DE68916558T2 - Filmherstellung, zum Beispiel von amorphem Silizium. - Google Patents

Filmherstellung, zum Beispiel von amorphem Silizium.

Info

Publication number
DE68916558T2
DE68916558T2 DE68916558T DE68916558T DE68916558T2 DE 68916558 T2 DE68916558 T2 DE 68916558T2 DE 68916558 T DE68916558 T DE 68916558T DE 68916558 T DE68916558 T DE 68916558T DE 68916558 T2 DE68916558 T2 DE 68916558T2
Authority
DE
Germany
Prior art keywords
amorphous silicon
film production
film
production
amorphous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68916558T
Other languages
English (en)
Other versions
DE68916558D1 (de
Inventor
Takashi Igarashi
Nobuhiro Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63019675A external-priority patent/JPH01196118A/ja
Priority claimed from JP63051728A external-priority patent/JPH01226147A/ja
Priority claimed from JP63051729A external-priority patent/JPH01226148A/ja
Priority claimed from JP63052496A external-priority patent/JP2637143B2/ja
Priority claimed from JP63052495A external-priority patent/JPH01227427A/ja
Priority claimed from JP63052494A external-priority patent/JP2602881B2/ja
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Application granted granted Critical
Publication of DE68916558D1 publication Critical patent/DE68916558D1/de
Publication of DE68916558T2 publication Critical patent/DE68916558T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
DE68916558T 1988-02-01 1989-01-26 Filmherstellung, zum Beispiel von amorphem Silizium. Expired - Fee Related DE68916558T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP63019675A JPH01196118A (ja) 1988-02-01 1988-02-01 膜形成装置
JP63051728A JPH01226147A (ja) 1988-03-07 1988-03-07 成膜装置および成膜方法
JP63051729A JPH01226148A (ja) 1988-03-07 1988-03-07 膜形成装置
JP63052496A JP2637143B2 (ja) 1988-03-08 1988-03-08 成膜装置
JP63052495A JPH01227427A (ja) 1988-03-08 1988-03-08 成膜装置
JP63052494A JP2602881B2 (ja) 1988-03-08 1988-03-08 成膜装置

Publications (2)

Publication Number Publication Date
DE68916558D1 DE68916558D1 (de) 1994-08-11
DE68916558T2 true DE68916558T2 (de) 1995-02-02

Family

ID=27548876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68916558T Expired - Fee Related DE68916558T2 (de) 1988-02-01 1989-01-26 Filmherstellung, zum Beispiel von amorphem Silizium.

Country Status (6)

Country Link
US (1) US5031571A (de)
EP (1) EP0327253B1 (de)
KR (1) KR910009339B1 (de)
CN (1) CN1037551A (de)
AU (1) AU616234B2 (de)
DE (1) DE68916558T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275665A (en) * 1988-06-06 1994-01-04 Research Development Corporation Of Japan Method and apparatus for causing plasma reaction under atmospheric pressure
EP0346055B1 (de) * 1988-06-06 1995-04-19 Research Development Corporation Of Japan Verfahren zur Durchführung einer Plasmareaktion bei Atmosphärendruck
DE4025396A1 (de) * 1990-08-10 1992-02-13 Leybold Ag Einrichtung fuer die herstellung eines plasmas
US5316739A (en) * 1991-08-20 1994-05-31 Bridgestone Corporation Method and apparatus for surface treatment
US5292394A (en) * 1991-11-13 1994-03-08 Leybold Aktiengesellschaft Apparatus for large-area ionic etching
DE4233895C2 (de) * 1992-10-08 1996-11-28 Juergen Prof Dr Engemann Vorrichtung zur Behandlung von durch einen Wickelmechanismus bewegten bahnförmigen Materialien mittels eines reaktiven bzw. nichtreaktiven, durch Hochfrequenz- oder Pulsentladung erzeugten Niederdruckplasmas
US5584938A (en) * 1993-12-10 1996-12-17 Texas Instruments Incorporated Electrostatic particle removal and characterization
US5558843A (en) * 1994-09-01 1996-09-24 Eastman Kodak Company Near atmospheric pressure treatment of polymers using helium discharges
JP3295310B2 (ja) * 1995-08-08 2002-06-24 三洋電機株式会社 回転電極を用いた高速成膜方法及びその装置
JP3437386B2 (ja) * 1996-09-05 2003-08-18 キヤノン株式会社 光起電力素子、並びにその製造方法
WO2001040540A1 (en) * 1999-12-02 2001-06-07 Tegal Corporation Improved reactor with heated and textured electrodes and surfaces
JP3486590B2 (ja) 1999-12-03 2004-01-13 キヤノン株式会社 堆積膜形成装置
KR100767762B1 (ko) * 2000-01-18 2007-10-17 에이에스엠 저펜 가부시기가이샤 자가 세정을 위한 원격 플라즈마 소스를 구비한 cvd 반도체 공정장치
US6559052B2 (en) * 2000-07-07 2003-05-06 Applied Materials, Inc. Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures
KR20050013734A (ko) * 2003-07-29 2005-02-05 삼성전자주식회사 플라즈마 식각장치
JP4306403B2 (ja) * 2003-10-23 2009-08-05 東京エレクトロン株式会社 シャワーヘッド構造及びこれを用いた成膜装置
JP4707959B2 (ja) * 2004-02-20 2011-06-22 日本エー・エス・エム株式会社 シャワープレート、プラズマ処理装置及びプラズマ処理方法
DE102007019718B3 (de) * 2007-04-26 2008-11-13 Vtd Vakuumtechnik Dresden Gmbh Großflächige Plasmaquelle für die Plasmapolymerisation und Verfahren zum Betreiben der Plasmaquelle
CN101307437B (zh) * 2008-06-19 2010-12-01 东莞宏威数码机械有限公司 射频电极及薄膜制备装置
TWI556309B (zh) 2009-06-19 2016-11-01 半導體能源研究所股份有限公司 電漿處理裝置，形成膜的方法，和薄膜電晶體的製造方法
US20120196242A1 (en) * 2011-01-27 2012-08-02 Applied Materials, Inc. Substrate support with heater and rapid temperature change
US20120298302A1 (en) * 2011-05-23 2012-11-29 Yaomin Xia Vacuum plasma pprocessing chamber with a wafer chuck facing downward above the plasma
KR101685405B1 (ko) * 2014-12-31 2016-12-14 주식회사 밸류엔지니어링 이온주입기용 리펠러

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209357A (en) * 1979-05-18 1980-06-24 Tegal Corporation Plasma reactor apparatus
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
JPS58157975A (ja) * 1982-03-10 1983-09-20 Tokyo Ohka Kogyo Co Ltd プラズマエツチング方法
JPS59166238A (ja) * 1983-03-10 1984-09-19 Toshiba Corp 薄膜形成装置
JPS59217330A (ja) * 1983-05-26 1984-12-07 Toshiba Corp 反応性イオンエツチング装置
JPS60128612A (ja) * 1983-12-15 1985-07-09 Ricoh Co Ltd プラズマｃｖｄ装置
JPS60189928A (ja) * 1984-03-12 1985-09-27 Fujitsu Ltd 減圧気相成長装置
JPS6164128A (ja) * 1984-09-05 1986-04-02 Toshiba Corp 試料処理装置
US4590042A (en) * 1984-12-24 1986-05-20 Tegal Corporation Plasma reactor having slotted manifold
JPS61194180A (ja) * 1985-01-18 1986-08-28 Nachi Fujikoshi Corp 中空放電蒸着装置
JPH07101751B2 (ja) * 1985-03-28 1995-11-01 キヤノン株式会社 光起電力素子の製造方法
JPH06101458B2 (ja) * 1985-05-09 1994-12-12 松下電器産業株式会社 プラズマ気相成長装置
US4659401A (en) * 1985-06-10 1987-04-21 Massachusetts Institute Of Technology Growth of epitaxial films by plasma enchanced chemical vapor deposition (PE-CVD)
JPS6213573A (ja) * 1985-07-10 1987-01-22 Fujitsu Ltd Ｃｖｄ装置
US4612077A (en) * 1985-07-29 1986-09-16 The Perkin-Elmer Corporation Electrode for plasma etching system
JPS6260875A (ja) * 1985-09-10 1987-03-17 Matsushita Electric Ind Co Ltd プラズマｃｖｄ装置
JPS62142314A (ja) * 1985-12-17 1987-06-25 Matsushita Electric Ind Co Ltd プラズマｃｖｄ装置
JPS62199019A (ja) * 1986-02-27 1987-09-02 Oki Electric Ind Co Ltd ウエハ処理装置
DE3606959A1 (de) * 1986-03-04 1987-09-10 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung
US4780169A (en) * 1987-05-11 1988-10-25 Tegal Corporation Non-uniform gas inlet for dry etching apparatus
EP0346055B1 (de) * 1988-06-06 1995-04-19 Research Development Corporation Of Japan Verfahren zur Durchführung einer Plasmareaktion bei Atmosphärendruck

Also Published As

Publication number Publication date
EP0327253A2 (de) 1989-08-09
EP0327253A3 (en) 1990-07-25
KR910009339B1 (ko) 1991-11-11
CN1037551A (zh) 1989-11-29
EP0327253B1 (de) 1994-07-06
KR890013818A (ko) 1989-09-26
AU616234B2 (en) 1991-10-24
DE68916558D1 (de) 1994-08-11
US5031571A (en) 1991-07-16
AU2891189A (en) 1989-08-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUI CHEMICALS, INC., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee