DE69018790D1 - Halbleiterdiodenlaser und Verfahren zur Herstellung desselben. - Google Patents

Halbleiterdiodenlaser und Verfahren zur Herstellung desselben.

Info

Publication number
DE69018790D1
DE69018790D1 DE69018790T DE69018790T DE69018790D1 DE 69018790 D1 DE69018790 D1 DE 69018790D1 DE 69018790 T DE69018790 T DE 69018790T DE 69018790 T DE69018790 T DE 69018790T DE 69018790 D1 DE69018790 D1 DE 69018790D1
Authority
DE
Germany
Prior art keywords
manufacturing
same
diode laser
semiconductor diode
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69018790T
Other languages
English (en)
Other versions
DE69018790T2 (de
Inventor
Jan Opschoor
Hubertus Petrus Mech Ambrosius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Application granted granted Critical
Publication of DE69018790D1 publication Critical patent/DE69018790D1/de
Publication of DE69018790T2 publication Critical patent/DE69018790T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes
    • H01L33/0062—Processes for devices with an active region comprising only III-V compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • H01S5/164—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions comprising semiconductor material with a wider bandgap than the active layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
    • H01S5/2022—Absorbing region or layer parallel to the active layer, e.g. to influence transverse modes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Lasers (AREA)
DE69018790T 1989-12-12 1990-12-07 Halbleiterdiodenlaser und Verfahren zur Herstellung desselben. Expired - Fee Related DE69018790T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8903046A NL8903046A (nl) 1989-12-12 1989-12-12 Halfgeleiderdiodelaser en werkwijze ter vervaardiging daarvan.

Publications (2)

Publication Number Publication Date
DE69018790D1 true DE69018790D1 (de) 1995-05-24
DE69018790T2 DE69018790T2 (de) 1995-12-07

Family

ID=19855773

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69018790T Expired - Fee Related DE69018790T2 (de) 1989-12-12 1990-12-07 Halbleiterdiodenlaser und Verfahren zur Herstellung desselben.

Country Status (6)

Country Link
US (1) US5113405A (de)
EP (1) EP0432843B1 (de)
JP (1) JPH03253089A (de)
CN (1) CN1027117C (de)
DE (1) DE69018790T2 (de)
NL (1) NL8903046A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0766879A2 (de) * 1995-04-19 1997-04-09 Koninklijke Philips Electronics N.V. Verfahren zur herstellung einer elektrooptischen vorrichtung, insbesondere einer halbleiterlaserdiode
US7069569B2 (en) * 2000-02-01 2006-06-27 Research Investment Network, Inc. Near-field optical head system with integrated slider and laser
CN100403562C (zh) * 2005-03-15 2008-07-16 金芃 垂直结构的半导体芯片或器件
JP2009105184A (ja) * 2007-10-23 2009-05-14 Sharp Corp 窒化物系半導体レーザ素子とその製造方法
US10658813B2 (en) * 2017-06-09 2020-05-19 Nlight, Inc. Low divergence high brightness broad area lasers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS568890A (en) * 1979-06-27 1981-01-29 Nec Corp Semiconductor laser and manufacture thereof
US4581742A (en) * 1984-04-10 1986-04-08 Rca Corporation Semiconductor laser having a non-absorbing passive region with beam guiding
JPS63110784A (ja) * 1986-10-29 1988-05-16 Seiko Epson Corp 半導体レ−ザ
JPS63142692A (ja) * 1986-12-04 1988-06-15 Nec Corp 半導体レ−ザ装置
US4727051A (en) * 1986-12-15 1988-02-23 Stauffer Chemical Company Production of halide-and alkoxy-containing magnesium compositions
DE3642988A1 (de) * 1986-12-17 1988-06-30 Schering Ag Herstellung von dialkyl(alkyldimethylsilanolato)aluminium-verbindungen
JPS6477188A (en) * 1987-09-18 1989-03-23 Seiko Epson Corp Semiconductor laser

Also Published As

Publication number Publication date
EP0432843A1 (de) 1991-06-19
CN1027117C (zh) 1994-12-21
NL8903046A (nl) 1991-07-01
US5113405A (en) 1992-05-12
EP0432843B1 (de) 1995-04-19
DE69018790T2 (de) 1995-12-07
JPH03253089A (ja) 1991-11-12
CN1052576A (zh) 1991-06-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee