DE60333151D1 - Lithographische Projektionsapparat mit einer Teilchenbarriere - Google Patents

Lithographische Projektionsapparat mit einer Teilchenbarriere

Info

Publication number
DE60333151D1
DE60333151D1 DE60333151T DE60333151T DE60333151D1 DE 60333151 D1 DE60333151 D1 DE 60333151D1 DE 60333151 T DE60333151 T DE 60333151T DE 60333151 T DE60333151 T DE 60333151T DE 60333151 D1 DE60333151 D1 DE 60333151D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
particle barrier
barrier
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60333151T
Other languages
English (en)
Inventor
Levinus Pieter Bakker
Frank Jeroen Pieter Schuurmans
Vadim Yevgenyevich Banine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60333151D1 publication Critical patent/DE60333151D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
DE60333151T 2002-08-23 2003-08-22 Lithographische Projektionsapparat mit einer Teilchenbarriere Expired - Lifetime DE60333151D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02078515 2002-08-23

Publications (1)

Publication Number Publication Date
DE60333151D1 true DE60333151D1 (de) 2010-08-12

Family

ID=32405731

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60333151T Expired - Lifetime DE60333151D1 (de) 2002-08-23 2003-08-22 Lithographische Projektionsapparat mit einer Teilchenbarriere

Country Status (8)

Country Link
US (2) US6838684B2 (de)
EP (1) EP1391785B1 (de)
JP (1) JP4115913B2 (de)
KR (1) KR100748447B1 (de)
CN (1) CN1495531B (de)
DE (1) DE60333151D1 (de)
SG (1) SG108933A1 (de)
TW (1) TWI229242B (de)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US20050080143A1 (en) * 2001-11-29 2005-04-14 Steiner Mitchell S. Treatment of androgen-deprivation induced osteoporosis
US6838684B2 (en) * 2002-08-23 2005-01-04 Asml Netherlands B.V. Lithographic projection apparatus and particle barrier for use therein
US6963071B2 (en) * 2002-11-25 2005-11-08 Intel Corporation Debris mitigation device
CN100476585C (zh) * 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
TWI237733B (en) * 2003-06-27 2005-08-11 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
US7199384B2 (en) * 2004-07-09 2007-04-03 Energetiq Technology Inc. Inductively-driven light source for lithography
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US7183717B2 (en) * 2004-07-09 2007-02-27 Energetiq Technology Inc. Inductively-driven light source for microscopy
EP2187711B1 (de) * 2004-07-09 2012-01-18 Energetiq Technology Inc. Induktiv angesteuerte Plasma-Lichtquelle
US7307375B2 (en) * 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source
US7307263B2 (en) * 2004-07-14 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7339909B2 (en) * 2004-07-30 2008-03-04 Motorola Inc. Apparatus and method for operating a communication device on two networks
US7161653B2 (en) * 2004-09-20 2007-01-09 Asml Netherlands B.V. Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
US7145132B2 (en) * 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
US7414251B2 (en) * 2004-12-28 2008-08-19 Asml Netherlands B.V. Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
US7692169B2 (en) * 2004-12-28 2010-04-06 Asml Netherlands B.V. Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
SG123767A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
JP4366358B2 (ja) * 2004-12-29 2009-11-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、照明システム、フィルタ・システム、およびそのようなフィルタ・システムのサポートを冷却するための方法
US7250620B2 (en) * 2005-01-20 2007-07-31 Infineon Technologies Ag EUV lithography filter
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7233010B2 (en) * 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
US8873021B2 (en) 2005-06-14 2014-10-28 Koninklijke Philips N.V. Debris mitigation system with improved gas distribution
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
JP2009510698A (ja) * 2005-09-30 2009-03-12 エナジェティック・テクノロジー・インコーポレーテッド 誘導駆動型プラズマ光源
US7262423B2 (en) * 2005-12-02 2007-08-28 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7468521B2 (en) * 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
JP5076349B2 (ja) * 2006-04-18 2012-11-21 ウシオ電機株式会社 極端紫外光集光鏡および極端紫外光光源装置
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7714306B2 (en) * 2006-08-30 2010-05-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
JP4888046B2 (ja) * 2006-10-26 2012-02-29 ウシオ電機株式会社 極端紫外光光源装置
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
US7825390B2 (en) * 2007-02-14 2010-11-02 Asml Netherlands B.V. Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
US8018576B2 (en) * 2007-03-23 2011-09-13 Asml Netherlands B.V. Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device
DE102008014832A1 (de) 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
DE102007023444B4 (de) 2007-05-16 2009-04-09 Xtreme Technologies Gmbh Einrichtung zur Erzeugung eines Gasvorhangs für plasmabasierte EUV-Strahlungsquellen
US7687788B2 (en) * 2007-07-16 2010-03-30 Asml Netherlands B.V. Debris prevention system, radiation system, and lithographic apparatus
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US20090183322A1 (en) * 2008-01-17 2009-07-23 Banqiu Wu Electrostatic surface cleaning
US8084757B2 (en) * 2008-01-17 2011-12-27 Applied Materials, Inc. Contamination prevention in extreme ultraviolet lithography
NL1036768A1 (nl) * 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
NL2002890A1 (nl) * 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
DE102008029467A1 (de) * 2008-06-20 2009-12-24 Osram Opto Semiconductors Gmbh Halbleiterbauelement, Verwendung eines Halbleiterbauelements als Näherungssensor sowie Verfahren zum Detektieren von Objekten
DE102008031650B4 (de) 2008-07-04 2010-04-29 Xtreme Technologies Gmbh Anordnung zur Debrisunterdrückung in einer plasmabasierten Strahlungsquelle zur Erzeugung kurzwelliger Strahlung
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
EP2545413A1 (de) * 2010-03-12 2013-01-16 ASML Netherlands B.V. Strahlungsquelle, lithografische vorrichtung und vorrichtungsherstellungsverfahren
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US9594306B2 (en) * 2011-03-04 2017-03-14 Asml Netherlands B.V. Lithographic apparatus, spectral purity filter and device manufacturing method
US9132436B2 (en) 2012-09-21 2015-09-15 Applied Materials, Inc. Chemical control features in wafer process equipment
US10256079B2 (en) 2013-02-08 2019-04-09 Applied Materials, Inc. Semiconductor processing systems having multiple plasma configurations
US9544984B2 (en) * 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
NL2013493A (en) * 2013-10-16 2015-04-20 Asml Netherlands Bv Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method.
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
US11637002B2 (en) 2014-11-26 2023-04-25 Applied Materials, Inc. Methods and systems to enhance process uniformity
US20160225652A1 (en) 2015-02-03 2016-08-04 Applied Materials, Inc. Low temperature chuck for plasma processing systems
US9741593B2 (en) 2015-08-06 2017-08-22 Applied Materials, Inc. Thermal management systems and methods for wafer processing systems
US10504700B2 (en) 2015-08-27 2019-12-10 Applied Materials, Inc. Plasma etching systems and methods with secondary plasma injection
US10504754B2 (en) 2016-05-19 2019-12-10 Applied Materials, Inc. Systems and methods for improved semiconductor etching and component protection
US10546729B2 (en) 2016-10-04 2020-01-28 Applied Materials, Inc. Dual-channel showerhead with improved profile
US11276590B2 (en) 2017-05-17 2022-03-15 Applied Materials, Inc. Multi-zone semiconductor substrate supports
US11276559B2 (en) 2017-05-17 2022-03-15 Applied Materials, Inc. Semiconductor processing chamber for multiple precursor flow
US10297458B2 (en) 2017-08-07 2019-05-21 Applied Materials, Inc. Process window widening using coated parts in plasma etch processes
US11328909B2 (en) 2017-12-22 2022-05-10 Applied Materials, Inc. Chamber conditioning and removal processes
US10964512B2 (en) 2018-02-15 2021-03-30 Applied Materials, Inc. Semiconductor processing chamber multistage mixing apparatus and methods
US10319600B1 (en) 2018-03-12 2019-06-11 Applied Materials, Inc. Thermal silicon etch
US11049755B2 (en) 2018-09-14 2021-06-29 Applied Materials, Inc. Semiconductor substrate supports with embedded RF shield
US11062887B2 (en) 2018-09-17 2021-07-13 Applied Materials, Inc. High temperature RF heater pedestals
US11417534B2 (en) 2018-09-21 2022-08-16 Applied Materials, Inc. Selective material removal
US11682560B2 (en) 2018-10-11 2023-06-20 Applied Materials, Inc. Systems and methods for hafnium-containing film removal
US11121002B2 (en) 2018-10-24 2021-09-14 Applied Materials, Inc. Systems and methods for etching metals and metal derivatives
US11437242B2 (en) 2018-11-27 2022-09-06 Applied Materials, Inc. Selective removal of silicon-containing materials

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20890A (en) * 1858-07-13 Improvement in hemp-brakes
US84428A (en) * 1868-11-24 Improvement in blowing-engines
US90054A (en) * 1869-05-11 Improved mosquito-bar frame
US154279A (en) * 1874-08-18 Improvement in stamping apparatus
US95623A (en) * 1869-10-05 Henry r
US4408338A (en) 1981-12-31 1983-10-04 International Business Machines Corporation Pulsed electromagnetic radiation source having a barrier for discharged debris
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000349009A (ja) * 1999-06-04 2000-12-15 Nikon Corp 露光方法及び装置
US6369874B1 (en) * 2000-04-18 2002-04-09 Silicon Valley Group, Inc. Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography
US6576912B2 (en) 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US20020090054A1 (en) 2001-01-10 2002-07-11 Michael Sogard Apparatus and method for containing debris from laser plasma radiation sources
US6614505B2 (en) 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2004519868A (ja) * 2001-04-17 2004-07-02 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ Ｅｕｖに透明な境界構造
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
DE10138284A1 (de) 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
WO2003034153A2 (en) * 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Lithographic apparatus and device manufacturing method
DE10204994B4 (de) * 2002-02-05 2006-11-09 Xtreme Technologies Gmbh Anordnung zur Überwachung der Energieabstrahlung einer EUV-Strahlungsquelle
SG109523A1 (en) * 2002-08-15 2005-03-30 Asml Netherlands Bv Lithographic projection apparatus and reflector assembly for use in said apparatus
US6838684B2 (en) * 2002-08-23 2005-01-04 Asml Netherlands B.V. Lithographic projection apparatus and particle barrier for use therein
SG129254A1 (en) * 2002-08-27 2007-02-26 Asml Netherlands Bv Lithographic projection apparatus and reflector assembly for use in said apparatus
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
DE10308174B4 (de) * 2003-02-24 2010-01-14 Xtreme Technologies Gmbh Anordnung zur Debrisreduktion bei einer Strahlungsquelle auf Basis eines Plasmas
JP2004343082A (ja) * 2003-04-17 2004-12-02 Asml Netherlands Bv 凹面および凸面を含む集光器を備えたリトグラフ投影装置

Also Published As

Publication number Publication date
TWI229242B (en) 2005-03-11
US7057190B2 (en) 2006-06-06
JP4115913B2 (ja) 2008-07-09
TW200424783A (en) 2004-11-16
KR100748447B1 (ko) 2007-08-10
CN1495531A (zh) 2004-05-12
CN1495531B (zh) 2010-05-26
EP1391785A1 (de) 2004-02-25
JP2004165639A (ja) 2004-06-10
KR20040030262A (ko) 2004-04-09
SG108933A1 (en) 2005-02-28
US20050098741A1 (en) 2005-05-12
US20040108465A1 (en) 2004-06-10
US6838684B2 (en) 2005-01-04
EP1391785B1 (de) 2010-06-30

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