DE6812746U - Vorrichtung zur kathodenzerstaeubung - Google Patents
Vorrichtung zur kathodenzerstaeubungInfo
- Publication number
- DE6812746U DE6812746U DE6812746U DE6812746U DE6812746U DE 6812746 U DE6812746 U DE 6812746U DE 6812746 U DE6812746 U DE 6812746U DE 6812746 U DE6812746 U DE 6812746U DE 6812746 U DE6812746 U DE 6812746U
- Authority
- DE
- Germany
- Prior art keywords
- ring
- base
- catchers
- flaps
- vacuum vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000428 dust Substances 0.000 title 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 8
- 238000005192 partition Methods 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 238000005086 pumping Methods 0.000 claims description 3
- 230000033228 biological regulation Effects 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims 3
- 210000000056 organ Anatomy 0.000 claims 1
- 238000000034 method Methods 0.000 description 14
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR133491 | 1967-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE6812746U true DE6812746U (de) | 1971-02-18 |
Family
ID=8643630
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE6812746U Expired DE6812746U (de) | 1967-12-22 | 1968-12-21 | Vorrichtung zur kathodenzerstaeubung |
| DE19681816431 Pending DE1816431A1 (de) | 1967-12-22 | 1968-12-21 | Vorrichtung zur Kathodenzerstaeubung |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19681816431 Pending DE1816431A1 (de) | 1967-12-22 | 1968-12-21 | Vorrichtung zur Kathodenzerstaeubung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3661760A (https=) |
| BE (1) | BE724898A (https=) |
| DE (2) | DE6812746U (https=) |
| FR (1) | FR1594542A (https=) |
| GB (1) | GB1251826A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3943047A (en) * | 1974-05-10 | 1976-03-09 | Bell Telephone Laboratories, Incorporated | Selective removal of material by sputter etching |
| GB2114809B (en) * | 1982-02-04 | 1986-02-05 | Standard Telephones Cables Ltd | Metallic silicide production |
| GB2208390B (en) * | 1987-08-06 | 1991-03-27 | Plessey Co Plc | Thin film deposition process |
| DE3925536A1 (de) * | 1989-08-02 | 1991-02-07 | Leybold Ag | Anordnung zur dickenmessung von duennschichten |
-
1967
- 1967-12-22 FR FR133491A patent/FR1594542A/fr not_active Expired
-
1968
- 1968-11-29 GB GB1251826D patent/GB1251826A/en not_active Expired
- 1968-12-04 BE BE724898D patent/BE724898A/xx unknown
- 1968-12-06 US US781772A patent/US3661760A/en not_active Expired - Lifetime
- 1968-12-21 DE DE6812746U patent/DE6812746U/de not_active Expired
- 1968-12-21 DE DE19681816431 patent/DE1816431A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR1594542A (https=) | 1970-06-08 |
| GB1251826A (https=) | 1971-11-03 |
| DE1816431A1 (de) | 1971-01-21 |
| US3661760A (en) | 1972-05-09 |
| BE724898A (https=) | 1969-05-16 |
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