DE68927129T2 - Resistzusammensetzung, Phenolverbindung und Chinondiazidsulfonsäureester dieser Phenolverbindung - Google Patents

Resistzusammensetzung, Phenolverbindung und Chinondiazidsulfonsäureester dieser Phenolverbindung

Info

Publication number
DE68927129T2
DE68927129T2 DE68927129T DE68927129T DE68927129T2 DE 68927129 T2 DE68927129 T2 DE 68927129T2 DE 68927129 T DE68927129 T DE 68927129T DE 68927129 T DE68927129 T DE 68927129T DE 68927129 T2 DE68927129 T2 DE 68927129T2
Authority
DE
Germany
Prior art keywords
phenol compound
acid ester
sulfonic acid
resist composition
quinonediazide sulfonic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68927129T
Other languages
English (en)
Other versions
DE68927129D1 (de
Inventor
Yasunori Uetani
Makoto Hanabata
Hirotoshi Nakanishi
Koji Kuwana
Yukio Hanamoto
Fumio Oi
Jun Tomioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27526481&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE68927129(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE68927129D1 publication Critical patent/DE68927129D1/de
Application granted granted Critical
Publication of DE68927129T2 publication Critical patent/DE68927129T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
DE68927129T 1988-05-07 1989-05-05 Resistzusammensetzung, Phenolverbindung und Chinondiazidsulfonsäureester dieser Phenolverbindung Expired - Fee Related DE68927129T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP11117988 1988-05-07
JP19557288 1988-08-04
JP25893688 1988-10-13
JP33050488 1988-12-26
JP33050388 1988-12-26

Publications (2)

Publication Number Publication Date
DE68927129D1 DE68927129D1 (de) 1996-10-17
DE68927129T2 true DE68927129T2 (de) 1997-04-30

Family

ID=27526481

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927129T Expired - Fee Related DE68927129T2 (de) 1988-05-07 1989-05-05 Resistzusammensetzung, Phenolverbindung und Chinondiazidsulfonsäureester dieser Phenolverbindung

Country Status (4)

Country Link
EP (1) EP0341608B1 (de)
JP (1) JP2706978B2 (de)
KR (1) KR0147069B1 (de)
DE (1) DE68927129T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JP3064595B2 (ja) 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
WO1993018438A1 (en) * 1992-03-06 1993-09-16 Hoechst Celanese Corporation Positive photoresist composition
DE69519455T2 (de) 1994-08-05 2001-06-28 Sumitomo Chemical Co Chinondiazidsulfonsäureester und diese enthaltende,positiv arbeitende Photoresistzusammensetzungen
TW332264B (en) 1994-09-07 1998-05-21 Mitsubishi Chem Corp Photosensitive resin composition and method for forming a photoresist pattern

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
JPS595243A (ja) * 1982-07-02 1984-01-12 Hitachi Ltd 放射線感応性組成物及びパタ−ン形成方法
JPS60121445A (ja) * 1983-12-06 1985-06-28 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型感光性樹脂組成物
JPS62269946A (ja) * 1986-05-19 1987-11-24 Oki Electric Ind Co Ltd レジストパタ−ン形成方法
JPS6446747A (en) * 1987-08-14 1989-02-21 Fuji Photo Film Co Ltd Photoresist composition

Also Published As

Publication number Publication date
EP0341608A2 (de) 1989-11-15
EP0341608A3 (de) 1991-03-27
KR0147069B1 (ko) 1998-08-01
KR890017574A (ko) 1989-12-16
EP0341608B1 (de) 1996-09-11
DE68927129D1 (de) 1996-10-17
JPH02269351A (ja) 1990-11-02
JP2706978B2 (ja) 1998-01-28

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8339 Ceased/non-payment of the annual fee