DE60307408D1 - Fotoelektrische Sensoranordnung und Herstellungsverfahren dafür - Google Patents
Fotoelektrische Sensoranordnung und Herstellungsverfahren dafürInfo
- Publication number
- DE60307408D1 DE60307408D1 DE60307408T DE60307408T DE60307408D1 DE 60307408 D1 DE60307408 D1 DE 60307408D1 DE 60307408 T DE60307408 T DE 60307408T DE 60307408 T DE60307408 T DE 60307408T DE 60307408 D1 DE60307408 D1 DE 60307408D1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- depositing
- insulator
- pads
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000012212 insulator Substances 0.000 abstract 9
- 238000000151 deposition Methods 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 6
- 239000004020 conductor Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 238000005530 etching Methods 0.000 abstract 2
- 238000001465 metallisation Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
- 238000001459 lithography Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Facsimile Heads (AREA)
- Basic Packing Technique (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0215023 | 2002-11-29 | ||
FR0215023A FR2848027B1 (fr) | 2002-11-29 | 2002-11-29 | Dispositif de detection photo-electrique et procede pour sa realisation |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60307408D1 true DE60307408D1 (de) | 2006-09-21 |
DE60307408T2 DE60307408T2 (de) | 2006-12-07 |
Family
ID=32309832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60307408T Expired - Lifetime DE60307408T2 (de) | 2002-11-29 | 2003-11-14 | Fotoelektrische Sensoranordnung und Herstellungsverfahren dafür |
Country Status (6)
Country | Link |
---|---|
US (1) | US7049673B2 (de) |
EP (1) | EP1434270B1 (de) |
JP (1) | JP4629328B2 (de) |
AT (1) | ATE336078T1 (de) |
DE (1) | DE60307408T2 (de) |
FR (1) | FR2848027B1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100837556B1 (ko) * | 2007-03-19 | 2008-06-12 | 동부일렉트로닉스 주식회사 | 이미지 센서 및 그의 제조방법 |
CN102017147B (zh) | 2007-04-18 | 2014-01-29 | 因维萨热技术公司 | 用于光电装置的材料、系统和方法 |
US20100044676A1 (en) | 2008-04-18 | 2010-02-25 | Invisage Technologies, Inc. | Photodetectors and Photovoltaics Based on Semiconductor Nanocrystals |
US8525287B2 (en) | 2007-04-18 | 2013-09-03 | Invisage Technologies, Inc. | Materials, systems and methods for optoelectronic devices |
KR100877293B1 (ko) * | 2007-08-31 | 2009-01-07 | 주식회사 동부하이텍 | 이미지 센서 및 그 제조방법 |
KR100920542B1 (ko) * | 2007-12-24 | 2009-10-08 | 주식회사 동부하이텍 | 이미지 센서 및 그 제조방법 |
US8203195B2 (en) | 2008-04-18 | 2012-06-19 | Invisage Technologies, Inc. | Materials, fabrication equipment, and methods for stable, sensitive photodetectors and image sensors made therefrom |
FR2944140B1 (fr) | 2009-04-02 | 2011-09-16 | Commissariat Energie Atomique | Dispositif de detection d'image electronique |
WO2011156507A1 (en) | 2010-06-08 | 2011-12-15 | Edward Hartley Sargent | Stable, sensitive photodetectors and image sensors including circuits, processes, and materials for enhanced imaging performance |
CN113188655A (zh) * | 2021-04-09 | 2021-07-30 | 广州市艾佛光通科技有限公司 | 基于体声波的光传感器及其制备方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0517208A1 (de) * | 1991-06-05 | 1992-12-09 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Halbleitervorrichtung und deren Herstellungsprozess |
JPH0883895A (ja) * | 1994-09-14 | 1996-03-26 | Toshiba Corp | 固体撮像素子 |
US6448579B1 (en) * | 2000-12-06 | 2002-09-10 | L.G.Philips Lcd Co., Ltd. | Thin film transistor array substrate for liquid crystal display and a method for fabricating the same |
US6396118B1 (en) * | 2000-02-03 | 2002-05-28 | Agilent Technologies, Inc. | Conductive mesh bias connection for an array of elevated active pixel sensors |
US20040113220A1 (en) * | 2000-12-21 | 2004-06-17 | Peter Rieve | Optoelectronic component for conversion electromagnetic radiation into an intensity-dependent photocurrent |
US6759262B2 (en) * | 2001-12-18 | 2004-07-06 | Agilent Technologies, Inc. | Image sensor with pixel isolation system and manufacturing method therefor |
US6798033B2 (en) * | 2002-08-27 | 2004-09-28 | E-Phocus, Inc. | Photoconductor-on-active-pixel (POAP) sensor utilizing a multi-layered radiation absorbing structure |
-
2002
- 2002-11-29 FR FR0215023A patent/FR2848027B1/fr not_active Expired - Fee Related
-
2003
- 2003-11-14 DE DE60307408T patent/DE60307408T2/de not_active Expired - Lifetime
- 2003-11-14 AT AT03104193T patent/ATE336078T1/de not_active IP Right Cessation
- 2003-11-14 EP EP03104193A patent/EP1434270B1/de not_active Expired - Lifetime
- 2003-11-20 US US10/718,150 patent/US7049673B2/en not_active Expired - Fee Related
- 2003-11-26 JP JP2003396263A patent/JP4629328B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1434270B1 (de) | 2006-08-09 |
EP1434270A1 (de) | 2004-06-30 |
US7049673B2 (en) | 2006-05-23 |
DE60307408T2 (de) | 2006-12-07 |
JP4629328B2 (ja) | 2011-02-09 |
JP2004186686A (ja) | 2004-07-02 |
US20040108517A1 (en) | 2004-06-10 |
FR2848027B1 (fr) | 2006-02-10 |
FR2848027A1 (fr) | 2004-06-04 |
ATE336078T1 (de) | 2006-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |