DE69019250D1 - Verfahren und Vorrichtung zur chemischen Dampfphasenabscheidung. - Google Patents

Verfahren und Vorrichtung zur chemischen Dampfphasenabscheidung.

Info

Publication number
DE69019250D1
DE69019250D1 DE69019250T DE69019250T DE69019250D1 DE 69019250 D1 DE69019250 D1 DE 69019250D1 DE 69019250 T DE69019250 T DE 69019250T DE 69019250 T DE69019250 T DE 69019250T DE 69019250 D1 DE69019250 D1 DE 69019250D1
Authority
DE
Germany
Prior art keywords
vapor deposition
chemical vapor
chemical
deposition
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69019250T
Other languages
English (en)
Other versions
DE69019250T2 (de
Inventor
Hitoshi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE69019250D1 publication Critical patent/DE69019250D1/de
Publication of DE69019250T2 publication Critical patent/DE69019250T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
DE69019250T 1989-07-20 1990-07-19 Verfahren und Vorrichtung zur chemischen Dampfphasenabscheidung. Expired - Fee Related DE69019250T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18600889 1989-07-20

Publications (2)

Publication Number Publication Date
DE69019250D1 true DE69019250D1 (de) 1995-06-14
DE69019250T2 DE69019250T2 (de) 1995-09-07

Family

ID=16180759

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69019250T Expired - Fee Related DE69019250T2 (de) 1989-07-20 1990-07-19 Verfahren und Vorrichtung zur chemischen Dampfphasenabscheidung.

Country Status (4)

Country Link
US (1) US5091207A (de)
EP (1) EP0409603B1 (de)
JP (1) JP2888253B2 (de)
DE (1) DE69019250T2 (de)

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Also Published As

Publication number Publication date
EP0409603A1 (de) 1991-01-23
DE69019250T2 (de) 1995-09-07
JP2888253B2 (ja) 1999-05-10
EP0409603B1 (de) 1995-05-10
US5091207A (en) 1992-02-25
JPH03130367A (ja) 1991-06-04

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