DE60227214D1 - Leitungsmuster von elekrischen Heizelementen und Muster enthaltende Substratbehandlungsvorrichtung - Google Patents
Leitungsmuster von elekrischen Heizelementen und Muster enthaltende SubstratbehandlungsvorrichtungInfo
- Publication number
- DE60227214D1 DE60227214D1 DE60227214T DE60227214T DE60227214D1 DE 60227214 D1 DE60227214 D1 DE 60227214D1 DE 60227214 T DE60227214 T DE 60227214T DE 60227214 T DE60227214 T DE 60227214T DE 60227214 D1 DE60227214 D1 DE 60227214D1
- Authority
- DE
- Germany
- Prior art keywords
- pattern
- treatment device
- heating elements
- electrical heating
- containing substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001119566 | 2001-04-18 | ||
JP2002085021A JP3582518B2 (ja) | 2001-04-18 | 2002-03-26 | 抵抗発熱体回路パターンとそれを用いた基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60227214D1 true DE60227214D1 (de) | 2008-08-07 |
Family
ID=26613765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60227214T Expired - Lifetime DE60227214D1 (de) | 2001-04-18 | 2002-04-18 | Leitungsmuster von elekrischen Heizelementen und Muster enthaltende Substratbehandlungsvorrichtung |
Country Status (7)
Country | Link |
---|---|
US (1) | US6664515B2 (de) |
EP (1) | EP1251719B1 (de) |
JP (1) | JP3582518B2 (de) |
KR (1) | KR100879848B1 (de) |
CA (1) | CA2381597C (de) |
DE (1) | DE60227214D1 (de) |
TW (1) | TW541640B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4602662B2 (ja) * | 2003-12-01 | 2010-12-22 | 株式会社ブリヂストン | セラミックヒータユニット |
JP4187208B2 (ja) * | 2004-01-09 | 2008-11-26 | 日本碍子株式会社 | ヒーター |
JP2005216759A (ja) * | 2004-01-30 | 2005-08-11 | Nhk Spring Co Ltd | ヒータユニット |
US7164104B2 (en) * | 2004-06-14 | 2007-01-16 | Watlow Electric Manufacturing Company | In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
US7880122B2 (en) * | 2004-07-28 | 2011-02-01 | Joeun Technology Co., Ltd. | Wafer having thermal circuit and power supplier therefor |
JP4654153B2 (ja) * | 2006-04-13 | 2011-03-16 | 信越化学工業株式会社 | 加熱素子 |
US8168050B2 (en) * | 2006-07-05 | 2012-05-01 | Momentive Performance Materials Inc. | Electrode pattern for resistance heating element and wafer processing apparatus |
US8637794B2 (en) | 2009-10-21 | 2014-01-28 | Lam Research Corporation | Heating plate with planar heating zones for semiconductor processing |
KR101644673B1 (ko) * | 2009-12-15 | 2016-08-01 | 램 리써치 코포레이션 | Cd 균일성을 향상시키기 위한 기판 온도의 조절 |
US8791392B2 (en) | 2010-10-22 | 2014-07-29 | Lam Research Corporation | Methods of fault detection for multiplexed heater array |
US8546732B2 (en) | 2010-11-10 | 2013-10-01 | Lam Research Corporation | Heating plate with planar heater zones for semiconductor processing |
US9307578B2 (en) | 2011-08-17 | 2016-04-05 | Lam Research Corporation | System and method for monitoring temperatures of and controlling multiplexed heater array |
JP5915026B2 (ja) * | 2011-08-26 | 2016-05-11 | 住友大阪セメント株式会社 | 温度測定用板状体及びそれを備えた温度測定装置 |
US10388493B2 (en) | 2011-09-16 | 2019-08-20 | Lam Research Corporation | Component of a substrate support assembly producing localized magnetic fields |
US8624168B2 (en) | 2011-09-20 | 2014-01-07 | Lam Research Corporation | Heating plate with diode planar heater zones for semiconductor processing |
US8461674B2 (en) | 2011-09-21 | 2013-06-11 | Lam Research Corporation | Thermal plate with planar thermal zones for semiconductor processing |
US9324589B2 (en) | 2012-02-28 | 2016-04-26 | Lam Research Corporation | Multiplexed heater array using AC drive for semiconductor processing |
US8809747B2 (en) | 2012-04-13 | 2014-08-19 | Lam Research Corporation | Current peak spreading schemes for multiplexed heated array |
US10049948B2 (en) | 2012-11-30 | 2018-08-14 | Lam Research Corporation | Power switching system for ESC with array of thermal control elements |
CN103596304B (zh) * | 2013-11-07 | 2015-10-28 | 上海大学 | 一种嵌入式自测温微热台及其制备方法 |
US9543171B2 (en) | 2014-06-17 | 2017-01-10 | Lam Research Corporation | Auto-correction of malfunctioning thermal control element in a temperature control plate of a semiconductor substrate support assembly that includes deactivating the malfunctioning thermal control element and modifying a power level of at least one functioning thermal control element |
JP6886128B2 (ja) | 2016-11-29 | 2021-06-16 | 住友電気工業株式会社 | ウエハ保持体 |
JP7063334B2 (ja) | 2017-06-14 | 2022-05-09 | 住友電気工業株式会社 | 半導体基板加熱用基板載置台および半導体基板加熱ヒータ |
KR102150811B1 (ko) | 2017-07-13 | 2020-09-01 | 스미토모덴키고교가부시키가이샤 | 세라믹스 히터 |
KR20190053941A (ko) | 2017-10-10 | 2019-05-20 | 스미토모덴키고교가부시키가이샤 | 웨이퍼 가열용 히터 유닛 |
CN107992128A (zh) * | 2018-01-09 | 2018-05-04 | 京东方科技集团股份有限公司 | 控温加热面板及制备方法、加热方法 |
CN109561528B (zh) * | 2018-12-13 | 2021-08-10 | 中国计量科学研究院 | 原子气室加热芯片 |
US20230084616A1 (en) * | 2020-02-18 | 2023-03-16 | Kyocera Corporation | Heater substrate, probe card substrate, and probe card |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3067315A (en) * | 1960-02-08 | 1962-12-04 | Gen Electric | Multi-layer film heaters in strip form |
US3883719A (en) * | 1974-05-10 | 1975-05-13 | Gen Electric | Glass-ceramic cooktop with film heaters |
US3895216A (en) * | 1974-09-30 | 1975-07-15 | Gen Electric | Low thermal mass solid plate surface heating unit |
EP0342363A3 (de) | 1988-04-26 | 1990-05-30 | Hoechst Aktiengesellschaft | Neue Angucyclinone aus Streptomyceten, Verfahren zu ihrer Herstellung und ihre Verwendung |
US6133557A (en) * | 1995-01-31 | 2000-10-17 | Kyocera Corporation | Wafer holding member |
GB2322273B (en) * | 1997-02-17 | 2001-05-30 | Strix Ltd | Electric heaters |
JP3477062B2 (ja) * | 1997-12-26 | 2003-12-10 | 京セラ株式会社 | ウエハ加熱装置 |
JPH11260534A (ja) * | 1998-01-09 | 1999-09-24 | Ngk Insulators Ltd | 加熱装置およびその製造方法 |
JP3515900B2 (ja) | 1998-05-06 | 2004-04-05 | 京セラ株式会社 | セラミックヒータ |
JP4166345B2 (ja) * | 1998-10-07 | 2008-10-15 | 日本碍子株式会社 | 塩素系ガスに対する耐蝕性部材 |
JP3793555B2 (ja) * | 1999-05-31 | 2006-07-05 | 京セラ株式会社 | 円盤状ヒータ |
JP2001085144A (ja) * | 1999-07-09 | 2001-03-30 | Ibiden Co Ltd | セラミックヒータ |
JP2001068255A (ja) * | 1999-08-31 | 2001-03-16 | Kyocera Corp | 円盤状ヒータ |
-
2002
- 2002-03-26 JP JP2002085021A patent/JP3582518B2/ja not_active Expired - Fee Related
- 2002-04-11 US US10/119,778 patent/US6664515B2/en not_active Expired - Fee Related
- 2002-04-12 CA CA002381597A patent/CA2381597C/en not_active Expired - Fee Related
- 2002-04-15 TW TW091107618A patent/TW541640B/zh not_active IP Right Cessation
- 2002-04-17 KR KR1020020020917A patent/KR100879848B1/ko not_active IP Right Cessation
- 2002-04-18 DE DE60227214T patent/DE60227214D1/de not_active Expired - Lifetime
- 2002-04-18 EP EP02252761A patent/EP1251719B1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100879848B1 (ko) | 2009-01-22 |
CA2381597A1 (en) | 2002-10-18 |
US6664515B2 (en) | 2003-12-16 |
TW541640B (en) | 2003-07-11 |
KR20020081142A (ko) | 2002-10-26 |
EP1251719A3 (de) | 2006-05-17 |
EP1251719A2 (de) | 2002-10-23 |
JP3582518B2 (ja) | 2004-10-27 |
JP2003017224A (ja) | 2003-01-17 |
US20020185488A1 (en) | 2002-12-12 |
EP1251719B1 (de) | 2008-06-25 |
CA2381597C (en) | 2004-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |