DE60316234T2 - Verfahren zum Schutz von Artikeln, und entsprechende Zusammensetzungen - Google Patents
Verfahren zum Schutz von Artikeln, und entsprechende Zusammensetzungen Download PDFInfo
- Publication number
- DE60316234T2 DE60316234T2 DE60316234T DE60316234T DE60316234T2 DE 60316234 T2 DE60316234 T2 DE 60316234T2 DE 60316234 T DE60316234 T DE 60316234T DE 60316234 T DE60316234 T DE 60316234T DE 60316234 T2 DE60316234 T2 DE 60316234T2
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- coating
- target
- atomic
- protective coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 51
- 239000000203 mixture Substances 0.000 title description 15
- 239000000758 substrate Substances 0.000 claims description 93
- 238000000576 coating method Methods 0.000 claims description 73
- 239000011253 protective coating Substances 0.000 claims description 50
- 239000011248 coating agent Substances 0.000 claims description 49
- 238000000151 deposition Methods 0.000 claims description 46
- 239000000463 material Substances 0.000 claims description 46
- 230000008021 deposition Effects 0.000 claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 26
- 229910045601 alloy Inorganic materials 0.000 claims description 26
- 239000000956 alloy Substances 0.000 claims description 26
- 229910052782 aluminium Inorganic materials 0.000 claims description 25
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 239000011651 chromium Substances 0.000 claims description 23
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 22
- 229910052804 chromium Inorganic materials 0.000 claims description 22
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 21
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 20
- 229910052726 zirconium Inorganic materials 0.000 claims description 20
- 229910052735 hafnium Inorganic materials 0.000 claims description 14
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 230000001590 oxidative effect Effects 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 229910052715 tantalum Inorganic materials 0.000 claims description 12
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 12
- 229910052684 Cerium Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052746 lanthanum Inorganic materials 0.000 claims description 11
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- 229910052727 yttrium Inorganic materials 0.000 claims description 11
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 11
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 238000005137 deposition process Methods 0.000 claims description 10
- 229910000951 Aluminide Inorganic materials 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- 229910000601 superalloy Inorganic materials 0.000 claims description 9
- 229910017052 cobalt Inorganic materials 0.000 claims description 8
- 239000010941 cobalt Substances 0.000 claims description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 8
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 24
- 230000008569 process Effects 0.000 description 19
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 15
- 229910000907 nickel aluminide Inorganic materials 0.000 description 15
- 230000003993 interaction Effects 0.000 description 8
- 239000012720 thermal barrier coating Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000004663 powder metallurgy Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- PCLURTMBFDTLSK-UHFFFAOYSA-N nickel platinum Chemical compound [Ni].[Pt] PCLURTMBFDTLSK-UHFFFAOYSA-N 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- -1 tautal Chemical compound 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64618 | 2002-07-31 | ||
| US10/064,618 US20040022662A1 (en) | 2002-07-31 | 2002-07-31 | Method for protecting articles, and related compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60316234D1 DE60316234D1 (de) | 2007-10-25 |
| DE60316234T2 true DE60316234T2 (de) | 2008-06-19 |
Family
ID=31186018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60316234T Expired - Lifetime DE60316234T2 (de) | 2002-07-31 | 2003-07-31 | Verfahren zum Schutz von Artikeln, und entsprechende Zusammensetzungen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20040022662A1 (enExample) |
| EP (1) | EP1391533B1 (enExample) |
| JP (1) | JP2004068156A (enExample) |
| CN (1) | CN100469941C (enExample) |
| DE (1) | DE60316234T2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010047838A1 (en) * | 2000-03-28 | 2001-12-06 | Segal Vladimir M. | Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions |
| US20040256218A1 (en) * | 2002-05-31 | 2004-12-23 | Glass Howard L. | Thin films and methods of forming thin films utilizing ECAE-targets |
| US20040185182A1 (en) * | 2002-07-31 | 2004-09-23 | General Electric Company | Method for protecting articles, and related compositions |
| DE10355036A1 (de) * | 2003-11-25 | 2005-06-23 | Mtu Aero Engines Gmbh | Verfahren zur Herstellung einer Schutzschicht, Schutzschicht und Bauteil mit einer solchen Schutzschicht |
| US7416790B2 (en) * | 2006-12-08 | 2008-08-26 | General Electric Company | Coating systems containing rhodium aluminide-based layers |
| US20080160208A1 (en) * | 2006-12-29 | 2008-07-03 | Michael Patrick Maly | System and method for restoring or regenerating an article |
| IL191822A0 (en) * | 2007-06-25 | 2009-02-11 | Sulzer Metaplas Gmbh | Layer system for the formation of a surface layer on a surface of a substrate and also are vaporization source for the manufacture of a layer system |
| SE531933C2 (sv) * | 2007-12-14 | 2009-09-08 | Seco Tools Ab | Belagt hårdmetallskär för bearbetning av stål och rostfria stål |
| US8906170B2 (en) * | 2008-06-24 | 2014-12-09 | General Electric Company | Alloy castings having protective layers and methods of making the same |
| PL2166128T3 (pl) | 2008-09-19 | 2012-05-31 | Oerlikon Trading Ag | Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe |
| RU2445403C1 (ru) * | 2011-02-24 | 2012-03-20 | Российская Федерация, в лице которой выступает Министерство промышленности и торговли Российской Федерации (Минпромторг РФ) | Многослойное износостойкое термостойкое покрытие |
| KR102029284B1 (ko) * | 2017-11-14 | 2019-10-07 | 한국원자력연구원 | 고온 내산화성이 향상된 지르코늄 합금 피복관 및 이의 제조방법 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3341307A (en) * | 1965-05-25 | 1967-09-12 | Tarr Charles Oliver | Oxidation resistant niobium |
| US4109061A (en) * | 1977-12-08 | 1978-08-22 | United Technologies Corporation | Method for altering the composition and structure of aluminum bearing overlay alloy coatings during deposition from metallic vapor |
| JPH01147038A (ja) * | 1987-12-02 | 1989-06-08 | Honda Motor Co Ltd | 粉末冶金用耐熱Ａｌ合金 |
| FR2671808B1 (fr) * | 1991-01-18 | 1994-06-17 | Centre Nat Rech Scient | Alliages d'aluminium a proprietes specifiques. |
| JP2965776B2 (ja) * | 1992-02-17 | 1999-10-18 | 功二 橋本 | 高耐食アモルファスアルミニウム合金 |
| US5312584A (en) * | 1992-02-18 | 1994-05-17 | General Motors Corporation | Moldless/coreless single crystal castings of nickel-aluminide |
| JPH06248383A (ja) * | 1993-02-22 | 1994-09-06 | Yamaha Motor Co Ltd | 内燃機関ピストン用アルミニウム合金 |
| JP3235386B2 (ja) * | 1994-12-28 | 2001-12-04 | ヤマハ株式会社 | 熱電材料及びその製造方法 |
| JP3372129B2 (ja) * | 1995-04-17 | 2003-01-27 | ワイケイケイ株式会社 | 高強度アルミニウム合金固化材およびその製造方法 |
| JPH10183337A (ja) * | 1996-11-01 | 1998-07-14 | Japan Energy Corp | Ａｌ合金薄膜およびＡｌ合金スパッタリングターゲット |
| US6284390B1 (en) * | 1998-06-12 | 2001-09-04 | United Technologies Corporation | Thermal barrier coating system utilizing localized bond coat and article having the same |
| US6287644B1 (en) * | 1999-07-02 | 2001-09-11 | General Electric Company | Continuously-graded bond coat and method of manufacture |
| US6207297B1 (en) * | 1999-09-29 | 2001-03-27 | Siemens Westinghouse Power Corporation | Barrier layer for a MCrAlY basecoat superalloy combination |
| JP2001316803A (ja) * | 2000-04-28 | 2001-11-16 | Honeywell Electronics Japan Kk | スパッタリングターゲット材の製造方法 |
| US6475642B1 (en) * | 2000-08-31 | 2002-11-05 | General Electric Company | Oxidation-resistant coatings, and related articles and processes |
| US6861157B2 (en) * | 2002-03-18 | 2005-03-01 | General Electric Company | Article for high temperature service and method for manufacture |
-
2002
- 2002-07-31 US US10/064,618 patent/US20040022662A1/en not_active Abandoned
-
2003
- 2003-07-31 CN CNB031522211A patent/CN100469941C/zh not_active Expired - Fee Related
- 2003-07-31 JP JP2003283280A patent/JP2004068156A/ja active Pending
- 2003-07-31 EP EP03254804A patent/EP1391533B1/en not_active Expired - Lifetime
- 2003-07-31 DE DE60316234T patent/DE60316234T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20040022662A1 (en) | 2004-02-05 |
| CN100469941C (zh) | 2009-03-18 |
| EP1391533B1 (en) | 2007-09-12 |
| CN1500905A (zh) | 2004-06-02 |
| DE60316234D1 (de) | 2007-10-25 |
| EP1391533A1 (en) | 2004-02-25 |
| JP2004068156A (ja) | 2004-03-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8363 | Opposition against the patent |