DE68917164D1 - Anlage zur mikrowellenchemischen Dampfphasenabscheidung. - Google Patents
Anlage zur mikrowellenchemischen Dampfphasenabscheidung.Info
- Publication number
- DE68917164D1 DE68917164D1 DE68917164T DE68917164T DE68917164D1 DE 68917164 D1 DE68917164 D1 DE 68917164D1 DE 68917164 T DE68917164 T DE 68917164T DE 68917164 T DE68917164 T DE 68917164T DE 68917164 D1 DE68917164 D1 DE 68917164D1
- Authority
- DE
- Germany
- Prior art keywords
- plant
- vapor deposition
- chemical vapor
- microwave chemical
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63021797A JPH01198478A (ja) | 1988-02-01 | 1988-02-01 | マイクロ波プラズマcvd装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68917164D1 true DE68917164D1 (de) | 1994-09-08 |
DE68917164T2 DE68917164T2 (de) | 1994-12-01 |
Family
ID=12065041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68917164T Expired - Fee Related DE68917164T2 (de) | 1988-02-01 | 1989-01-30 | Anlage zur mikrowellenchemischen Dampfphasenabscheidung. |
Country Status (5)
Country | Link |
---|---|
US (2) | US5069928A (de) |
EP (1) | EP0326998B1 (de) |
JP (1) | JPH01198478A (de) |
CN (1) | CN1029994C (de) |
DE (1) | DE68917164T2 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01198478A (ja) * | 1988-02-01 | 1989-08-10 | Canon Inc | マイクロ波プラズマcvd装置 |
JPH02141578A (ja) * | 1988-11-24 | 1990-05-30 | Canon Inc | 堆積膜形成装置 |
JPH03264676A (ja) * | 1990-03-13 | 1991-11-25 | Canon Inc | 連続堆積膜形成装置 |
JP2966029B2 (ja) * | 1990-03-30 | 1999-10-25 | 新日本無線株式会社 | マイクロ波プラズマcvd装置 |
US5837978A (en) * | 1990-07-11 | 1998-11-17 | International Business Machines Corporation | Radiation control system |
JP2581842B2 (ja) * | 1990-11-19 | 1997-02-12 | 動力炉・核燃料開発事業団 | マイクロ波加熱装置 |
JPH0633246A (ja) * | 1992-07-21 | 1994-02-08 | Canon Inc | 堆積膜形成方法および堆積膜形成装置 |
US5471037A (en) * | 1992-08-18 | 1995-11-28 | E. I. Du Pont De Nemours And Company | Process for preparing polymeric material with microwave |
US5532462A (en) * | 1994-04-29 | 1996-07-02 | Communications & Power Industries | Method of and apparatus for heating a reaction vessel with microwave energy |
EP0702393A3 (de) * | 1994-09-16 | 1997-03-26 | Daihen Corp | Plasmabearbeitungsgerät zur Mikrowellen-Einstrahlung aus einem rechteckigen Wellenleiter durch einem langgestrekten Schlitz in der Plasmakammer |
US6161498A (en) * | 1995-09-14 | 2000-12-19 | Tokyo Electron Limited | Plasma processing device and a method of plasma process |
US6076481A (en) * | 1996-04-03 | 2000-06-20 | Canon Kabushiki Kaisha | Plasma processing apparatus and plasma processing method |
US6162488A (en) * | 1996-05-14 | 2000-12-19 | Boston University | Method for closed loop control of chemical vapor deposition process |
US6715441B2 (en) * | 1997-12-31 | 2004-04-06 | Plasma Optical Fibre B.V. | PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
US6057645A (en) * | 1997-12-31 | 2000-05-02 | Eaton Corporation | Plasma discharge device with dynamic tuning by a movable microwave trap |
DE10010766B4 (de) * | 2000-03-04 | 2006-11-30 | Schott Ag | Verfahren und Vorrichtung zur Beschichtung von insbesondere gekrümmten Substraten |
CN1318643C (zh) * | 2003-04-30 | 2007-05-30 | 佳能株式会社 | 淀积膜形成方法以及装置 |
US20090021328A1 (en) * | 2005-02-09 | 2009-01-22 | Adrian Haldimann | Microwave unit |
US20060231207A1 (en) * | 2005-03-31 | 2006-10-19 | Rebinsky Douglas A | System and method for surface treatment |
JP2007220499A (ja) * | 2006-02-17 | 2007-08-30 | Noritsu Koki Co Ltd | プラズマ発生装置およびそれを用いるワーク処理装置 |
EP2259662B1 (de) * | 2008-03-26 | 2019-06-26 | Kyosan Electric Mfg. Co., Ltd. | Vorrichtung zur unterdrückung abnormer entladungen für eine unterdruckvorrichtung |
JP5285418B2 (ja) * | 2008-12-24 | 2013-09-11 | 株式会社豊田自動織機 | 共鳴型非接触電力供給装置 |
WO2011027963A2 (ko) * | 2009-09-01 | 2011-03-10 | 엘지전자 주식회사 | 마이크로웨이브를 이용한 조리기기 |
GB201021865D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
ES2696227B2 (es) * | 2018-07-10 | 2019-06-12 | Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat | Fuente de iones interna para ciclotrones de baja erosion |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5939178B2 (ja) * | 1977-04-25 | 1984-09-21 | 株式会社東芝 | 活性化ガス発生装置 |
JPS55131175A (en) * | 1979-03-30 | 1980-10-11 | Toshiba Corp | Surface treatment apparatus with microwave plasma |
JPS57133636A (en) * | 1981-02-13 | 1982-08-18 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma at low temperature |
CA1159012A (en) * | 1980-05-02 | 1983-12-20 | Seitaro Matsuo | Plasma deposition apparatus |
JPS5849295A (ja) * | 1981-09-17 | 1983-03-23 | Konishiroku Photo Ind Co Ltd | 光学的情報記録媒体 |
JPS5943991A (ja) * | 1982-09-02 | 1984-03-12 | Sanyo Electric Co Ltd | 圧縮機の消音装置 |
US4691662A (en) * | 1983-02-28 | 1987-09-08 | Michigan State University | Dual plasma microwave apparatus and method for treating a surface |
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
US4585668A (en) * | 1983-02-28 | 1986-04-29 | Michigan State University | Method for treating a surface with a microwave or UHF plasma and improved apparatus |
US4478173A (en) * | 1983-04-18 | 1984-10-23 | Energy Conversion Devices, Inc. | Method and apparatus for sensing and controlling the intensity of energy in a deposition system |
JPS59103331A (ja) * | 1983-09-21 | 1984-06-14 | Hitachi Ltd | プラズマ処理装置 |
US4727293A (en) * | 1984-08-16 | 1988-02-23 | Board Of Trustees Operating Michigan State University | Plasma generating apparatus using magnets and method |
JPH0755737B2 (ja) * | 1985-08-08 | 1995-06-14 | 富士ゼロックス株式会社 | 複写機の給紙装置 |
US4617531A (en) * | 1985-09-13 | 1986-10-14 | General Electric Company | Directly modulated microwave oscillator having adjustable load coupling |
IN165491B (de) * | 1986-01-06 | 1989-11-04 | Rank Taylor Hobson Ltd | |
JPH0740566B2 (ja) * | 1986-02-04 | 1995-05-01 | 株式会社日立製作所 | プラズマ処理方法及びその装置 |
US4673894A (en) * | 1986-04-10 | 1987-06-16 | California Microwave, Incorporated | Oscillator coupled through cylindrical cavity for generating low noise microwaves |
JPS63100186A (ja) * | 1986-10-15 | 1988-05-02 | Canon Inc | マイクロ波プラズマ処理装置 |
US4866346A (en) * | 1987-06-22 | 1989-09-12 | Applied Science & Technology, Inc. | Microwave plasma generator |
JPH01198478A (ja) * | 1988-02-01 | 1989-08-10 | Canon Inc | マイクロ波プラズマcvd装置 |
-
1988
- 1988-02-01 JP JP63021797A patent/JPH01198478A/ja active Pending
-
1989
- 1989-01-27 US US07/302,244 patent/US5069928A/en not_active Expired - Lifetime
- 1989-01-30 DE DE68917164T patent/DE68917164T2/de not_active Expired - Fee Related
- 1989-01-30 EP EP89101579A patent/EP0326998B1/de not_active Expired - Lifetime
- 1989-02-01 CN CN89100619.2A patent/CN1029994C/zh not_active Expired - Fee Related
-
1995
- 1995-03-31 US US08/415,169 patent/US6253703B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0326998B1 (de) | 1994-08-03 |
EP0326998A3 (en) | 1989-11-15 |
US5069928A (en) | 1991-12-03 |
CN1029994C (zh) | 1995-10-11 |
JPH01198478A (ja) | 1989-08-10 |
EP0326998A2 (de) | 1989-08-09 |
CN1036233A (zh) | 1989-10-11 |
US6253703B1 (en) | 2001-07-03 |
DE68917164T2 (de) | 1994-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE68917164D1 (de) | Anlage zur mikrowellenchemischen Dampfphasenabscheidung. | |
DE68908194D1 (de) | Anlage zur plasma-chemischen dampfphasenreaktion. | |
DE68921286D1 (de) | Anlage zur plasmachemischen Gasphasenabscheidung. | |
IL96401A0 (en) | Selective area chemical vapor deposition | |
GB2175011B (en) | Chemical vapor deposition | |
DE69205494D1 (de) | Beschichtungssystem zur plasmachemischen Gasphasenabscheidung. | |
DE3885706D1 (de) | Magnetron-Bedampfungssystem zum Ätzen oder Niederschlagen. | |
EP0252667A3 (en) | Chemical vapour deposition methods | |
DE69504762D1 (de) | Vorrichtung zur chemischen Gasphasenabscheidung | |
MX22743A (es) | Compuestos quimicos. | |
EP0311401A3 (en) | Process for chemical vapor deposition | |
GB8719166D0 (en) | Chemical vapour deposition method | |
DE3564290D1 (en) | Chemical vapour deposition process | |
EP0251764A3 (en) | Chemical vapour deposition methods | |
DE69017354D1 (de) | Dampfablagerungsapparat. | |
FI920212A (fi) | Kemisk process. | |
DE69017810D1 (de) | Vorrichtung zur chemischen Dampfphasenabscheidung. | |
GB2169003B (en) | Chemical vapour deposition | |
ZA883485B (en) | Distributor beam for chemical vapor deposition on glass | |
GB8623978D0 (en) | Chemical vapour deposition | |
DE69331173D1 (de) | Anlage zur plasmaaktivierten Gasphasenabscheidung | |
GB8827836D0 (en) | Laser chemical vapour deposition | |
DE68919346D1 (de) | Verfahren zur Gasphasenabscheidung von Polysilanen. | |
GB2210387B (en) | Chemical vapour deposition | |
KR960015377B1 (en) | Chemical vapor deposition reactor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |