 (ja) * 1988-03-09 1995-06-14 株式会社日立製作所 電子顕微鏡の焦点合わせ装置
JP2786662B2 (ja) 1989-03-31 1998-08-13 株式会社東芝 荷電ビーム描画方法
JP2786660B2 (ja) 1989-03-31 1998-08-13 株式会社東芝 荷電ビーム描画方法
JP2786661B2 (ja) 1989-03-31 1998-08-13 株式会社東芝 荷電ビーム描画方法

Also Published As

Publication number Publication date
JP2835097B2 (ja) 1998-12-14
US5047646A (en) 1991-09-10
DE69023592T2 (de) 1996-03-28
EP0419287B1 (de) 1995-11-15
EP0419287A2 (de) 1991-03-27
JPH03108312A (ja) 1991-05-08
EP0419287A3 (en) 1992-01-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee