DE60326163D1 - Stempel, Methode zu seiner Herstellung und Gebrauch desselben - Google Patents

Stempel, Methode zu seiner Herstellung und Gebrauch desselben

Info

Publication number
DE60326163D1
DE60326163D1 DE60326163T DE60326163T DE60326163D1 DE 60326163 D1 DE60326163 D1 DE 60326163D1 DE 60326163 T DE60326163 T DE 60326163T DE 60326163 T DE60326163 T DE 60326163T DE 60326163 D1 DE60326163 D1 DE 60326163D1
Authority
DE
Germany
Prior art keywords
template
polymer layer
substrate
texturing
sub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60326163T
Other languages
English (en)
Inventor
Li Shunpu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ingenia Holdings Ltd
Ingenia Technology Ltd
Original Assignee
Ingenia Holdings Ltd
Ingenia Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ingenia Holdings Ltd, Ingenia Technology Ltd filed Critical Ingenia Holdings Ltd
Application granted granted Critical
Publication of DE60326163D1 publication Critical patent/DE60326163D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31935—Ester, halide or nitrile of addition polymer
DE60326163T 2002-11-29 2003-11-12 Stempel, Methode zu seiner Herstellung und Gebrauch desselben Expired - Lifetime DE60326163D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0227902.4A GB0227902D0 (en) 2002-11-29 2002-11-29 Template
PCT/GB2003/004911 WO2004051371A2 (en) 2002-11-29 2003-11-12 Template

Publications (1)

Publication Number Publication Date
DE60326163D1 true DE60326163D1 (de) 2009-03-26

Family

ID=9948791

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60326163T Expired - Lifetime DE60326163D1 (de) 2002-11-29 2003-11-12 Stempel, Methode zu seiner Herstellung und Gebrauch desselben

Country Status (16)

Country Link
US (1) US20050281982A1 (de)
EP (1) EP1565787B1 (de)
JP (1) JP4351169B2 (de)
KR (1) KR20050102078A (de)
CN (1) CN1717625A (de)
AT (1) ATE422682T1 (de)
AU (1) AU2003283567A1 (de)
BR (1) BR0316636A (de)
CA (1) CA2507521A1 (de)
DE (1) DE60326163D1 (de)
GB (1) GB0227902D0 (de)
IL (1) IL168521A (de)
MX (1) MXPA05005766A (de)
MY (1) MY139728A (de)
TW (1) TW200415119A (de)
WO (1) WO2004051371A2 (de)

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US8399331B2 (en) 2007-10-06 2013-03-19 Solexel Laser processing for high-efficiency thin crystalline silicon solar cell fabrication
US8420435B2 (en) 2009-05-05 2013-04-16 Solexel, Inc. Ion implantation fabrication process for thin-film crystalline silicon solar cells
US9508886B2 (en) 2007-10-06 2016-11-29 Solexel, Inc. Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam
KR100705641B1 (ko) * 2006-04-10 2007-04-17 이화여자대학교 산학협력단 몰드 처리방법
US8293558B2 (en) 2006-10-09 2012-10-23 Solexel, Inc. Method for releasing a thin-film substrate
US8168465B2 (en) 2008-11-13 2012-05-01 Solexel, Inc. Three-dimensional semiconductor template for making high efficiency thin-film solar cells
US8035028B2 (en) 2006-10-09 2011-10-11 Solexel, Inc. Pyramidal three-dimensional thin-film solar cells
US7999174B2 (en) 2006-10-09 2011-08-16 Solexel, Inc. Solar module structures and assembly methods for three-dimensional thin-film solar cells
US8193076B2 (en) 2006-10-09 2012-06-05 Solexel, Inc. Method for releasing a thin semiconductor substrate from a reusable template
US8084684B2 (en) 2006-10-09 2011-12-27 Solexel, Inc. Three-dimensional thin-film solar cells
WO2009026240A1 (en) * 2007-08-17 2009-02-26 Solexel, Inc. Methods for liquid transfer coating of three-dimensional substrates
US8288195B2 (en) 2008-11-13 2012-10-16 Solexel, Inc. Method for fabricating a three-dimensional thin-film semiconductor substrate from a template
EP2371006A4 (de) 2008-11-26 2013-05-01 Solexel Inc Trunkierte pyramidenstruktren für durchsichtige solarzellen
EP2387458B1 (de) 2009-01-15 2014-03-05 Solexel, Inc. System und verfahren zur elektroätzung von porösem silizium
US9076642B2 (en) 2009-01-15 2015-07-07 Solexel, Inc. High-Throughput batch porous silicon manufacturing equipment design and processing methods
US8906218B2 (en) 2010-05-05 2014-12-09 Solexel, Inc. Apparatus and methods for uniformly forming porous semiconductor on a substrate
MY162405A (en) 2009-02-06 2017-06-15 Solexel Inc Trench Formation Method For Releasing A Thin-Film Substrate From A Reusable Semiconductor Template
US8828517B2 (en) 2009-03-23 2014-09-09 Solexel, Inc. Structure and method for improving solar cell efficiency and mechanical strength
EP2419306B1 (de) 2009-04-14 2016-03-30 Solexel, Inc. Hochleistungsreaktor für epitaktische gasphasenabscheidung (cvd)
US9099584B2 (en) 2009-04-24 2015-08-04 Solexel, Inc. Integrated three-dimensional and planar metallization structure for thin film solar cells
CN102460716B (zh) 2009-05-05 2015-03-25 速力斯公司 高生产率多孔半导体制造设备
US9318644B2 (en) 2009-05-05 2016-04-19 Solexel, Inc. Ion implantation and annealing for thin film crystalline solar cells
US8445314B2 (en) 2009-05-22 2013-05-21 Solexel, Inc. Method of creating reusable template for detachable thin film substrate
MY159405A (en) 2009-05-29 2016-12-30 Solexel Inc Three-dimensional thin-film semiconductor substrate with through-holes and methods of manufacturing
CN102763226B (zh) 2009-12-09 2016-01-27 速力斯公司 使用薄平面半导体的高效光伏背触点太阳能电池结构和制造方法
EP2534700A4 (de) 2010-02-12 2015-04-29 Solexel Inc Doppelseitige wiederverwendbare vorlage zur herstellung von halbleitersubstraten für photovoltaikzellen und mikroelektronische geräte
KR20130051013A (ko) 2010-06-09 2013-05-16 솔렉셀, 인크. 고생산성 박막 증착 방법 및 시스템
WO2013055307A2 (en) 2010-08-05 2013-04-18 Solexel, Inc. Backplane reinforcement and interconnects for solar cells
EP2710639A4 (de) 2011-05-20 2015-11-25 Solexel Inc Selbstaktivierte vorderseiten-vorspannung für eine solarzelle
CN110181828A (zh) * 2019-05-10 2019-08-30 常熟安通林汽车饰件有限公司 一种避免包覆件鼓包的方法

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Also Published As

Publication number Publication date
IL168521A (en) 2010-05-17
EP1565787B1 (de) 2009-02-11
MXPA05005766A (es) 2005-09-21
JP2006508825A (ja) 2006-03-16
JP4351169B2 (ja) 2009-10-28
MY139728A (en) 2009-10-30
WO2004051371A3 (en) 2004-10-07
CA2507521A1 (en) 2004-06-17
CN1717625A (zh) 2006-01-04
US20050281982A1 (en) 2005-12-22
TW200415119A (en) 2004-08-16
AU2003283567A1 (en) 2004-06-23
WO2004051371A2 (en) 2004-06-17
BR0316636A (pt) 2005-10-11
KR20050102078A (ko) 2005-10-25
ATE422682T1 (de) 2009-02-15
EP1565787A2 (de) 2005-08-24
GB0227902D0 (en) 2003-01-08

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