DE68906689T2 - Strahlungsempfindliches Photoresistgemisch für kurzwellige Ultraviolett-Bestrahlung. - Google Patents

Strahlungsempfindliches Photoresistgemisch für kurzwellige Ultraviolett-Bestrahlung.

Info

Publication number
DE68906689T2
DE68906689T2 DE89104056T DE68906689T DE68906689T2 DE 68906689 T2 DE68906689 T2 DE 68906689T2 DE 89104056 T DE89104056 T DE 89104056T DE 68906689 T DE68906689 T DE 68906689T DE 68906689 T2 DE68906689 T2 DE 68906689T2
Authority
DE
Germany
Prior art keywords
radiation
short
wave ultraviolet
sensitive photoresist
photoresist mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE89104056T
Other languages
English (en)
Other versions
DE68906689D1 (de
Inventor
Douglas A Usifer
Michael G Kelly
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22605802&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE68906689(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Application granted granted Critical
Publication of DE68906689D1 publication Critical patent/DE68906689D1/de
Publication of DE68906689T2 publication Critical patent/DE68906689T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/492—Photosoluble emulsions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
DE89104056T 1988-03-11 1989-03-08 Strahlungsempfindliches Photoresistgemisch für kurzwellige Ultraviolett-Bestrahlung. Revoked DE68906689T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/167,068 US5104770A (en) 1988-03-11 1988-03-11 Positive-working photoresist compositions

Publications (2)

Publication Number Publication Date
DE68906689D1 DE68906689D1 (de) 1993-07-01
DE68906689T2 true DE68906689T2 (de) 1993-10-14

Family

ID=22605802

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89104056T Revoked DE68906689T2 (de) 1988-03-11 1989-03-08 Strahlungsempfindliches Photoresistgemisch für kurzwellige Ultraviolett-Bestrahlung.

Country Status (5)

Country Link
US (1) US5104770A (de)
EP (1) EP0332158B1 (de)
JP (1) JPH027048A (de)
KR (1) KR890015068A (de)
DE (1) DE68906689T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69425862T2 (de) * 1993-11-17 2001-05-03 At & T Corp Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung
US6878213B1 (en) * 1998-12-07 2005-04-12 Scp Global Technologies, Inc. Process and system for rinsing of semiconductor substrates
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
KR100417091B1 (ko) * 2001-05-15 2004-02-05 주식회사 엘지화학 기능성 옥심 에스테르계 화합물 및 이를 포함하는 감광성조성물
US7276324B2 (en) * 2003-11-14 2007-10-02 Shin-Etsu Chemical Co., Ltd. Nitrogen-containing organic compound, resist composition and patterning process
WO2013081478A1 (en) 2011-11-30 2013-06-06 Zinniatek Limited Photovoltaic systems
US9518391B2 (en) 2011-11-30 2016-12-13 Zinniatek Limited Roofing, cladding or siding product, its manufacture and its use as part of a solar energy recovery system
EP3000135B1 (de) 2013-05-23 2020-04-08 Zinniatek Limited Fotovoltaiksysteme
US10502435B2 (en) * 2013-09-06 2019-12-10 Zinniatek Limited Solar thermal roofing system
CN111981706A (zh) 2014-03-07 2020-11-24 兹尼亚泰克有限公司 太阳热能屋顶系统
JP6248861B2 (ja) * 2014-08-19 2017-12-20 信越化学工業株式会社 化学増幅レジスト材料及びパターン形成方法
WO2016088026A1 (en) 2014-12-01 2016-06-09 Zinniatek Limited A roofing, cladding or siding product
WO2018073698A1 (en) 2016-10-17 2018-04-26 Zinniatek Limited A roofing, cladding or siding module or apparatus
US11702840B2 (en) 2018-12-19 2023-07-18 Zinniatek Limited Roofing, cladding or siding module, its manufacture and use

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180845A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Light-Sensitive Polymers and their use in the preparation of Photographic Printing Plates
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
GB8413395D0 (en) * 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
DE3540480A1 (de) * 1985-11-15 1987-05-21 Hoechst Ag Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images

Also Published As

Publication number Publication date
JPH027048A (ja) 1990-01-11
EP0332158A2 (de) 1989-09-13
KR890015068A (ko) 1989-10-28
EP0332158B1 (de) 1993-05-26
EP0332158A3 (en) 1989-10-25
DE68906689D1 (de) 1993-07-01
US5104770A (en) 1992-04-14

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8339 Ceased/non-payment of the annual fee
8331 Complete revocation
8380 Miscellaneous part iii

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