DE69009298D1 - Hochspannungs-Dünnschichttransistor mit zweitem Gate. - Google Patents

Hochspannungs-Dünnschichttransistor mit zweitem Gate.

Info

Publication number
DE69009298D1
DE69009298D1 DE69009298T DE69009298T DE69009298D1 DE 69009298 D1 DE69009298 D1 DE 69009298D1 DE 69009298 T DE69009298 T DE 69009298T DE 69009298 T DE69009298 T DE 69009298T DE 69009298 D1 DE69009298 D1 DE 69009298D1
Authority
DE
Germany
Prior art keywords
gate
thin film
high voltage
film transistor
voltage thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69009298T
Other languages
English (en)
Other versions
DE69009298T2 (de
Inventor
Pen Kein Yap
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Application granted granted Critical
Publication of DE69009298D1 publication Critical patent/DE69009298D1/de
Publication of DE69009298T2 publication Critical patent/DE69009298T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
    • H01L29/78648Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thin Film Transistor (AREA)
DE69009298T 1989-06-15 1990-06-14 Hochspannungs-Dünnschichttransistor mit zweitem Gate. Expired - Fee Related DE69009298T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/366,822 US4984040A (en) 1989-06-15 1989-06-15 High voltage thin film transistor with second gate

Publications (2)

Publication Number Publication Date
DE69009298D1 true DE69009298D1 (de) 1994-07-07
DE69009298T2 DE69009298T2 (de) 1995-03-02

Family

ID=23444693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69009298T Expired - Fee Related DE69009298T2 (de) 1989-06-15 1990-06-14 Hochspannungs-Dünnschichttransistor mit zweitem Gate.

Country Status (4)

Country Link
US (1) US4984040A (de)
EP (1) EP0403279B1 (de)
JP (1) JPH0648728B2 (de)
DE (1) DE69009298T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124769A (en) * 1990-03-02 1992-06-23 Nippon Telegraph And Telephone Corporation Thin film transistor
JP2616153B2 (ja) * 1990-06-20 1997-06-04 富士ゼロックス株式会社 El発光装置
JPH0480833A (ja) * 1990-07-24 1992-03-13 Yokogawa Hewlett Packard Ltd 高速エミュレーション・メモリ回路
JP3121676B2 (ja) * 1992-05-29 2001-01-09 株式会社東芝 薄膜トランジスタ及び薄膜トランジスタを用いたスタティックram
US5337080A (en) * 1993-04-27 1994-08-09 Xerox Corporation Amorphous silicon electrographic writing head assembly with protective cover
WO1996022616A1 (en) * 1995-01-19 1996-07-25 Litton Systems (Canada) Limited Flat panel imaging device
US6022770A (en) * 1998-03-24 2000-02-08 International Business Machines Corporation NVRAM utilizing high voltage TFT device and method for making the same
US6804502B2 (en) 2001-10-10 2004-10-12 Peregrine Semiconductor Corporation Switch circuit and method of switching radio frequency signals
JP2005524110A (ja) * 2002-04-24 2005-08-11 イー−インク コーポレイション 電子表示装置
JP4407311B2 (ja) * 2004-02-20 2010-02-03 セイコーエプソン株式会社 薄膜トランジスタの製造方法
EP1774620B1 (de) 2004-06-23 2014-10-01 Peregrine Semiconductor Corporation Integriertes hf-front-end
USRE48965E1 (en) 2005-07-11 2022-03-08 Psemi Corporation Method and apparatus improving gate oxide reliability by controlling accumulated charge
US7890891B2 (en) 2005-07-11 2011-02-15 Peregrine Semiconductor Corporation Method and apparatus improving gate oxide reliability by controlling accumulated charge
US9653601B2 (en) 2005-07-11 2017-05-16 Peregrine Semiconductor Corporation Method and apparatus for use in improving linearity of MOSFETs using an accumulated charge sink-harmonic wrinkle reduction
US8742502B2 (en) 2005-07-11 2014-06-03 Peregrine Semiconductor Corporation Method and apparatus for use in improving linearity of MOSFETs using an accumulated charge sink-harmonic wrinkle reduction
US7910993B2 (en) 2005-07-11 2011-03-22 Peregrine Semiconductor Corporation Method and apparatus for use in improving linearity of MOSFET's using an accumulated charge sink
US20080076371A1 (en) 2005-07-11 2008-03-27 Alexander Dribinsky Circuit and method for controlling charge injection in radio frequency switches
US7960772B2 (en) * 2007-04-26 2011-06-14 Peregrine Semiconductor Corporation Tuning capacitance to enhance FET stack voltage withstand
JP5417346B2 (ja) * 2008-02-28 2014-02-12 ペレグリン セミコンダクター コーポレーション 集積回路素子内でキャパシタをデジタル処理で同調するときに用いられる方法及び装置
US8723260B1 (en) 2009-03-12 2014-05-13 Rf Micro Devices, Inc. Semiconductor radio frequency switch with body contact
KR101863941B1 (ko) 2010-06-08 2018-06-04 삼성디스플레이 주식회사 오프셋 구조의 박막 트랜지스터
US9590674B2 (en) 2012-12-14 2017-03-07 Peregrine Semiconductor Corporation Semiconductor devices with switchable ground-body connection
US20150236748A1 (en) 2013-03-14 2015-08-20 Peregrine Semiconductor Corporation Devices and Methods for Duplexer Loss Reduction
EP2858114A1 (de) * 2013-10-01 2015-04-08 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Transistorvorrichtung und Verfahren zur Herstellung einer solchen Vorrichtung
US9406695B2 (en) 2013-11-20 2016-08-02 Peregrine Semiconductor Corporation Circuit and method for improving ESD tolerance and switching speed
US9831857B2 (en) 2015-03-11 2017-11-28 Peregrine Semiconductor Corporation Power splitter with programmable output phase shift
US9948281B2 (en) 2016-09-02 2018-04-17 Peregrine Semiconductor Corporation Positive logic digitally tunable capacitor
US10505530B2 (en) 2018-03-28 2019-12-10 Psemi Corporation Positive logic switch with selectable DC blocking circuit
US10886911B2 (en) 2018-03-28 2021-01-05 Psemi Corporation Stacked FET switch bias ladders
US10236872B1 (en) 2018-03-28 2019-03-19 Psemi Corporation AC coupling modules for bias ladders
US11476849B2 (en) 2020-01-06 2022-10-18 Psemi Corporation High power positive logic switch

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8204855A (nl) * 1982-12-16 1984-07-16 Philips Nv Veldeffekttransistor met geisoleerde stuurelektrode en werkwijze ter vervaardiging daarvan.
US4752814A (en) * 1984-03-12 1988-06-21 Xerox Corporation High voltage thin film transistor
US4598305A (en) * 1984-06-18 1986-07-01 Xerox Corporation Depletion mode thin film semiconductor photodetectors
JPS6197964A (ja) * 1984-10-19 1986-05-16 Toshiba Corp 半導体装置
US4748485A (en) * 1985-03-21 1988-05-31 Hughes Aircraft Company Opposed dual-gate hybrid structure for three-dimensional integrated circuits
US4882295A (en) * 1985-07-26 1989-11-21 Energy Conversion Devices, Inc. Method of making a double injection field effect transistor
JPS633464A (ja) * 1986-06-24 1988-01-08 Ricoh Co Ltd 薄膜トランジスタ
JPS6453460A (en) * 1987-08-24 1989-03-01 Sony Corp Mos transistor

Also Published As

Publication number Publication date
EP0403279B1 (de) 1994-06-01
DE69009298T2 (de) 1995-03-02
JPH0325980A (ja) 1991-02-04
US4984040A (en) 1991-01-08
EP0403279A1 (de) 1990-12-19
JPH0648728B2 (ja) 1994-06-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee