DE69013057D1 - Hochspannungsdünnschichttransistor. - Google Patents

Hochspannungsdünnschichttransistor.

Info

Publication number
DE69013057D1
DE69013057D1 DE69013057T DE69013057T DE69013057D1 DE 69013057 D1 DE69013057 D1 DE 69013057D1 DE 69013057 T DE69013057 T DE 69013057T DE 69013057 T DE69013057 T DE 69013057T DE 69013057 D1 DE69013057 D1 DE 69013057D1
Authority
DE
Germany
Prior art keywords
thin film
high voltage
film transistor
voltage thin
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69013057T
Other languages
English (en)
Other versions
DE69013057T2 (de
Inventor
Michael Hack
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Application granted granted Critical
Publication of DE69013057D1 publication Critical patent/DE69013057D1/de
Publication of DE69013057T2 publication Critical patent/DE69013057T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
    • H01L29/78621Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
    • H01L29/78624Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile the source and the drain regions being asymmetrical

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thin Film Transistor (AREA)
DE69013057T 1989-05-24 1990-05-18 Hochspannungsdünnschichttransistor. Expired - Lifetime DE69013057T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/356,900 US4998146A (en) 1989-05-24 1989-05-24 High voltage thin film transistor

Publications (2)

Publication Number Publication Date
DE69013057D1 true DE69013057D1 (de) 1994-11-10
DE69013057T2 DE69013057T2 (de) 1995-05-24

Family

ID=23403427

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69013057T Expired - Lifetime DE69013057T2 (de) 1989-05-24 1990-05-18 Hochspannungsdünnschichttransistor.

Country Status (4)

Country Link
US (1) US4998146A (de)
EP (1) EP0399737B1 (de)
JP (1) JP2763048B2 (de)
DE (1) DE69013057T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0442579A (ja) * 1990-06-08 1992-02-13 Seiko Epson Corp 薄膜トランジスタ及び製造方法
US5073723A (en) * 1990-08-10 1991-12-17 Xerox Corporation Space charge current limited shunt in a cascode circuit for hvtft devices
DE69209678T2 (de) * 1991-02-01 1996-10-10 Philips Electronics Nv Halbleiteranordnung für Hochspannungsverwendung und Verfahren zur Herstellung
US5166960A (en) * 1992-04-20 1992-11-24 Xerox Corporation Parallel multi-phased a-Si shift register for fast addressing of an a-Si array
US5237346A (en) * 1992-04-20 1993-08-17 Xerox Corporation Integrated thin film transistor electrographic writing head
US5337080A (en) * 1993-04-27 1994-08-09 Xerox Corporation Amorphous silicon electrographic writing head assembly with protective cover
US6100909A (en) * 1998-03-02 2000-08-08 Xerox Corporation Matrix addressable array for digital xerography
EP1524685B1 (de) 2003-10-17 2013-01-23 Imec Verfahren zur Herstellung einer Halbleitervorrichtung mit einer dielektrischen Schicht aus Silizium-Oxynitrid
US6912082B1 (en) * 2004-03-11 2005-06-28 Palo Alto Research Center Incorporated Integrated driver electronics for MEMS device using high voltage thin film transistors
US7755654B2 (en) * 2006-07-25 2010-07-13 Hewlett-Packard Development Company, L.P. Pixel

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2316118C3 (de) * 1973-03-30 1975-11-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Feldeffekttransistoren durch Anwendung einer selektiven Getterung
JPS53138281A (en) * 1977-05-09 1978-12-02 Nec Corp Insulated-gate field effect transistor
JPS56161676A (en) * 1980-05-16 1981-12-12 Japan Electronic Ind Dev Assoc<Jeida> Electrode structure for thin film transistor
JPS58197775A (ja) * 1982-05-13 1983-11-17 Canon Inc 薄膜トランジスタ
JPH0658966B2 (ja) * 1982-05-17 1994-08-03 キヤノン株式会社 半導体素子
DE3331601A1 (de) * 1982-09-02 1984-03-08 Canon K.K., Tokyo Halbleitervorrichtung
US4752814A (en) * 1984-03-12 1988-06-21 Xerox Corporation High voltage thin film transistor
DE3581549D1 (de) * 1984-03-12 1991-03-07 Xerox Corp Duennfilm-transistor fuer hohe spannungen.
EP0166261A3 (de) * 1984-06-27 1989-01-11 Energy Conversion Devices, Inc. Statisches Feld induzierte Halbleiteranordnungen
US4597001A (en) * 1984-10-05 1986-06-24 General Electric Company Thin film field-effect transistors with tolerance to electrode misalignment
US4704623A (en) * 1985-08-02 1987-11-03 General Electric Company Doping for low capacitance amorphous silicon field effect transistor
JPS62213165A (ja) * 1986-03-13 1987-09-19 Nec Corp 薄膜トランジスタ
JPH0714009B2 (ja) * 1987-10-15 1995-02-15 日本電気株式会社 Mos型半導体記憶回路装置

Also Published As

Publication number Publication date
US4998146A (en) 1991-03-05
DE69013057T2 (de) 1995-05-24
EP0399737B1 (de) 1994-10-05
JP2763048B2 (ja) 1998-06-11
JPH0319371A (ja) 1991-01-28
EP0399737A1 (de) 1990-11-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition