DE69022826D1 - Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung. - Google Patents

Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung.

Info

Publication number
DE69022826D1
DE69022826D1 DE69022826T DE69022826T DE69022826D1 DE 69022826 D1 DE69022826 D1 DE 69022826D1 DE 69022826 T DE69022826 T DE 69022826T DE 69022826 T DE69022826 T DE 69022826T DE 69022826 D1 DE69022826 D1 DE 69022826D1
Authority
DE
Germany
Prior art keywords
production
recording medium
magnetic recording
magnetic
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69022826T
Other languages
English (en)
Other versions
DE69022826T2 (de
Inventor
Mikio Murai
Kiyoshi Takahashi
Masaru Odagiri
Yoshiaki Kai
Takashi Suzuki
Toshiaki Kunieda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69022826D1 publication Critical patent/DE69022826D1/de
Application granted granted Critical
Publication of DE69022826T2 publication Critical patent/DE69022826T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253—Fluorocarbon lubricant
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/726—Two or more protective coatings
    • G11B5/7262—Inorganic protective coating
    • G11B5/7264—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon
    • G11B5/7266—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon comprising a lubricant over the inorganic carbon coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC
    • Y10S427/106—Utilizing plasma, e.g. corona, glow discharge, cold plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/90—Magnetic feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24372—Particulate matter
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
DE1990622826 1989-12-11 1990-11-22 Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung. Expired - Lifetime DE69022826T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32169889 1989-12-11

Publications (2)

Publication Number Publication Date
DE69022826D1 true DE69022826D1 (de) 1995-11-09
DE69022826T2 DE69022826T2 (de) 1996-03-07

Family

ID=18135426

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990622826 Expired - Lifetime DE69022826T2 (de) 1989-12-11 1990-11-22 Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung.

Country Status (4)

Country Link
US (2) US5182132A (de)
EP (1) EP0432536B1 (de)
JP (1) JPH0721858B2 (de)
DE (1) DE69022826T2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930011413B1 (ko) * 1990-09-25 1993-12-06 가부시키가이샤 한도오따이 에네루기 겐큐쇼 펄스형 전자파를 사용한 플라즈마 cvd 법
JPH04205814A (ja) * 1990-11-30 1992-07-28 Nec Corp 磁気記憶体
EP0523607B1 (de) * 1991-07-15 1997-05-07 Matsushita Electric Industrial Co., Ltd. Magnetisches Aufzeichnungsmedium, Gleitkörper und Methode zu ihrer Herstellung
JPH0525648A (ja) * 1991-07-15 1993-02-02 Matsushita Electric Ind Co Ltd プラズマｃｖｄ成膜方法
JPH06223356A (ja) * 1992-12-03 1994-08-12 Tdk Corp 磁気記録媒体
JP3008666B2 (ja) * 1992-04-30 2000-02-14 松下電器産業株式会社 金属薄膜型磁気記録媒体の製造方法
JP2990681B2 (ja) * 1992-08-12 1999-12-13 富士写真フイルム株式会社 磁気記録媒体
EP0594082A1 (de) * 1992-10-20 1994-04-27 Matsushita Electric Industrial Co., Ltd. Magnetisches Aufzeichnungsmedium und Herstellungsverfahren
US6805941B1 (en) * 1992-11-19 2004-10-19 Semiconductor Energy Laboratory Co., Ltd. Magnetic recording medium
US5637373A (en) 1992-11-19 1997-06-10 Semiconductor Energy Laboratory Co., Ltd. Magnetic recording medium
US6171674B1 (en) 1993-07-20 2001-01-09 Semiconductor Energy Laboratory Co., Ltd. Hard carbon coating for magnetic recording medium
US6835523B1 (en) 1993-05-09 2004-12-28 Semiconductor Energy Laboratory Co., Ltd. Apparatus for fabricating coating and method of fabricating the coating
JP2746073B2 (ja) * 1993-08-25 1998-04-28 日本電気株式会社 磁気記憶体の製造方法
US5677051A (en) * 1993-11-30 1997-10-14 Tdk Corporation Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant
JP3491942B2 (ja) * 1994-01-31 2004-02-03 富士写真フイルム株式会社 磁気記録媒体
CN1125439C (zh) * 1994-07-13 2003-10-22 三星电子株式会社 制造磁头的方法
US5464667A (en) * 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
US5462784A (en) * 1994-11-02 1995-10-31 International Business Machines Corporation Fluorinated diamond-like carbon protective coating for magnetic recording media devices
DE69609244T2 (de) * 1995-03-31 2001-03-08 Ceramoptec Gmbh Verfahren zur Herstellung diamantartiger Beschichtungen
JPH08321029A (ja) * 1995-05-24 1996-12-03 Sony Corp 磁気記録媒体及びその製造方法
US5781377A (en) * 1996-02-20 1998-07-14 Seagate Technology, Inc. Slider with protective DLC or nonhygroscopic coating on the trailing edge face
US5858477A (en) * 1996-12-10 1999-01-12 Akashic Memories Corporation Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon
US5948166A (en) * 1996-11-05 1999-09-07 3M Innovative Properties Company Process and apparatus for depositing a carbon-rich coating on a moving substrate
US5888594A (en) * 1996-11-05 1999-03-30 Minnesota Mining And Manufacturing Company Process for depositing a carbon-rich coating on a moving substrate
US5852636A (en) * 1997-08-08 1998-12-22 Serge Mathieu Method of and apparatus for modulation of FSK carrier in a very narrow band
US5986851A (en) * 1997-08-15 1999-11-16 Seagate Technology, Inc. Selective carbon overcoat of the trailing edge of MR sliders
US6203898B1 (en) * 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
KR100521120B1 (ko) * 1998-02-13 2005-10-12 가부시끼가이샤 히다치 세이사꾸쇼 반도체소자의 표면처리방법 및 장치
US6338777B1 (en) 1998-10-23 2002-01-15 International Business Machines Corporation Method and apparatus for sputtering thin films
US6542334B2 (en) 1998-11-18 2003-04-01 Seagate Technology Llc Edge structure for slider-disc interface and method of manufacture therefor
US20030175485A1 (en) * 2002-03-15 2003-09-18 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium, method for manufacturing the same, and resistance roller used for the method
US7327535B2 (en) * 2003-05-08 2008-02-05 Sae Magnetics (H.K.) Ltd. Hybrid coating for magnetic heads
US7569631B2 (en) 2003-07-16 2009-08-04 Daikin Industries, Ltd. Method for producing fluorine-containing polymer, aqueous dispersion of fluorine-containing polymer,2-acyloxycarboxylic acid derivative, and surface active agent
JP2008171505A (ja) 2007-01-12 2008-07-24 Showa Denko Kk 炭素保護膜の形成方法及び磁気記録媒体の製造方法、磁気記録媒体並びに磁気記録再生装置
JP2010003359A (ja) * 2008-06-20 2010-01-07 Hitachi Ltd 熱アシスト磁気記録用磁気ディスク及びそれを用いた磁気ディスク装置

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* Cited by examiner, † Cited by third party
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JPS50104602A (de) * 1974-01-21 1975-08-18
JPS60119629A (ja) * 1983-11-30 1985-06-27 Sony Corp 磁気記録媒体
US4645977A (en) * 1984-08-31 1987-02-24 Matsushita Electric Industrial Co., Ltd. Plasma CVD apparatus and method for forming a diamond like carbon film
JPS61210518A (ja) * 1985-03-13 1986-09-18 Matsushita Electric Ind Co Ltd 磁気記録媒体の製造方法
JPS61253634A (ja) * 1985-05-01 1986-11-11 Hitachi Maxell Ltd 磁気記録媒体
JPH0736216B2 (ja) * 1985-10-15 1995-04-19 日立マクセル株式会社 磁気デイスク
CA1297738C (en) * 1986-01-09 1992-03-24 Hirofumi Kondo Magnetic recording medium
US4833031A (en) * 1986-03-20 1989-05-23 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium
US4880687A (en) * 1986-05-09 1989-11-14 Tdk Corporation Magnetic recording medium
US4833032A (en) * 1986-09-12 1989-05-23 E. I. Du Pont De Nemours And Company Texturing polyester yarns
EP0277783B1 (de) * 1987-02-02 1994-04-06 Canon Kabushiki Kaisha Magnetischer Aufzeichnungsträger
KR900008505B1 (ko) * 1987-02-24 1990-11-24 세미콘덕터 에너지 라보라터리 캄파니 리미티드 탄소 석출을 위한 마이크로파 강화 cvd 방법
US5275850A (en) * 1988-04-20 1994-01-04 Hitachi, Ltd. Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias
JPH03130919A (ja) * 1989-07-07 1991-06-04 Matsushita Electric Ind Co Ltd 磁気記録媒体

Also Published As

Publication number Publication date
US5182132A (en) 1993-01-26
JPH03224132A (ja) 1991-10-03
JPH0721858B2 (ja) 1995-03-08
US5443888A (en) 1995-08-22
EP0432536B1 (de) 1995-10-04
EP0432536A2 (de) 1991-06-19
EP0432536A3 (en) 1991-11-06
DE69022826T2 (de) 1996-03-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: JUNG, SCHIRDEWAHN, GRUENBERG, SCHNEIDER PATENTANWAELTE

8328 Change in the person/name/address of the agent

Representative=s name: ADVOTEC. PATENT- UND RECHTSANWAELTE, 80538 MUENCHE

8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP