DE60212286D1 - Überwachungsgerät und Überwachngsverfahren für Vakuumgerät - Google Patents

Überwachungsgerät und Überwachngsverfahren für Vakuumgerät

Info

Publication number
DE60212286D1
DE60212286D1 DE60212286T DE60212286T DE60212286D1 DE 60212286 D1 DE60212286 D1 DE 60212286D1 DE 60212286 T DE60212286 T DE 60212286T DE 60212286 T DE60212286 T DE 60212286T DE 60212286 D1 DE60212286 D1 DE 60212286D1
Authority
DE
Germany
Prior art keywords
monitoring
vacuum
monitoring method
vacuum device
monitoring device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60212286T
Other languages
English (en)
Other versions
DE60212286T2 (de
Inventor
Hitoshi Fukube
Kenichiro Sonobe
Juntaro Arima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE60212286D1 publication Critical patent/DE60212286D1/de
Publication of DE60212286T2 publication Critical patent/DE60212286T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/024—Quantitative history assessment, e.g. mathematical relationships between available data; Functions therefor; Principal component analysis [PCA]; Partial least square [PLS]; Statistical classifiers, e.g. Bayesian networks, linear regression or correlation analysis; Neural networks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Evolutionary Computation (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
DE60212286T 2001-09-28 2002-09-27 Verfahren und Vorrichtung zum Überwachen einer Vakuumvorrichtung Expired - Lifetime DE60212286T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001303484A JP3793707B2 (ja) 2001-09-28 2001-09-28 真空装置の監視装置および監視方法
JP2001303484 2001-09-28

Publications (2)

Publication Number Publication Date
DE60212286D1 true DE60212286D1 (de) 2006-07-27
DE60212286T2 DE60212286T2 (de) 2007-04-26

Family

ID=19123562

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60212286T Expired - Lifetime DE60212286T2 (de) 2001-09-28 2002-09-27 Verfahren und Vorrichtung zum Überwachen einer Vakuumvorrichtung

Country Status (5)

Country Link
US (2) US6925423B2 (de)
EP (1) EP1298513B1 (de)
JP (1) JP3793707B2 (de)
KR (1) KR20030027800A (de)
DE (1) DE60212286T2 (de)

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KR100790744B1 (ko) * 2003-09-23 2007-12-31 동부일렉트로닉스 주식회사 웨이퍼 검사장치
DE102004036104A1 (de) * 2004-07-24 2006-03-16 Cognis Ip Management Gmbh Vorrichtung und Verfahren zur Überwachung von Produktionsanlagen
US7676342B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Sensor assembly, digital serial bus and protocol, sensor network, and lithographic apparatus and system
CN101263499B (zh) * 2005-07-11 2013-03-27 布鲁克斯自动化公司 智能状态监测和故障诊断系统
US9104650B2 (en) 2005-07-11 2015-08-11 Brooks Automation, Inc. Intelligent condition monitoring and fault diagnostic system for preventative maintenance
US7289863B2 (en) 2005-08-18 2007-10-30 Brooks Automation, Inc. System and method for electronic diagnostics of a process vacuum environment
JP5100191B2 (ja) * 2007-04-13 2012-12-19 キヤノン株式会社 情報処理装置及び情報処理方法
JP4901784B2 (ja) 2008-03-05 2012-03-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP2009303462A (ja) * 2008-06-17 2009-12-24 Mitsubishi Electric Corp 監視制御システム
US9141507B2 (en) * 2009-12-23 2015-09-22 Microsoft Technology Licensing, Llc Visualization of states of a process
JP5303517B2 (ja) 2010-07-15 2013-10-02 株式会社日立ハイテクノロジーズ 荷電粒子線装置、および欠陥観察装置、および管理サーバ
JP5748456B2 (ja) * 2010-11-19 2015-07-15 シスメックス株式会社 検体搬送システム、検体処理システムおよび制御装置
JP5548649B2 (ja) * 2011-05-31 2014-07-16 京セラドキュメントソリューションズ株式会社 画像形成装置
US20140160152A1 (en) * 2012-12-07 2014-06-12 General Electric Company Methods and systems for integrated plot training
US9761027B2 (en) 2012-12-07 2017-09-12 General Electric Company Methods and systems for integrated plot training
US9606054B2 (en) * 2013-09-30 2017-03-28 Advantest Corporation Methods, sampling device and apparatus for terahertz imaging and spectroscopy of coated beads, particles and/or microparticles
RS56209B1 (sr) * 2014-02-11 2017-11-30 Sandvik Intellectual Property Aparat za nadzor obrtnog uređaja i postupak
US9417181B2 (en) 2014-05-08 2016-08-16 Advantest Corporation Dynamic measurement of density using terahertz radiation with real-time thickness measurement for process control
WO2017179137A1 (ja) * 2016-04-13 2017-10-19 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
WO2019212518A1 (en) * 2018-04-30 2019-11-07 Hewlett-Packard Development Company, L.P. Countermeasure implementation for processing stage devices
WO2021037696A1 (en) * 2019-08-28 2021-03-04 Asml Netherlands B.V. Self-referencing health monitoring system for multi-beam sem tools
US20230280736A1 (en) * 2022-03-02 2023-09-07 Applied Materials, Inc. Comprehensive analysis module for determining processing equipment performance

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JPS58113713A (ja) 1981-12-26 1983-07-06 Toshiba Corp デ−タ記録装置
JPS58113830A (ja) 1981-12-28 1983-07-06 Anelva Corp 真空計測装置
JPH01276205A (ja) * 1988-04-27 1989-11-06 Mazda Motor Corp シーケンスプログラム制御系のモニタ装置
JPH02157909A (ja) * 1988-12-09 1990-06-18 Toshiba Corp プラント運転操作装置
JP2947840B2 (ja) * 1989-12-22 1999-09-13 株式会社日立製作所 プラント運転監視装置
JPH04190133A (ja) * 1990-11-24 1992-07-08 Hitachi Ltd 設備の診断支援方式
JP3126493B2 (ja) * 1991-06-25 2001-01-22 松下電工株式会社 設備故障診断方法
US5452417A (en) * 1993-11-23 1995-09-19 Honeywell Inc. Real time display system for showing the status of an operating system
JP3085095B2 (ja) * 1994-07-25 2000-09-04 株式会社日立製作所 プラント監視装置および監視方法
JP3274581B2 (ja) * 1995-02-22 2002-04-15 株式会社日立製作所 プロセス監視装置
JPH09306409A (ja) * 1996-05-20 1997-11-28 Hitachi Ltd 走査形電子顕微鏡
JP3554128B2 (ja) * 1997-01-21 2004-08-18 株式会社日立製作所 記録情報表示システム及び記録情報表示方法
JPH10239487A (ja) * 1997-02-24 1998-09-11 Hitachi Ltd プラント運転支援装置
JPH10321177A (ja) * 1997-05-15 1998-12-04 Shimadzu Corp 電子線装置の装置状態表示方法
US6076026A (en) * 1997-09-30 2000-06-13 Motorola, Inc. Method and device for vehicle control events data recording and securing
JPH11118528A (ja) * 1997-10-09 1999-04-30 Kokusai Electric Co Ltd 測定データ表示装置
US6123983A (en) * 1998-04-23 2000-09-26 Sandia Corporation Method and apparatus for monitoring plasma processing operations
SG74705A1 (en) * 1999-03-12 2001-06-19 Sony Electronics Singapore Pte A monitoring system for monitoring processing equipment
JP4056032B2 (ja) * 1999-10-27 2008-03-05 株式会社東芝 プラント機器管理装置
KR100534534B1 (ko) * 2000-03-31 2005-12-07 히다치 겡키 가부시키 가이샤 건설기계의 관리방법과 시스템 및 연산처리장치
KR20020022530A (ko) * 2000-09-20 2002-03-27 가나이 쓰도무 반도체제조장치의 원격진단시스템 및 원격진단방법
US6683316B2 (en) * 2001-08-01 2004-01-27 Aspex, Llc Apparatus for correlating an optical image and a SEM image and method of use thereof
US6687654B2 (en) * 2001-09-10 2004-02-03 The Johns Hopkins University Techniques for distributed machinery monitoring

Also Published As

Publication number Publication date
EP1298513B1 (de) 2006-06-14
EP1298513A2 (de) 2003-04-02
US20030063123A1 (en) 2003-04-03
DE60212286T2 (de) 2007-04-26
JP3793707B2 (ja) 2006-07-05
EP1298513A3 (de) 2003-07-30
US7117127B2 (en) 2006-10-03
US6925423B2 (en) 2005-08-02
JP2003108223A (ja) 2003-04-11
KR20030027800A (ko) 2003-04-07
US20060004544A1 (en) 2006-01-05

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