BE724898A - - Google Patents

Info

Publication number
BE724898A
BE724898A BE724898DA BE724898A BE 724898 A BE724898 A BE 724898A BE 724898D A BE724898D A BE 724898DA BE 724898 A BE724898 A BE 724898A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE724898A publication Critical patent/BE724898A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
BE724898D 1967-12-22 1968-12-04 BE724898A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR133491 1967-12-22

Publications (1)

Publication Number Publication Date
BE724898A true BE724898A (https=) 1969-05-16

Family

ID=8643630

Family Applications (1)

Application Number Title Priority Date Filing Date
BE724898D BE724898A (https=) 1967-12-22 1968-12-04

Country Status (5)

Country Link
US (1) US3661760A (https=)
BE (1) BE724898A (https=)
DE (2) DE6812746U (https=)
FR (1) FR1594542A (https=)
GB (1) GB1251826A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943047A (en) * 1974-05-10 1976-03-09 Bell Telephone Laboratories, Incorporated Selective removal of material by sputter etching
GB2114809B (en) * 1982-02-04 1986-02-05 Standard Telephones Cables Ltd Metallic silicide production
GB2208390B (en) * 1987-08-06 1991-03-27 Plessey Co Plc Thin film deposition process
DE3925536A1 (de) * 1989-08-02 1991-02-07 Leybold Ag Anordnung zur dickenmessung von duennschichten

Also Published As

Publication number Publication date
FR1594542A (https=) 1970-06-08
GB1251826A (https=) 1971-11-03
DE1816431A1 (de) 1971-01-21
US3661760A (en) 1972-05-09
DE6812746U (de) 1971-02-18

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