DE60313864D1 - Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas - Google Patents

Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas

Info

Publication number
DE60313864D1
DE60313864D1 DE60313864T DE60313864T DE60313864D1 DE 60313864 D1 DE60313864 D1 DE 60313864D1 DE 60313864 T DE60313864 T DE 60313864T DE 60313864 T DE60313864 T DE 60313864T DE 60313864 D1 DE60313864 D1 DE 60313864D1
Authority
DE
Germany
Prior art keywords
generating
arrangement
electrodes
plasma
plasmas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60313864T
Other languages
English (en)
Other versions
DE60313864T2 (de
Inventor
Vries Hindrik Willem De
Jan Bastiaan Bouwstra
Eugen Aldea
De Sanden Mauritius Cornel Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Manufacturing Europe BV
Original Assignee
Fujifilm Manufacturing Europe BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Manufacturing Europe BV filed Critical Fujifilm Manufacturing Europe BV
Application granted granted Critical
Publication of DE60313864D1 publication Critical patent/DE60313864D1/de
Publication of DE60313864T2 publication Critical patent/DE60313864T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning In General (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
DE60313864T 2003-08-14 2003-08-14 Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas Expired - Lifetime DE60313864T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077575A EP1507281B1 (de) 2003-08-14 2003-08-14 Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas

Publications (2)

Publication Number Publication Date
DE60313864D1 true DE60313864D1 (de) 2007-06-28
DE60313864T2 DE60313864T2 (de) 2008-01-17

Family

ID=33560829

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60313864T Expired - Lifetime DE60313864T2 (de) 2003-08-14 2003-08-14 Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas

Country Status (5)

Country Link
US (1) US7533629B2 (de)
EP (1) EP1507281B1 (de)
JP (1) JP5175023B2 (de)
AT (1) ATE362648T1 (de)
DE (1) DE60313864T2 (de)

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DE102004049783B4 (de) * 2004-10-12 2009-03-19 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung von Gütern unter Zuhilfenahme einer elektrischen Entladung
US20060246218A1 (en) * 2005-04-29 2006-11-02 Guardian Industries Corp. Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
JP4969223B2 (ja) * 2006-11-30 2012-07-04 独立行政法人産業技術総合研究所 高温場用フレキシブル電極
US7999173B1 (en) 2007-03-21 2011-08-16 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Dust removal from solar cells
US9757487B2 (en) * 2007-11-21 2017-09-12 University Of Florida Research Foundation, Inc. Self-sterilizing device using plasma fields
US8220753B2 (en) * 2008-01-04 2012-07-17 The Boeing Company Systems and methods for controlling flows with pulsed discharges
JP5593589B2 (ja) * 2008-03-25 2014-09-24 パナソニック株式会社 プラズマ発生装置
FI20080248L (fi) * 2008-03-28 2009-09-29 Savcor Face Group Oy Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi
EP2286436A1 (de) * 2008-06-06 2011-02-23 FUJIFILM Manufacturing Europe B.V. Verfahren und vorrichtung zur plasmaflächenbehandlung eines beweglichen substrats
JP5008622B2 (ja) * 2008-08-22 2012-08-22 株式会社日立国際電気 プラズマ発生電極及びプラズマ発生方法
GB0919274D0 (en) 2009-11-03 2009-12-16 Univ The Glasgow Plasma generation apparatus and use of plasma generation apparatus
CN102427653B (zh) * 2011-09-19 2012-11-28 大连海事大学 一种引入微辉光放电模式的大气压非平衡等离子体源
JP5787712B2 (ja) * 2011-10-20 2015-09-30 株式会社日立製作所 プラズマ処理装置
US9447205B2 (en) 2012-11-19 2016-09-20 Ut-Battelle, Llc Atmospheric pressure plasma processing of polymeric materials utilizing close proximity indirect exposure
CN103079328B (zh) * 2012-12-31 2015-10-07 云南航天工业有限公司 一种介质阻挡放电电极及其制作方法
JP6258146B2 (ja) * 2014-07-18 2018-01-10 株式会社Ｉｈｉ環境エンジニアリング プラズマ放電状態検知装置
KR101653738B1 (ko) * 2015-02-17 2016-09-09 서재화 롤형 플라즈마 발생기
CN106179749B (zh) * 2016-07-05 2019-07-02 北京航天爱锐科技有限责任公司 放电电极及其制备方法、等离子体发生器和空气净化设备
US10952309B2 (en) 2016-07-19 2021-03-16 Hewlett-Packard Development Company, L.P. Plasma treatment heads
WO2018017058A1 (en) 2016-07-19 2018-01-25 Hewlett-Packard Development Company, L.P. Printing systems
US10532582B2 (en) 2016-07-19 2020-01-14 Hewlett-Packard Development Company, L.P. Printing systems
JP2019057363A (ja) * 2017-09-19 2019-04-11 国立大学法人名古屋大学 放電リアクタ、及びその製造方法
CN112616235B (zh) * 2021-01-14 2023-06-30 深圳大学 二维钛化碳在生成大气压均匀介质阻挡放电中的应用
DE102021128964B3 (de) * 2021-11-08 2023-03-09 Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen, Körperschaft des öffentlichen Rechts Verfahren und Vorrichtung zur Erzeugung von Plasmen mit erhöhter Pulsenergie durch dielektrisch behinderte elektrische Entladungen
CN116657400B (zh) * 2023-08-01 2023-09-26 常州市武进广宇花辊机械有限公司 一种无纺布高速分切装置及分切方法

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US5938854A (en) * 1993-05-28 1999-08-17 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
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JP3967050B2 (ja) * 1999-10-25 2007-08-29 三菱電機株式会社 プラズマ発生装置
US6528947B1 (en) * 1999-12-06 2003-03-04 E. I. Du Pont De Nemours And Company Hollow cathode array for plasma generation
JP3586197B2 (ja) * 2000-03-23 2004-11-10 シャープ株式会社 薄膜形成用プラズマ成膜装置
KR100464902B1 (ko) * 2001-02-12 2005-01-05 (주)에스이 플라즈마 대기압에서 저온 플라즈마를 발생시키는 장치
US6441554B1 (en) * 2000-11-28 2002-08-27 Se Plasma Inc. Apparatus for generating low temperature plasma at atmospheric pressure
WO2003019624A2 (en) * 2001-08-27 2003-03-06 University Of New Hampshire Dielectric barrier discharge process for depositing silicon nitride film on substrates

Also Published As

Publication number Publication date
EP1507281A1 (de) 2005-02-16
DE60313864T2 (de) 2008-01-17
JP2005063973A (ja) 2005-03-10
US7533629B2 (en) 2009-05-19
US20060022606A1 (en) 2006-02-02
JP5175023B2 (ja) 2013-04-03
ATE362648T1 (de) 2007-06-15
EP1507281B1 (de) 2007-05-16

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM MANUFACTURING EUROPE B.V., TILBURG, NL

8364 No opposition during term of opposition