KR900008700A - 포지티브 포토레지스트(Positive Photoresist)의 조성물 - Google Patents

포지티브 포토레지스트(Positive Photoresist)의 조성물

Info

Publication number
KR900008700A
KR900008700A KR1019880015498A KR880015498A KR900008700A KR 900008700 A KR900008700 A KR 900008700A KR 1019880015498 A KR1019880015498 A KR 1019880015498A KR 880015498 A KR880015498 A KR 880015498A KR 900008700 A KR900008700 A KR 900008700A
Authority
KR
South Korea
Prior art keywords
composition
positive photoresist
photoresist
positive
Prior art date
Application number
KR1019880015498A
Other languages
English (en)
Other versions
KR910008708B1 (ko
Inventor
김광태
김정락
김대진
최영준
Original Assignee
제일합섬 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제일합섬 주식회사 filed Critical 제일합섬 주식회사
Priority to KR1019880015498A priority Critical patent/KR910008708B1/ko
Publication of KR900008700A publication Critical patent/KR900008700A/ko
Application granted granted Critical
Publication of KR910008708B1 publication Critical patent/KR910008708B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019880015498A 1988-11-24 1988-11-24 포지티브 포토레지스트(Positive Photoresist)의 조성물 KR910008708B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019880015498A KR910008708B1 (ko) 1988-11-24 1988-11-24 포지티브 포토레지스트(Positive Photoresist)의 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019880015498A KR910008708B1 (ko) 1988-11-24 1988-11-24 포지티브 포토레지스트(Positive Photoresist)의 조성물

Publications (2)

Publication Number Publication Date
KR900008700A true KR900008700A (ko) 1990-06-03
KR910008708B1 KR910008708B1 (ko) 1991-10-19

Family

ID=19279535

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880015498A KR910008708B1 (ko) 1988-11-24 1988-11-24 포지티브 포토레지스트(Positive Photoresist)의 조성물

Country Status (1)

Country Link
KR (1) KR910008708B1 (ko)

Also Published As

Publication number Publication date
KR910008708B1 (ko) 1991-10-19

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